Product Overview
Calcium Ruthenate Sputtering Target (CaRuO3) is a composition-specific sputtering target for thin-film deposition and PVD process development. The practical specification normally includes chemistry, purity, dimensions, density, target configuration, and any bonding or backing requirement needed by the sputtering cathode.
Material and Deposition Characteristics
Power mode and process conditions should be selected according to the target conductivity, thermal behavior, and the requirements of the cathode system. For less common materials, conservative initial power density and film-composition verification are good practice.
Technical Data
| Parameter | Typical Value / Range | Importance |
|---|---|---|
| Purity | ≥ 99.9% (oxide basis typical) | Ensures phase purity and stable electrical behavior |
| Phase Structure | Single-phase Perovskite | Critical for predictable film properties |
| Density | ≥ 95–99% of theoretical | Reduces arcing and ensures stable sputtering |
| Diameter | 25 – 150 mm (custom available) | Compatible with sputtering systems |
| Thickness | 3 – 6 mm (typical) | Influences target lifetime |
| Sputtering Method | RF / Pulsed DC | Suitable for oxide ceramic targets |
| Material | Key Advantage | Typical Application |
|---|---|---|
| CaRuO₃ | Conductive perovskite with strong lattice matching | Oxide electrodes |
| SrRuO₃ | Ferromagnetic perovskite conductor | Spintronic devices |
| LaNiO₃ | Metallic oxide with high conductivity | Transparent electrodes |
| IrO₂ | Excellent chemical stability | Electrochemical electrodes |
| Question | Answer |
|---|---|
| Can the CaRuO₃ composition be customized? | Yes, slight stoichiometric adjustments and dimensions can be tailored based on deposition requirements. |
| Is RF sputtering required? | Yes, RF magnetron sputtering is typically used for oxide ceramic targets. |
| Does oxygen flow need to be controlled? | Yes, maintaining appropriate oxygen partial pressure is essential to ensure film stoichiometry and conductivity. |
| What substrates are compatible? | SrTiO₃, LaAlO₃, NdGaO₃, and other perovskite-type substrates. |
| How is the target packaged? | Vacuum-sealed packaging with protective cushioning and export-grade cartons or wooden crates. |
Typical Thin-Film Applications
- Thin-film research and materials-development projects requiring a composition-specific sputtering source
- Semiconductor, optical, energy, electronic, or laboratory coatings depending on the material system
- Custom R&D work where target composition, purity, and geometry need to be specified together
Target Configuration and Ordering Considerations
For quotation and manufacturability review, provide target size, thickness, purity or alloy composition, quantity, and the sputtering gun or cathode model if known. If a bonded assembly is required, include backing-plate material, bonding preference, and any dimensional tolerances, surface-finish needs, or inspection-document requirements. TFM can also review customer drawings or old-target samples for replacement builds.
Frequently Asked Questions
What is the main reason to use a Calcium Ruthenate sputtering target?
It provides a composition-specific source for thin-film deposition when the target material itself is important to the desired film chemistry or process.
How should the sputtering mode for Calcium Ruthenate be selected?
The power mode should be chosen according to target conductivity, thermal behavior, and equipment capability. Less-conductive materials are commonly evaluated with RF power.
Why are density and microstructure important for Calcium Ruthenate targets?
These factors can influence erosion stability, thermal behavior, particle generation, and the risk of cracking or local hot spots.
Can Calcium Ruthenate be supplied with a backing plate?
Yes. If the material is brittle or the cathode requires it, a bonded configuration can be reviewed according to target size, thickness, cooling, and power.
Does target composition always equal film composition?
No. Film chemistry may differ because of sputtering yields, process conditions, substrate temperature, re-sputtering, and chamber history. Film verification is recommended when composition matters.
What should I provide to request a quotation for Calcium Ruthenate?
Please provide the composition, purity, dimensions, quantity, target configuration, cathode details, and any drawing or inspection requirements.
Reviews
There are no reviews yet.