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Zinc Sulfide Evaporation Materials

VD0828 Zinc Sulfide Evaporation Materials, ZnS

Catalog No.VD0828
MaterialZinc Sulfide (ZnS)
Purity99.9%~99.999%
ShapePowder/ Granule/ Custom-made

TFM is a top manufacturer and supplier of premium-quality zinc sulfide evaporation materials, along with an extensive range of other evaporation materials. These materials are available in both powder and granule form, with custom shapes and configurations provided upon request to meet specific project requirements.

MSDS File

Zinc Sulfide Evaporation Materials Overview

Zinc sulfide evaporation material is known for its high hardness and brittleness, with no specific melting point under normal pressure. It exhibits stable performance under standard temperature and pressure conditions, making it ideal for various applications. Zinc sulfide is insoluble in alkaline solutions or water, but it is slightly soluble in hydrochloric acid and readily dissolves in concentrated sulfuric and nitric acids. When exposed to humid air, it oxidizes slowly to zinc sulfate, while in dry air, it remains stable. High-purity zinc sulfide evaporation materials are crucial for deposition processes, enabling the production of high-quality thin films. TFM ensures exceptional product reliability, with purities reaching up to 99.9995%.

Zinc Sulfide Evaporation Materials Specifications

Chemical FormulaZnS
Purity99.9% – 99.999% (3N-5N)
AppearanceGranules or Tablets
Melting Point1100°C
Formula Weight97.4
Size3-5 mm or customized
ColorFaint Yellow

Applications of Zinc Sulfide Evaporation Materials

Zinc sulfide (ZnS) evaporation materials are commonly used in a range of specialized applications, including:

  • Optical coating targets
  • X-ray screens
  • Luminescent watch dials (by adding traces of radium or neodymium salts)

Packaging and Quality Control

TFM ensures that zinc sulfide evaporation materials are packaged with care, using plastic vacuum bags to prevent any damage during storage and transportation. The Certificate of Analysis (COA) for the raw materials is also included with each package, verifying the product’s quality and composition.

Contact TFM for Custom Solutions

TFM offers high-purity zinc sulfide evaporation materials, tailored for applications such as semiconductors, chemical vapor deposition (CVD), physical vapor deposition (PVD), and optical displays. Our dedicated engineering and manufacturing teams work together to deliver top-tier evaporation materials. For custom orders or to request a quote, contact TFM today.

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FAQ

  • They are high‐purity substances (e.g. metals, alloys, or compounds) used in thermal or electron‐beam evaporation processes to form thin films on substrates.

  • Typically, they’re processed into a form (often ingots, pellets, or wires) that can be efficiently vaporized. Preparation emphasizes high purity and controlled composition to ensure film quality.

  • Thermal evaporation and electron-beam (e-beam) evaporation are the two main techniques, where material is heated (or bombarded with electrons) until it vaporizes and then condenses on the substrate.

  • Thermal evaporation heats the material directly (often using a resistive heater), while e-beam evaporation uses a focused electron beam to locally heat and vaporize the source material—each method offering different control and energy efficiency.

  • Key parameters include source temperature, vacuum level, deposition rate, substrate temperature, and the distance between the source and the substrate. These factors influence film uniformity, adhesion, and microstructure.

  • Evaporation generally produces high-purity films with excellent control over thickness, and it is especially suitable for materials with relatively low melting points or high vapor pressures.

  • Challenges include issues with step coverage (due to line-of-sight deposition), shadowing effects on complex topographies, and possible re-evaporation of material from the substrate if temperature isn’t properly controlled.

  • Common evaporation materials include noble metals (e.g., gold, silver), semiconductors (e.g., silicon, germanium), metal oxides, and organic compounds—each chosen for its specific optical, electrical, or mechanical properties.

  • Selection depends on desired film properties (conductivity, optical transparency, adhesion), compatibility with the evaporation process, and the final device application (semiconductor, optical coating, etc.).

  • Optimizing substrate temperature, deposition rate, and chamber vacuum are critical for ensuring that the film adheres well and forms the intended microstructure without defects.

  • Troubleshooting may involve checking the source material’s purity, ensuring stable source temperature, verifying the vacuum level, adjusting the substrate’s position or temperature, and monitoring deposition rate fluctuations.

While evaporation tends to yield very high purity films with excellent thickness control, it is limited by its line-of-sight nature. In contrast, sputtering can deposit films more uniformly on complex surfaces and is more versatile for a broader range of materials.

 

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