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VD0745 Zirconium Dioxide Evaporation Materials, ZrO2 White and Black Color Zirconia

Catalog No.VD0745
MaterialZirconium dioxide (ZrO2)
Purity99.9% ~ 99.999%
ShapePowder/ Granule/ Custom-made

TFM stands out as a top-tier producer and distributor of high-purity zirconium dioxide for evaporation applications, along with a diverse range of other evaporation materials. Our offerings include zirconium dioxide in both powder and granule forms, with options for customized formulations available to meet specific requirements.

COA_ZrO2_BlackPdf

MSDS File

Introduction

Zirconium Dioxide Evaporation Materials (ZrO₂), also known as zirconia evaporation materials, are widely used in physical vapor deposition (PVD) processes for producing high-performance oxide thin films. Owing to their exceptional thermal stability, chemical inertness, and optical transparency, ZrO₂ materials are essential in optical coatings, electronic devices, and advanced protective layers. Their ability to form dense, durable films makes them a reliable choice for both research-scale evaporation and industrial vacuum coating systems.

Detailed Description

ZrO₂ evaporation materials are produced from high-purity zirconium oxide powders that undergo carefully controlled calcination, granulation, or sintering processes. This ensures consistent composition, low impurity levels, and stable evaporation behavior under high vacuum and elevated temperatures.

One of the key advantages of ZrO₂ is its extremely high melting point and strong resistance to chemical attack. These properties allow zirconium dioxide to maintain structural integrity during electron beam evaporation, thermal evaporation, and reactive evaporation processes. Compared with many other oxide materials, ZrO₂ offers superior film hardness, high refractive index, and excellent adhesion to a wide range of substrates.

Zirconium dioxide evaporation materials are typically supplied in pellets, granules, tablets, or custom-shaped pieces to suit different evaporation sources such as crucibles, boats, and e-beam hearths. Controlled particle size and morphology help achieve stable evaporation rates and uniform film thickness, especially in precision optical and electronic applications.

Applications

Zirconium Dioxide evaporation materials are commonly used in:

  • Optical coatings: High-refractive-index layers for lenses, mirrors, laser optics, and filters

  • Thermal barrier coatings: Heat-resistant layers for aerospace and high-temperature components

  • Semiconductor devices: Dielectric and insulating films in microelectronic structures

  • Decorative coatings: Durable, wear-resistant finishes with excellent color stability

  • Energy and functional coatings: Protective and insulating layers in advanced energy systems

  • R&D thin-film studies: Material research involving oxide ceramics and multilayer stacks

Technical Parameters

ParameterTypical Value / RangeImportance
Chemical CompositionZrO₂ (Zirconium Dioxide)Defines thermal and optical performance
Purity99.9% – 99.99%Minimizes contamination in deposited films
FormPellets, granules, tablets, custom shapesMatches different evaporation sources
Particle SizeCustom controlledInfluences evaporation stability
Melting Point~2700 °CEnables high-temperature evaporation processes
Evaporation MethodE-beam / ThermalFlexible compatibility with PVD systems

Comparison with Related Oxide Materials

MaterialKey AdvantageTypical Application
ZrO₂High refractive index, excellent thermal stabilityOptical & protective coatings
Al₂O₃Good insulation, lower refractive indexGeneral dielectric coatings
HfO₂Higher density, high-k dielectricSemiconductor devices
TiO₂Strong optical absorption controlDecorative and optical films

FAQ

QuestionAnswer
Can ZrO₂ evaporation materials be customized?Yes, purity, form, and particle size can be tailored to your process.
Which evaporation method is recommended?Electron beam evaporation is commonly used due to ZrO₂’s high melting point.
How are the materials packaged?Vacuum-sealed with moisture-proof protection for safe transport and storage.
Are these materials suitable for optical coatings?Yes, ZrO₂ is widely used for high-index optical thin films.

Packaging

Our Zirconium Dioxide Evaporation Materials (ZrO₂) are carefully labeled and securely packaged to ensure accurate identification and consistent quality control. Each batch is vacuum-sealed and protected with reinforced cushioning to prevent contamination, moisture exposure, or physical damage during storage and international transportation.

Conclusion

Zirconium Dioxide Evaporation Materials (ZrO₂) provide a robust and reliable solution for depositing high-quality oxide thin films with excellent thermal, optical, and mechanical performance. With flexible customization options and stable evaporation behavior, ZrO₂ is an ideal material for demanding optical, electronic, and protective coating applications.

For detailed specifications and a quotation, please contact us at sales@thinfilmmaterials.com.

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FAQ

  • They are high‐purity substances (e.g. metals, alloys, or compounds) used in thermal or electron‐beam evaporation processes to form thin films on substrates.

  • Typically, they’re processed into a form (often ingots, pellets, or wires) that can be efficiently vaporized. Preparation emphasizes high purity and controlled composition to ensure film quality.

  • Thermal evaporation and electron-beam (e-beam) evaporation are the two main techniques, where material is heated (or bombarded with electrons) until it vaporizes and then condenses on the substrate.

  • Thermal evaporation heats the material directly (often using a resistive heater), while e-beam evaporation uses a focused electron beam to locally heat and vaporize the source material—each method offering different control and energy efficiency.

  • Key parameters include source temperature, vacuum level, deposition rate, substrate temperature, and the distance between the source and the substrate. These factors influence film uniformity, adhesion, and microstructure.

  • Evaporation generally produces high-purity films with excellent control over thickness, and it is especially suitable for materials with relatively low melting points or high vapor pressures.

  • Challenges include issues with step coverage (due to line-of-sight deposition), shadowing effects on complex topographies, and possible re-evaporation of material from the substrate if temperature isn’t properly controlled.

  • Common evaporation materials include noble metals (e.g., gold, silver), semiconductors (e.g., silicon, germanium), metal oxides, and organic compounds—each chosen for its specific optical, electrical, or mechanical properties.

  • Selection depends on desired film properties (conductivity, optical transparency, adhesion), compatibility with the evaporation process, and the final device application (semiconductor, optical coating, etc.).

  • Optimizing substrate temperature, deposition rate, and chamber vacuum are critical for ensuring that the film adheres well and forms the intended microstructure without defects.

  • Troubleshooting may involve checking the source material’s purity, ensuring stable source temperature, verifying the vacuum level, adjusting the substrate’s position or temperature, and monitoring deposition rate fluctuations.

While evaporation tends to yield very high purity films with excellent thickness control, it is limited by its line-of-sight nature. In contrast, sputtering can deposit films more uniformly on complex surfaces and is more versatile for a broader range of materials.

 

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