Introduction
The Yttrium Fluoride Sputtering Target (YF₃) is a high-performance fluoride ceramic target designed for thin-film applications that demand excellent infrared transparency, low optical absorption, and high chemical stability. YF₃ is widely used in advanced optical and photonic coatings, particularly in infrared (IR) systems where oxide materials may exhibit excessive absorption. Its stable fluoride chemistry makes it a reliable material for both research and precision optical manufacturing.
Detailed Description
Yttrium Fluoride sputtering targets are fabricated from high-purity YF₃ powders using controlled powder processing, compaction, and sintering techniques. Because fluoride materials are sensitive to moisture, strict environmental control is applied throughout manufacturing, machining, and final packaging to preserve material integrity and stoichiometry.
The finished YF₃ target exhibits uniform composition, high density, and stable sputtering behavior, enabling reproducible thin-film deposition. Compared with many oxide targets, YF₃ produces films with lower phonon energy and reduced IR absorption, which is essential for mid-IR and far-IR optical components. These targets are typically used in RF magnetron sputtering systems, where deposition parameters such as power density, substrate temperature, and chamber pressure can be optimized for smooth, high-quality fluoride films.
Applications
Yttrium Fluoride sputtering targets are commonly used in:
Infrared (IR) optical coatings
Anti-reflection (AR) coatings for IR lenses and windows
Fluoride-based optical multilayer stacks
Laser optics and photonic components
Scientific and analytical optical instrumentation
Advanced thin-film materials research
Technical Parameters
| Parameter | Typical Value / Range | Importance |
|---|---|---|
| Chemical Formula | YF₃ | Defines fluoride optical properties |
| Purity | 99.9% – 99.99% | Minimizes optical absorption |
| Target Diameter | 25 – 300 mm (custom) | Fits standard sputtering systems |
| Thickness | 3 – 6 mm (custom available) | Influences sputtering stability |
| Density | ≥ 95% of theoretical | Ensures uniform erosion |
| Moisture Sensitivity | Hygroscopic | Requires controlled handling |
| Deposition Method | RF Magnetron Sputtering | Suitable for fluoride ceramics |
Comparison with Related Fluoride Targets
| Material | Key Advantage | Typical Application |
|---|---|---|
| Yttrium Fluoride (YF₃) | Low IR absorption, good stability | IR optical coatings |
| Magnesium Fluoride (MgF₂) | Broad transparency range | AR coatings |
| Zirconium Fluoride (ZrF₄) | Low phonon energy | IR optics |
| Lanthanum Fluoride (LaF₃) | Higher refractive index | Optical multilayers |
FAQ
| Question | Answer |
|---|---|
| Is YF₃ suitable for infrared optics? | Yes, it is widely used for IR coatings due to low absorption. |
| Does YF₃ absorb moisture? | Yes, careful moisture control and vacuum packaging are essential. |
| Is RF sputtering required? | RF sputtering is recommended for stable deposition of YF₃ films. |
| Can small R&D targets be supplied? | Yes, laboratory-scale sizes are available. |
| How is the target packaged? | Vacuum-sealed with moisture-resistant protective materials. |
Packaging
Our Yttrium Fluoride Sputtering Targets (YF₃) are meticulously vacuum-sealed and clearly labeled to ensure accurate identification and strict quality control. Moisture-resistant wrapping and shock-absorbing packaging are used to protect the target during storage and international transportation.
Conclusion
The Yttrium Fluoride Sputtering Target (YF₃) provides a dependable solution for depositing high-quality fluoride thin films with excellent infrared transparency and optical stability. With controlled purity, customizable dimensions, and carefully managed handling, YF₃ targets are well suited for advanced optical coating systems and photonic research applications.
For detailed specifications and a quotation, please contact us at sales@thinfilmmaterials.com.
Reviews
There are no reviews yet.