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VD0539 Cadmium (Cd) Evaporation Materials

Catalog No.VD0539
MaterialCadmium (Cd)
Purity99.9% ~ 99.999%
ShapePowder/ Granule/ Custom-made

TFM supplies Cadmium Evaporation Materials and is a leading manufacturer and supplier of high-purity Cadmium Evaporating Materials, along with a wide variety of other evaporation materials. Available forms include powder, granules, and custom shapes upon request.

MSDS File

Cadmium Evaporation Materials Description

High-purity cadmium evaporation materials are crucial for producing high-quality deposited films in various deposition processes. TFM excels in manufacturing cadmium evaporating materials with purity levels reaching up to 99.999%. Our commitment to stringent quality assurance practices guarantees the reliability and performance of our products.

cadmium evaporation materials

Cadmium Evaporation Materials Specification

Material TypeCadmium
SymbolCd
Color/AppearanceSilvery Gray, Metallic
Melting Point321 °C
Density8.64 g/cm3

Cadmium Evaporation Materials Applications

Cadmium evaporation materials are essential in several deposition processes, including semiconductor deposition, Chemical Vapor Deposition (CVD), and Physical Vapor Deposition (PVD). They are also used in optics for a variety of applications such as wear protection, decorative coatings, and display technologies. Their high purity and performance are critical for achieving precise and effective results in these advanced technologies.

Cadmium Evaporation Materials Packaging

We ensure that our cadmium evaporation pellets are handled with utmost care to avoid any damage during storage and transportation. This meticulous approach preserves the pellets’ quality, maintaining their original condition and ensuring reliable performance.

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FAQ

  • They are high‐purity substances (e.g. metals, alloys, or compounds) used in thermal or electron‐beam evaporation processes to form thin films on substrates.

  • Typically, they’re processed into a form (often ingots, pellets, or wires) that can be efficiently vaporized. Preparation emphasizes high purity and controlled composition to ensure film quality.

  • Thermal evaporation and electron-beam (e-beam) evaporation are the two main techniques, where material is heated (or bombarded with electrons) until it vaporizes and then condenses on the substrate.

  • Thermal evaporation heats the material directly (often using a resistive heater), while e-beam evaporation uses a focused electron beam to locally heat and vaporize the source material—each method offering different control and energy efficiency.

  • Key parameters include source temperature, vacuum level, deposition rate, substrate temperature, and the distance between the source and the substrate. These factors influence film uniformity, adhesion, and microstructure.

  • Evaporation generally produces high-purity films with excellent control over thickness, and it is especially suitable for materials with relatively low melting points or high vapor pressures.

  • Challenges include issues with step coverage (due to line-of-sight deposition), shadowing effects on complex topographies, and possible re-evaporation of material from the substrate if temperature isn’t properly controlled.

  • Common evaporation materials include noble metals (e.g., gold, silver), semiconductors (e.g., silicon, germanium), metal oxides, and organic compounds—each chosen for its specific optical, electrical, or mechanical properties.

  • Selection depends on desired film properties (conductivity, optical transparency, adhesion), compatibility with the evaporation process, and the final device application (semiconductor, optical coating, etc.).

  • Optimizing substrate temperature, deposition rate, and chamber vacuum are critical for ensuring that the film adheres well and forms the intended microstructure without defects.

  • Troubleshooting may involve checking the source material’s purity, ensuring stable source temperature, verifying the vacuum level, adjusting the substrate’s position or temperature, and monitoring deposition rate fluctuations.

While evaporation tends to yield very high purity films with excellent thickness control, it is limited by its line-of-sight nature. In contrast, sputtering can deposit films more uniformly on complex surfaces and is more versatile for a broader range of materials.

 

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