Product Overview
Molybdenum Rhenium Sputtering Target (MoRe Target) is a composition-specific sputtering target for thin-film deposition and PVD process development. The practical specification normally includes chemistry, purity, dimensions, density, target configuration, and any bonding or backing requirement needed by the sputtering cathode.
Material and Deposition Characteristics
Power mode and process conditions should be selected according to the target conductivity, thermal behavior, and the requirements of the cathode system. For less common materials, conservative initial power density and film-composition verification are good practice.
Technical Data
| Parameter | Typical Value / Range | Importance |
|---|---|---|
| Purity | 99.9% – 99.99% | Ensures stable electrical and structural film properties |
| Composition | Mo/Re ratios customizable (e.g., 85/15, 70/30) | Determines mechanical and thermal performance |
| Diameter | 25 – 300 mm (custom) | Compatible with standard sputtering systems |
| Thickness | 3 – 6 mm | Influences sputtering efficiency and target lifespan |
| Density | ≥ 99% theoretical density | Improves sputtering stability and film uniformity |
| Bonding | Copper backing plate / Indium bonded | Enhances heat transfer and structural durability |
| Material | Key Advantage | Typical Application |
|---|---|---|
| Molybdenum Rhenium (Mo-Re) | High-temperature strength and improved ductility | Aerospace and semiconductor thin films |
| Molybdenum (Mo) | Excellent thermal stability and conductivity | Semiconductor and vacuum components |
| Rhenium (Re) | Extremely high melting point and stability | High-temperature electronics and coatings |
| Question | Answer |
|---|---|
| Can the Mo-Re composition be customized? | Yes. The molybdenum-to-rhenium ratio can be adjusted to meet specific performance requirements. |
| What sputtering methods are compatible with Mo-Re targets? | Mo-Re sputtering targets are commonly used in DC magnetron sputtering and other PVD deposition processes. |
| Are bonded sputtering targets available? | Yes. Copper backing plates with indium bonding are often supplied to improve thermal management. |
| What purity levels are typically available? | Standard purity levels range from 99.9% to 99.99%. |
| Can custom sizes or shapes be produced? | Yes. Targets can be manufactured in various diameters, thicknesses, and geometries for different deposition systems. |
Typical Thin-Film Applications
- Thin-film research and materials-development projects requiring a composition-specific sputtering source
- Semiconductor, optical, energy, electronic, or laboratory coatings depending on the material system
- Custom R&D work where target composition, purity, and geometry need to be specified together
Target Configuration and Ordering Considerations
For quotation and manufacturability review, provide target size, thickness, purity or alloy composition, quantity, and the sputtering gun or cathode model if known. If a bonded assembly is required, include backing-plate material, bonding preference, and any dimensional tolerances, surface-finish needs, or inspection-document requirements. TFM can also review customer drawings or old-target samples for replacement builds.
Frequently Asked Questions
What is the main reason to use a Molybdenum Rhenium sputtering target?
It provides a composition-specific source for thin-film deposition when the target material itself is important to the desired film chemistry or process.
How should the sputtering mode for Molybdenum Rhenium be selected?
The power mode should be chosen according to target conductivity, thermal behavior, and equipment capability. Less-conductive materials are commonly evaluated with RF power.
Why are density and microstructure important for Molybdenum Rhenium targets?
These factors can influence erosion stability, thermal behavior, particle generation, and the risk of cracking or local hot spots.
Can Molybdenum Rhenium be supplied with a backing plate?
Yes. If the material is brittle or the cathode requires it, a bonded configuration can be reviewed according to target size, thickness, cooling, and power.
Does target composition always equal film composition?
No. Film chemistry may differ because of sputtering yields, process conditions, substrate temperature, re-sputtering, and chamber history. Film verification is recommended when composition matters.
What should I provide to request a quotation for Molybdenum Rhenium?
Please provide the composition, purity, dimensions, quantity, target configuration, cathode details, and any drawing or inspection requirements.
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