ST0428 Bismuth Dysprosium Iron Gallate Sputtering Target, Bi2DyFe4GaO12

Bismuth Dysprosium Iron Gallate Sputtering Target Description

Bismuth dysprosium iron gallate is composed of bismuth, dysprosium, iron, gallium, and oxide with the chemical formula of Bi0.9Ca0.1FeO3. High-purity bismuth dysprosium iron gallate sputtering targets play a huge role in deposition processes to ensure high-quality deposited film. TFM specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability.

Our bismuth dysprosium iron gallate sputtering targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

Related products: Bismuth Sputtering Target, Dysprosium Sputtering Target, Gallium Sputtering Target, Iron Sputtering Target

Bismuth Dysprosium Iron Gallate Sputtering Target Specification

We also offer other customized shapes and sizes of the sputtering targets; please Contact Us for more information.

Bismuth Dysprosium Iron Gallate Sputtering Target Packaging

Our bismuth dysprosium iron gallate sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition. TFM ensures that all products are clearly tagged and labeled externally for efficient identification and quality control.

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TFM offers Bismuth Dysprosium Iron Gallate Sputtering Targets in various forms, purities, sizes, and prices. We specialize in high-purity thin film deposition materials with optimal density and minimal grain sizes, which are ideal for semiconductor, CVD, and PVD applications in display and optics. Contact Us for current pricing on sputtering targets and other deposition materials that are not listed.