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ST0258 Zinc Fluoride Sputtering Target, ZnF2

Chemical Formula: ZnF2
Catalog Number: ST0258
CAS Number: 7783-49-5
Purity: 99.9%, 99.95%, 99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Zinc Fluoride sputtering target  come in various forms, purities, sizes, and prices. Thin Film Materials (TFM) manufactures and supplies top-quality sputtering targets at competitive prices.

MSDS File

Zinc Fluoride Sputtering Target Description

The Zinc Fluoride Sputtering Target is a fluoride ceramic target composed of zinc and fluorine. It is used in various applications for thin film deposition.

ZincZinc is a chemical element with the symbol “Zn” and atomic number 30. Its name is derived from the German word “zinc,” which may come from the Persian word “sing,” meaning stone. Zinc has been used since ancient times, with early usage dating back to before 1000 BC, and it was discovered by Indian metallurgists. It is located in Period 4 and Group 12 of the periodic table, belonging to the d-block. The relative atomic mass of zinc is 65.409(4) Dalton, with the number in brackets indicating the uncertainty.

Related Product: Zinc Sputtering Target

FluorineFluorine, also known as fluorin, is a chemical element with the symbol “F” and atomic number 9. Its name originates from the Latin word “fluere,” meaning to flow. Fluorine was first mentioned in 1810 by A.-M. Ampère, and its isolation was achieved by H. Moissan. It is located in Period 2 and Group 17 of the periodic table, belonging to the p-block. The relative atomic mass of fluorine is 18.9984032(5) Dalton, with the number in brackets indicating the uncertainty.

Zinc Fluoride Sputtering Target Application

The zinc fluoride sputtering target is employed in various applications including:

  • Thin Film Deposition: For creating coatings on surfaces.
  • Decoration: Used in aesthetic applications where fluoride coatings are beneficial.
  • Semiconductor: In the fabrication of semiconductor devices.
  • Display: Applied in the production of displays, including LCDs and other display technologies.
  • LED and Photovoltaic Devices: Used in the manufacturing of LEDs and solar cells.
  • Functional Coatings: Applied for functional purposes in various industries.
  • Optical Information Storage: Utilized in optical storage technologies.
  • Glass Coating Industry: Used for coating automotive glass, architectural glass, and other types of glass to enhance durability and performance.
  • Optical Communication: Applied in technologies related to optical communication systems.

This versatility makes zinc fluoride sputtering targets valuable across multiple high-tech and industrial applications.

Zinc Fluoride Sputtering Target Packing

Our zinc fluoride sputter targets are meticulously tagged and labeled externally to ensure efficient identification and quality control. We take great care to prevent any damage during storage and transportation, ensuring that the targets arrive in optimal condition.

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TFM offers Zinc Fluoride Sputtering Targets in various forms, purities, sizes, and prices. We specialize in high-purity thin film deposition materials with optimal density and minimal grain sizes, which are ideal for semiconductor, CVD, and PVD applications in display and optics. Contact Us for current pricing on sputtering targets and other deposition materials that are not listed.

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FAQ

Sputtering targets are materials used in thin-film deposition processes to create coatings on substrates. They are used in industries like semiconductors, optics, photovoltaics, and electronics.

Evaporation materials are used in Physical Vapor Deposition (PVD) processes, where materials are heated and evaporated to form a thin film on a substrate. These are critical for applications in optics, wear protection, and decorative coatings.

Boat crucibles are used as containers for evaporation materials during PVD processes. They help to uniformly evaporate materials onto the substrate for thin film formation.

Sputtering uses energetic particles to eject material from a target, while evaporation involves heating a material until it vaporizes and deposits on a substrate. Both are common methods in Physical Vapor Deposition (PVD) for creating thin films.

Consider the material composition, purity, target size, and application-specific requirements such as the thickness and uniformity of the film.

Yes, we offer customized sputtering targets, evaporation materials, and crucibles to meet specific customer requirements for size, material composition, and purity.

Yes, we can assist in selecting the most suitable material based on your application, whether it’s for optical coatings, semiconductor fabrication, or decorative finishes.

Yes, we offer both bulk and small quantities of sputtering targets, evaporation materials, and spherical powders to support research, prototyping, and development projects.

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