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Find the latest news updates based on industries such as manufacturing industry news, industry trends, and much more on TFM.

Antimony–Indium–Tin Sputtering Targets: Unlocking Flexible Thin-Film Design

Introduction In thin-film engineering, materials are no longer chosen simply for what they are, but for what they can become once deposited. Antimony Indium Tin (AIT) sputtering targets sit firmly

Chromium Powder: Comprehensive Application Scenario Analysis

Introduction Chromium powder is a strategically important metallic material widely used across surface engineering, advanced manufacturing, energy systems, electronics, and high-temperature industrial processes. Owing to its excellent corrosion resistance, high

Vanadium Foil (V): An Advanced Metallic Material for Extreme and Precision Applications

Introduction Vanadium foil is a high-performance metallic material that occupies a unique position in advanced materials science. While vanadium is widely known as an alloying element in steels and superalloys,

Iron Gallium Sputtering Target (Fe/Ga):From Alloy Physics to Smart Thin-Film Applications

In the world of thin-film materials, most sputtering targets are chosen for relatively “passive” roles. Aluminum provides conductivity, chromium improves adhesion, tantalum ensures barrier performance, and oxides shape optical behavior.

High-Quality Thermal Filament Tungsten Coils

Enabling Stable, Clean, and Reproducible Thermal Evaporation Processes Thermal evaporation remains one of the most widely adopted physical vapor deposition (PVD) techniques in thin-film manufacturing, despite the rapid evolution of

Niobium Silicide Sputtering Target (NbSi₂): A Comprehensive Guide to Applications, Performance, and Thin-Film Engineering

Introduction: Why Niobium Silicide Matters in Modern Thin-Film Technology As semiconductor devices, functional coatings, and precision electronic components continue to evolve toward higher integration, smaller dimensions, and harsher operating environments,

Why Choose a Germanium–Gold (GeAu) Sputtering Target: Advantages, Comparisons, and Key Application Scenarios

Introduction In advanced thin-film deposition for semiconductor and electronic devices, material selection is rarely driven by a single property. Electrical performance, interfacial behavior, thermal stability, compatibility with downstream processes, and

Sodium Niobate Sputtering Target (NaNbO₃):When and Why This Functional Oxide Matters in Advanced Thin-Film Applications

Introduction: Why Sodium Niobate Appears in Advanced Thin-Film Research In the landscape of functional oxide thin films, Sodium Niobate (NaNbO₃) occupies a unique and often underestimated position. It is not

Tantalum Box Heaters: Design Principles, Material Advantages, and Applications in Advanced Vacuum Thermal Processes

1. Introduction Tantalum box heaters have become a critical class of high-temperature components in modern physical vapor deposition (PVD) systems, vacuum furnaces, semiconductor processing tools, and research reactors requiring stable,

Titanium Oxide (TiOx) Rotary Sputtering Targets: Material Properties, Thin-Film Behavior, and Advanced Applications in Optical, Semiconductor, and Energy Technologies

Titanium oxide (TiOx) is one of the most widely used functional oxides in physical vapor deposition (PVD), particularly in reactive and non-reactive magnetron sputtering processes. Its tunable stoichiometry, excellent optical

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