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Aluminum Cobalt Evaporation Materials

VD0594 Aluminum Cobalt Evaporation Materials, Al/Co

Catalog No.VD0594
MaterialAluminum Cobalt (Al/Co)
Purity99.9% ~ 99.95%
ShapePowder/ Granule/ Custom-made

TFM specializes in producing high-purity aluminum cobalt evaporation materials, ensuring product reliability through rigorous quality assurance processes. We offer these materials in various forms, including tablets, granules, rods, and wires.

MSDS File

Aluminum Cobalt Evaporation Materials Overview

Aluminum cobalt evaporation materials, offered by TFM, are specialized alloys comprising aluminum and cobalt. These materials play a crucial role in various deposition processes, including semiconductor deposition, chemical vapor deposition (CVD), and physical vapor deposition (PVD). They are primarily used in optical applications such as protective coatings, decorative finishes, and display technologies.

Packaging and Handling

At TFM, we prioritize the integrity of our aluminum cobalt evaporation materials by ensuring they are meticulously packaged. This careful handling helps avoid any damage during both storage and transportation, ensuring that the products reach you in optimal condition.

What We Offer

TFM provides a broad range of evaporation materials, including both pure metals and alloys. Our inventory also features ceramic oxides, including rare earth oxides like Sc2O3, Y2O3, La2O3, as well as other ceramics such as fluorides and nitrides. These materials are available in various forms, including tablets, granules, rods, and wires. We also offer custom shapes and quantities upon request. In addition to evaporation materials, we supply related components such as evaporation sources, boats, filaments, crucibles, heaters, and e-beam crucible liners. For current pricing and availability of evaporation pellets and other deposition materials not listed, please reach out to us with your inquiry.

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FAQ

  • They are high‐purity substances (e.g. metals, alloys, or compounds) used in thermal or electron‐beam evaporation processes to form thin films on substrates.

  • Typically, they’re processed into a form (often ingots, pellets, or wires) that can be efficiently vaporized. Preparation emphasizes high purity and controlled composition to ensure film quality.

  • Thermal evaporation and electron-beam (e-beam) evaporation are the two main techniques, where material is heated (or bombarded with electrons) until it vaporizes and then condenses on the substrate.

  • Thermal evaporation heats the material directly (often using a resistive heater), while e-beam evaporation uses a focused electron beam to locally heat and vaporize the source material—each method offering different control and energy efficiency.

  • Key parameters include source temperature, vacuum level, deposition rate, substrate temperature, and the distance between the source and the substrate. These factors influence film uniformity, adhesion, and microstructure.

  • Evaporation generally produces high-purity films with excellent control over thickness, and it is especially suitable for materials with relatively low melting points or high vapor pressures.

  • Challenges include issues with step coverage (due to line-of-sight deposition), shadowing effects on complex topographies, and possible re-evaporation of material from the substrate if temperature isn’t properly controlled.

  • Common evaporation materials include noble metals (e.g., gold, silver), semiconductors (e.g., silicon, germanium), metal oxides, and organic compounds—each chosen for its specific optical, electrical, or mechanical properties.

  • Selection depends on desired film properties (conductivity, optical transparency, adhesion), compatibility with the evaporation process, and the final device application (semiconductor, optical coating, etc.).

  • Optimizing substrate temperature, deposition rate, and chamber vacuum are critical for ensuring that the film adheres well and forms the intended microstructure without defects.

  • Troubleshooting may involve checking the source material’s purity, ensuring stable source temperature, verifying the vacuum level, adjusting the substrate’s position or temperature, and monitoring deposition rate fluctuations.

While evaporation tends to yield very high purity films with excellent thickness control, it is limited by its line-of-sight nature. In contrast, sputtering can deposit films more uniformly on complex surfaces and is more versatile for a broader range of materials.

 

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