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VD0747 Aluminum Nitride Evaporation Materials, AlN

Catalog No.VD0747
MaterialAluminum Nitride (AlN)
Purity99.5% ~ 99.9%
ShapePowder/ Granule/ Custom-made

TFM is a top-tier manufacturer and supplier of high-purity Aluminum Nitride (AlN) evaporation materials. We offer a broad selection of evaporation materials, available in both powder and granule forms. For specialized needs, we also provide custom solutions tailored to your specific requirements.

MSDS File

Aluminum Nitride Evaporation Materials Overview

Aluminum Nitride (AlN) evaporation materials are essential for high-performance deposition processes. With a chemical formula of AlN, this nitride ceramic material from TFM is renowned for its high purity and reliability, making it a preferred choice for ensuring high-quality deposited films. TFM’s commitment to quality assurance means we produce AlN materials with purity levels up to 99.9995%.

Aluminum Nitride Evaporation Materials Specification

Compound FormulaAlN
AppearanceWhite to pale yellow powder
Melting Point2200 °C
Boiling Point2517 °C
Density2.9 to 3.3 g/cm3
Electrical Resistivity10 to 12 10x Ω-m
Specific Heat780 J/kg-K
ShapePowder/ Granule/ Custom-made

Applications of Aluminum Nitride Evaporation Materials

Aluminum Nitride evaporation materials are versatile and utilized in several advanced applications:

  • Deposition Processes: Ideal for semiconductor deposition, chemical vapor deposition (CVD), and physical vapor deposition (PVD).
  • Optics: Used for wear protection, decorative coatings, and displays.

Packaging and Handling

Our Aluminum Nitride evaporation materials are meticulously packaged to prevent damage during storage and transit. Each package is clearly tagged and labeled to ensure easy identification and maintain high quality.

Contact Us

TFM is a leading supplier of high-purity Aluminum Nitride evaporation materials. We offer a range of forms including tablets, granules, rods, and wires, with custom options available upon request. In addition to evaporation materials, we also provide related products such as evaporation sources, boats, filaments, crucibles, heaters, and e-beam crucible liners. For inquiries about pricing and additional materials, please reach out to us.

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FAQ

Sputtering targets are materials used in thin-film deposition processes to create coatings on substrates. They are used in industries like semiconductors, optics, photovoltaics, and electronics.

Evaporation materials are used in Physical Vapor Deposition (PVD) processes, where materials are heated and evaporated to form a thin film on a substrate. These are critical for applications in optics, wear protection, and decorative coatings.

Boat crucibles are used as containers for evaporation materials during PVD processes. They help to uniformly evaporate materials onto the substrate for thin film formation.

Sputtering uses energetic particles to eject material from a target, while evaporation involves heating a material until it vaporizes and deposits on a substrate. Both are common methods in Physical Vapor Deposition (PVD) for creating thin films.

Consider the material composition, purity, target size, and application-specific requirements such as the thickness and uniformity of the film.

Yes, we offer customized sputtering targets, evaporation materials, and crucibles to meet specific customer requirements for size, material composition, and purity.

Yes, we can assist in selecting the most suitable material based on your application, whether it’s for optical coatings, semiconductor fabrication, or decorative finishes.

Yes, we offer both bulk and small quantities of sputtering targets, evaporation materials, and spherical powders to support research, prototyping, and development projects.

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