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Silicon Carbide Wafer (SiC)

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TFM Silicon Carbide Wafer: Advanced Materials for a High-Tech Future

TFM leads the way in Silicon Carbide (SiC) wafer production, providing unparalleled quality and innovation for high-tech industries. Our expertise, combined with state-of-the-art technology, allows us to deliver SiC wafers tailored to meet the dynamic demands of modern applications.

At TFM, we pride ourselves on customization and precision, ensuring that our wafers provide the ideal solution for your specific needs, helping to drive the future of advanced technology.

Silicon Carbide Wafer Specifications

SpecificationDetails
Size10×3 mm, 10×5 mm, 10×10 mm, 15×15 mm, 20×15 mm, 20×20 mm, Dia 15 mm, Dia 20 mm, Dia 1″, Dia 2″, Dia 4″, Dia 6″
Thickness0.35 mm
Crystal Orientation＜0001＞
PolishedSSP or DSP
Redirection Precision±0.5°
Edge Redirection2° (special in 1°)
Angle of CrystallineSpecial sizes and orientations available upon request
Surface Roughness (Ra)≤ 5 Å (5 μm × 5 μm)

Silicon Carbide Wafer Physical Properties

PropertyDetails
MaterialSiC
Growth MethodMOCVD
Crystal StructureM6
Lattice (Å)a = 3.08, c = 15.08
Direction<0001> 3.5º
Density (g/cm³)3.21 g/cm³
Hardness (Mohs)9.2
Melting Point1900°C
Heat Traveling @300K5 W/cm·K
Dielectric Constantse(11) = e(22) = 9.66, e(33) = 10.33

Choose TFM’s Silicon Carbide wafers for your next-generation applications, offering exceptional performance, reliability, and precision to meet the future of advanced semiconductor technology.

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FAQ

A thin film substrate is the base material upon which thin layers of materials are deposited to create electronic, optical, or mechanical devices. The substrate provides structural support and can influence the properties of the thin film.

The choice of substrate affects the film’s structural integrity, electrical properties, and overall performance. Factors like thermal expansion coefficient, surface smoothness, and chemical compatibility are crucial considerations.

Materials such as lanthanum aluminate (LaAlO₃), magnesium oxide (MgO), and strontium titanate (SrTiO₃) are commonly used due to their lattice compatibility and thermal stability, which are essential for optimal superconducting properties.

Metal substrates offer high electrical and thermal conductivity, making them suitable for applications requiring efficient heat dissipation and electrical connectivity. However, their surface properties and potential for oxidation must be managed during deposition.

These substrates are materials that can support the growth of thin films exhibiting magnetic or ferroelectric properties, essential for applications in memory devices, sensors, and actuators.

Semiconductor substrates, such as silicon wafers, serve as the foundation for integrated circuits and various electronic components, providing the necessary electrical characteristics and structural support for device fabrication.

Gallium Nitride (GaN) substrates are pivotal for high-performance optoelectronic and power devices due to their excellent thermal conductivity, high breakdown voltage, and efficiency. They are widely used in LEDs, power transistors, and RF components.

Halide crystal substrates, composed of halide compounds, are utilized in specialized optical applications, including infrared spectroscopy and laser systems, due to their unique optical properties.
Ceramic substrates provide high thermal stability, mechanical strength, and electrical insulation, making them ideal for high-frequency and high-power applications.
Proper surface preparation, including cleaning and polishing, ensures the removal of contaminants and surface irregularities, leading to improved film adhesion, uniformity, and performance.
Yes, thin films can be deposited on flexible substrates like polymers, enabling the development of flexible electronics and wearable devices. However, challenges include managing mechanical stress and ensuring film adhesion.
Challenges include ensuring lattice matching to minimize defects, managing thermal expansion differences to prevent stress and delamination, and achieving desired electrical and optical properties for specific applications.
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