ST0415 Cadmium Oxide Sputtering Target, CdO

Chemical Formula: CdO
Catalog Number: ST0415
CAS Number: 1306-19-0
Purity: 99.9%, 99.95%, 99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Cadmium Oxide sputtering target  come in various forms, purities, sizes, and prices. Thin Film Materials (TFM) manufactures and supplies top-quality sputtering targets at competitive prices.

Cadmium Oxide Sputtering Target Description

The Cadmium Oxide Sputtering Target is a type of oxide ceramic sputtering target composed of cadmium and oxygen.

CadmiumCadmium is a chemical element with the symbol “Cd” and an atomic number of 48. The name “cadmium” originates from the Latin name for the mineral calmine, ‘cadmia.’ It was first mentioned in 1817 and observed by scientists S. L. Hermann, F. Stromeyer, and J.C.H. Roloff, who also accomplished and announced its isolation. Cadmium is located in Period 5 and Group 12 of the periodic table, belonging to the d-block elements. Its relative atomic mass is approximately 112.411 Daltons, with the number in parentheses indicating a margin of uncertainty.

Related: Cadmium  Sputtering Target

Cadmium Oxide Sputtering Target Specifications

Material TypeCadmium Oxide
SymbolCdO
Color/AppearanceWhite Target
Melting Point900-1000 °C (1652-1832 ° F)
Boiling Point1,559° C (2,838° F)
Density8.15 g/cm3
Available SizesDia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

We also offer other customized shapes and sizes of the sputtering targets; please Contact Us for more information.

Packing

The cadmium oxide sputtering targets from TFM are clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage that might occur during storage or transportation, ensuring the product arrives in perfect condition.

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TFM offers Cadmium Oxide Sputtering Targets in various forms, purities, sizes, and prices. We specialize in high-purity thin film deposition materials with optimal density and minimal grain sizes, which are ideal for semiconductor, CVD, and PVD applications in display and optics. Contact Us for current pricing on sputtering targets and other deposition materials that are not listed.

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FAQ

Sputtering targets are materials used in thin-film deposition processes to create coatings on substrates. They are used in industries like semiconductors, optics, photovoltaics, and electronics.

Evaporation materials are used in Physical Vapor Deposition (PVD) processes, where materials are heated and evaporated to form a thin film on a substrate. These are critical for applications in optics, wear protection, and decorative coatings.

Boat crucibles are used as containers for evaporation materials during PVD processes. They help to uniformly evaporate materials onto the substrate for thin film formation.

Sputtering uses energetic particles to eject material from a target, while evaporation involves heating a material until it vaporizes and deposits on a substrate. Both are common methods in Physical Vapor Deposition (PVD) for creating thin films.

Consider the material composition, purity, target size, and application-specific requirements such as the thickness and uniformity of the film.

Yes, we offer customized sputtering targets, evaporation materials, and crucibles to meet specific customer requirements for size, material composition, and purity.

Yes, we can assist in selecting the most suitable material based on your application, whether it’s for optical coatings, semiconductor fabrication, or decorative finishes.

Yes, we offer both bulk and small quantities of sputtering targets, evaporation materials, and spherical powders to support research, prototyping, and development projects.

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