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VD0745 Zirconium Dioxide Evaporation Materials, ZrO2

Catalog No.VD0745
MaterialZirconium dioxide (ZrO2)
Purity99.9% ~ 99.999%
ShapePowder/ Granule/ Custom-made

TFM stands out as a top-tier producer and distributor of high-purity zirconium dioxide for evaporation applications, along with a diverse range of other evaporation materials. Our offerings include zirconium dioxide in both powder and granule forms, with options for customized formulations available to meet specific requirements.

MSDS File

Zirconium Dioxide Evaporation Materials Overview

Zirconium dioxide (ZrO2), also known as zirconia, is a key oxide of zirconium. Typically colorless and odorless, zirconium dioxide is insoluble in water, hydrochloric acid, and dilute sulfuric acid, reflecting its chemically inert nature. It is renowned for its high melting point, exceptional electrical conductivity, high refractive index, and low thermal expansion coefficient. These properties make zirconium dioxide an essential material for high-temperature resistance, ceramic insulation, and coating applications.

Specifications of Zirconium Dioxide (ZrO2) Evaporation Materials

Chemical formulaZrO2
Purity3N-4N
AppearanceGranules or tablets
Melting point2715℃
Formula weight123.22
Size3-5mm or customized
ColorWhite or black

Applications of Zirconium Dioxide Evaporation Materials

Our zirconium dioxide evaporation materials are utilized in various fields, including:

  • Anti-Reflection Films: Used in the production of anti-reflective coatings for optical applications.
  • Hard Films and Glasses Films: Applied to enhance durability and functionality.
  • Multilayer Films: Employed in complex film structures for advanced optical and electronic uses.
  • Deposition Processes: Integral in semiconductor deposition, chemical vapor deposition (CVD), and physical vapor deposition (PVD).
  • Optics: Utilized for wear protection, decorative coatings, and displays.

Packaging and Quality Assurance

To ensure the highest quality and prevent damage, our zirconium dioxide evaporation pellets are meticulously packaged in plastic vacuum bags. Each package also includes a Certificate of Analysis (COA) for the raw material, confirming the product’s quality and purity.

Contact Us

TFM specializes in providing high-purity zirconium dioxide evaporation materials tailored for semiconductor applications, CVD, PVD, and optical coatings. Our team’s combined expertise in engineering, manufacturing, and analysis allows us to deliver top-tier evaporation materials. Reach out to us today for inquiries and further information.

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FAQ

  • They are high‐purity substances (e.g. metals, alloys, or compounds) used in thermal or electron‐beam evaporation processes to form thin films on substrates.

  • Typically, they’re processed into a form (often ingots, pellets, or wires) that can be efficiently vaporized. Preparation emphasizes high purity and controlled composition to ensure film quality.

  • Thermal evaporation and electron-beam (e-beam) evaporation are the two main techniques, where material is heated (or bombarded with electrons) until it vaporizes and then condenses on the substrate.

  • Thermal evaporation heats the material directly (often using a resistive heater), while e-beam evaporation uses a focused electron beam to locally heat and vaporize the source material—each method offering different control and energy efficiency.

  • Key parameters include source temperature, vacuum level, deposition rate, substrate temperature, and the distance between the source and the substrate. These factors influence film uniformity, adhesion, and microstructure.

  • Evaporation generally produces high-purity films with excellent control over thickness, and it is especially suitable for materials with relatively low melting points or high vapor pressures.

  • Challenges include issues with step coverage (due to line-of-sight deposition), shadowing effects on complex topographies, and possible re-evaporation of material from the substrate if temperature isn’t properly controlled.

  • Common evaporation materials include noble metals (e.g., gold, silver), semiconductors (e.g., silicon, germanium), metal oxides, and organic compounds—each chosen for its specific optical, electrical, or mechanical properties.

  • Selection depends on desired film properties (conductivity, optical transparency, adhesion), compatibility with the evaporation process, and the final device application (semiconductor, optical coating, etc.).

  • Optimizing substrate temperature, deposition rate, and chamber vacuum are critical for ensuring that the film adheres well and forms the intended microstructure without defects.

  • Troubleshooting may involve checking the source material’s purity, ensuring stable source temperature, verifying the vacuum level, adjusting the substrate’s position or temperature, and monitoring deposition rate fluctuations.

While evaporation tends to yield very high purity films with excellent thickness control, it is limited by its line-of-sight nature. In contrast, sputtering can deposit films more uniformly on complex surfaces and is more versatile for a broader range of materials.

 

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