Thin Film Materials Logo
Generic selectors
Exact matches only
Search in title
Search in content
Post Type Selectors
Antimony (Sb) Evaporation Materials

VD0535 Antimony (Sb) Evaporation Materials

Material Type：Antimony
Symbol：Sb
Color/Appearance：Silvery, Lustrous Gray, Semi-metallic
Purity：99.9% ~ 99.999%
Shape：Powder/ Granule/ Custom-made

TFM provides high-purity antimony evaporation materials, establishing itself as a leading manufacturer and supplier in the industry. We offer these materials in various forms, including powder and granule, with customized options available upon request.

MSDS File

Introduction

Antimony (Sb) Evaporation Materials are high-purity metallic sources widely used in thermal and electron-beam evaporation processes for semiconductor, optical, and functional thin film applications. As a group V element, antimony plays a critical role in compound semiconductors, phase-change materials, infrared devices, and alloy thin films. Controlled evaporation of Sb enables precise composition tuning in advanced deposition systems.

Detailed Description

Our Antimony Evaporation Materials are refined from high-purity raw metal and processed into forms suitable for vacuum deposition systems. Due to antimony’s relatively low melting point and moderate vapor pressure characteristics, it is well suited for both thermal resistance heating and electron-beam evaporation under high vacuum conditions.

Careful control of metallic impurities and oxygen content is essential, as contaminants can significantly affect film conductivity, optical absorption, and compound semiconductor performance. Materials are available in shot, granule, pellet, and custom shapes to match different crucible types and evaporation sources. Particle size distribution can be tailored to ensure stable evaporation rates and minimize spitting during heating.

Applications

Antimony (Sb) Evaporation Materials are widely used in:

  • III–V compound semiconductor fabrication (e.g., InSb, GaSb)

  • Phase-change memory and chalcogenide materials

  • Infrared detector thin films

  • Alloying element in thin film deposition

  • Thermoelectric material research

  • Academic and industrial R&D in semiconductor physics

Technical Parameters

ParameterTypical Value / RangeImportance
MaterialAntimony (Sb)Group V semiconductor element
Purity99.9% – 99.999%Reduces defect density in films
FormPellets / Granules / Shot / CustomCompatible with evaporation sources
Particle Size1 – 6 mm (custom available)Ensures stable evaporation
Melting Point~630 °CSuitable for thermal evaporation
Evaporation MethodThermal / E-beamMatches PVD system requirements

Comparison with Related Materials

MaterialKey AdvantageTypical Application
Antimony (Sb)Essential Group V elementIII–V semiconductors
Arsenic (As)Narrow bandgap compoundsHigh-speed electronics
Bismuth (Bi)Low melting pointThermoelectrics
Selenium (Se)Chalcogenide filmsPhase-change materials

FAQ

QuestionAnswer
Can Sb purity be customized?Yes, multiple purity grades up to 5N are available.
Is antimony suitable for thermal evaporation?Yes, its melting point and vapor pressure make it compatible with thermal and e-beam methods.
How is evaporation stability ensured?Controlled particle size and clean surface preparation reduce spitting and contamination.
How is the material packaged?Vacuum-sealed or inert-gas packed in moisture-resistant containers.

Packaging

Our Antimony (Sb) Evaporation Materials are meticulously tagged and labeled externally to ensure efficient identification and maintain high standards of quality control. We take great care to prevent any potential damage during storage and transportation, ensuring the materials arrive in optimal condition for immediate use.

Conclusion

Antimony (Sb) Evaporation Materials provide a dependable solution for high-purity thin film deposition in semiconductor and optoelectronic applications. With controlled purity, customizable forms, and stable evaporation characteristics, Sb is well suited for compound semiconductor growth, phase-change research, and advanced functional coatings.
For detailed specifications and a quotation, please contact us at sales@thinfilmmaterials.com.

Ordering Table

Material Size Quantity Purity Part Number
Antimony 1mm - 3mm Pieces 1 lb. 99.999% EVMSB501141
Antimony 1mm - 3mm Pieces 25 g 99.999% EVMSB501141A
Antimony 1mm - 3mm Pieces 50 g 99.999% EVMSB501141B
Antimony 1mm - 3mm Pieces 100 g 99.999% EVMSB501141D
Antimony 1mm - 3mm Pieces 500 g 99.999% EVMSB501141T
Antimony 3mm - 6mm Pieces 25 g 99.999% EVMSB5036MMA
Order Now

Antimony (Sb) Granules 5N 3–6 mm 300 g, Sb 95% Disc Shape Ø30×1mm 5pcs

Reviews

There are no reviews yet.

Be the first to review “VD0535 Antimony (Sb) Evaporation Materials”

Your email address will not be published. Required fields are marked *

Related Products

Related products

FAQ

  • They are high‐purity substances (e.g. metals, alloys, or compounds) used in thermal or electron‐beam evaporation processes to form thin films on substrates.

  • Typically, they’re processed into a form (often ingots, pellets, or wires) that can be efficiently vaporized. Preparation emphasizes high purity and controlled composition to ensure film quality.

  • Thermal evaporation and electron-beam (e-beam) evaporation are the two main techniques, where material is heated (or bombarded with electrons) until it vaporizes and then condenses on the substrate.

  • Thermal evaporation heats the material directly (often using a resistive heater), while e-beam evaporation uses a focused electron beam to locally heat and vaporize the source material—each method offering different control and energy efficiency.

  • Key parameters include source temperature, vacuum level, deposition rate, substrate temperature, and the distance between the source and the substrate. These factors influence film uniformity, adhesion, and microstructure.

  • Evaporation generally produces high-purity films with excellent control over thickness, and it is especially suitable for materials with relatively low melting points or high vapor pressures.

  • Challenges include issues with step coverage (due to line-of-sight deposition), shadowing effects on complex topographies, and possible re-evaporation of material from the substrate if temperature isn’t properly controlled.

  • Common evaporation materials include noble metals (e.g., gold, silver), semiconductors (e.g., silicon, germanium), metal oxides, and organic compounds—each chosen for its specific optical, electrical, or mechanical properties.

  • Selection depends on desired film properties (conductivity, optical transparency, adhesion), compatibility with the evaporation process, and the final device application (semiconductor, optical coating, etc.).

  • Optimizing substrate temperature, deposition rate, and chamber vacuum are critical for ensuring that the film adheres well and forms the intended microstructure without defects.

  • Troubleshooting may involve checking the source material’s purity, ensuring stable source temperature, verifying the vacuum level, adjusting the substrate’s position or temperature, and monitoring deposition rate fluctuations.

While evaporation tends to yield very high purity films with excellent thickness control, it is limited by its line-of-sight nature. In contrast, sputtering can deposit films more uniformly on complex surfaces and is more versatile for a broader range of materials.

 

Shopping Cart
Scroll to Top