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scandium-oxide

VD0723 Scandium(III) Oxide Evaporation Materials, Sc2O3

Material Type: Scandium Oxide
Symbol: Sc2O3
Purity: 99.9% ~ 99.99%
Shape: Sputtering Targets/Powder/ Granule/ Custom-made

Thin-Film Mat Engineering (TFM) stands out as a premier manufacturer and supplier of high-purity scandium(III) oxide evaporation materials. Our product range includes various evaporation materials available in both powder and granule forms. Additionally, we provide customized forms tailored to meet specific project requirements. For reliable and precise evaporation materials, TFM is your trusted choice.

MSDS File

Scandium(III) Oxide Evaporation Materials Overview

Thin-Film Mat Engineering (TFM) offers premium scandium(III) oxide evaporation materials, identified by the chemical formula Sc₂O₃. These high-purity materials are crucial for achieving superior quality in deposition processes. With TFM’s commitment to excellence, our scandium(III) oxide boasts purity levels up to 99.9995%, supported by comprehensive quality assurance.

Features of Scandium Oxide (Sc₂O₃)

  • Crystal Structure: Cubic
  • Band Gap: 6.0 eV (insulator)

Scandium(III) Oxide Evaporation Materials Specification

Material TypeScandium(III) oxide
SymbolSc2O3
Color/AppearanceWhite Solid
Melting Point2,485 °C
Theoretical Density 3.86 g/cm3
Purity99.9% ~ 99.99%
ShapePowder/ Pellets/ Granule/ Custom-made

Available Types

Item No.DescriptionPurity (Sc2O3/TREO)Lot Size
OX21-4NScandium Oxide
D50 = 2 ~ 5 µm		99.99%500g, 1000g, 2000g, 5000g
OX21VD-4NScandium Oxide for vacuum deposition.99.99%
3-12mm or custom size		100g, 250g, 1000g
OX21-5NScandium Oxide
D50 = 2 ~ 5 µm		99.999%500g, 1000g, 2000g, 5000g
OX21-5N5Scandium Oxide
D50 = 2 ~ 5 µm		99.9995%100g, 500g, 1000g

Applications

Scandium(III) oxide (Sc₂O₃), or Scandia, is employed in:

  • High-Intensity Lighting: Production of stadium lights.
  • Scandium Compounds: Preparation of other scandium compounds and high-temperature systems, known for heat and thermal shock resistance.
  • Electronics: Used in electronic ceramics and glass composition.
  • Deposition Processes: Ideal for semiconductor deposition, chemical vapor deposition (CVD), and physical vapor deposition (PVD).
  • Optics: Scandia thin-films are used for wear protection, decorative coatings, and displays.

Packaging and Handling

Our scandium(III) oxide materials are carefully tagged and labeled to ensure proper identification and quality control. We ensure that all products are protected from damage during storage and transport.

Contact Us

For high-purity scandium(III) oxide in various forms—including tablets, granules, rods, and wires—or for custom requirements, contact Thin-Film Mat Engineering (TFM). We also supply evaporation sources, boats, filaments, crucibles, heaters, and e-beam crucible liners. Reach out to us for current pricing and details on materials not listed.

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FAQ

  • They are high‐purity substances (e.g. metals, alloys, or compounds) used in thermal or electron‐beam evaporation processes to form thin films on substrates.

  • Typically, they’re processed into a form (often ingots, pellets, or wires) that can be efficiently vaporized. Preparation emphasizes high purity and controlled composition to ensure film quality.

  • Thermal evaporation and electron-beam (e-beam) evaporation are the two main techniques, where material is heated (or bombarded with electrons) until it vaporizes and then condenses on the substrate.

  • Thermal evaporation heats the material directly (often using a resistive heater), while e-beam evaporation uses a focused electron beam to locally heat and vaporize the source material—each method offering different control and energy efficiency.

  • Key parameters include source temperature, vacuum level, deposition rate, substrate temperature, and the distance between the source and the substrate. These factors influence film uniformity, adhesion, and microstructure.

  • Evaporation generally produces high-purity films with excellent control over thickness, and it is especially suitable for materials with relatively low melting points or high vapor pressures.

  • Challenges include issues with step coverage (due to line-of-sight deposition), shadowing effects on complex topographies, and possible re-evaporation of material from the substrate if temperature isn’t properly controlled.

  • Common evaporation materials include noble metals (e.g., gold, silver), semiconductors (e.g., silicon, germanium), metal oxides, and organic compounds—each chosen for its specific optical, electrical, or mechanical properties.

  • Selection depends on desired film properties (conductivity, optical transparency, adhesion), compatibility with the evaporation process, and the final device application (semiconductor, optical coating, etc.).

  • Optimizing substrate temperature, deposition rate, and chamber vacuum are critical for ensuring that the film adheres well and forms the intended microstructure without defects.

  • Troubleshooting may involve checking the source material’s purity, ensuring stable source temperature, verifying the vacuum level, adjusting the substrate’s position or temperature, and monitoring deposition rate fluctuations.

While evaporation tends to yield very high purity films with excellent thickness control, it is limited by its line-of-sight nature. In contrast, sputtering can deposit films more uniformly on complex surfaces and is more versatile for a broader range of materials.

 

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