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ceriumiii-fluoride

VD0776 Cerium(III) Fluoride Evaporation Materials, CeF3

Catalog No.VD0776
MaterialCerium Fluoride (CeF3)
Purity99.9% ~ 99.99%
ShapePowder/ Granule/ Custom-made

TFM stands out as a top manufacturer and supplier of high purity Cerium(III) Fluoride evaporation materials, as well as a diverse range of other evaporation materials. Our products are available in both powder and granule forms, with options for customized forms tailored to specific needs upon request.

MSDS File

TFM: High-Purity Cerium(III) Fluoride Evaporation Materials

At TFM, our Cerium(III) Fluoride evaporation materials are like the gold standard in the world of film deposition. Chemically known as CeF3, these high-purity materials are crucial for creating top-quality deposited films, much like a high-precision tool is essential for a perfect cut.

Cerium(III) Fluoride Evaporation Materials Specification

Material TypeCerium(III) Fluoride
SymbolCeF3
Appearance/ColorWhite, crystalline solid
Melting Point1,460 °C (2,660 °F; 1,730 K)
Density6.16 g/cm3 (at 20 °C)
Purity99.9% ~ 99.99%
ShapePowder/ Granule/ Custom-made

Think of our specifications as the recipe for a high-end dish; each detail contributes to the final quality, ensuring our materials meet the highest standards for performance and reliability.

Applications

Cerium(III) Fluoride evaporation materials are like versatile ingredients in a chef’s pantry, essential for various deposition techniques including:

  • Semiconductor Deposition: Similar to how a key ingredient is vital for a specific recipe, these materials are crucial in making semiconductors.
  • Chemical Vapor Deposition (CVD) and Physical Vapor Deposition (PVD): Just as different cooking methods require specific ingredients, CVD and PVD rely on these materials for optimal results.
  • Optics: Used in wear protection, decorative coatings, and displays, much like high-quality materials enhance both the look and durability of a product.

Packaging

Our Cerium(III) Fluoride materials are packaged with the same care as a delicate gift, ensuring they arrive in perfect condition. Clear labeling and robust packaging prevent any mishaps during storage or transport, much like a well-packed box keeps its contents safe.

Contact Us

TFM offers various forms of Cerium(III) Fluoride, including tablets, granules, rods, and wires—think of it as having multiple formats of your favorite tool to suit different needs. Custom shapes and quantities are available upon request. We also provide related products like evaporation sources and crucibles, similar to having all the necessary accessories for a complete toolkit. For pricing and inquiries, reach out to us directly.

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FAQ

  • They are high‐purity substances (e.g. metals, alloys, or compounds) used in thermal or electron‐beam evaporation processes to form thin films on substrates.

  • Typically, they’re processed into a form (often ingots, pellets, or wires) that can be efficiently vaporized. Preparation emphasizes high purity and controlled composition to ensure film quality.

  • Thermal evaporation and electron-beam (e-beam) evaporation are the two main techniques, where material is heated (or bombarded with electrons) until it vaporizes and then condenses on the substrate.

  • Thermal evaporation heats the material directly (often using a resistive heater), while e-beam evaporation uses a focused electron beam to locally heat and vaporize the source material—each method offering different control and energy efficiency.

  • Key parameters include source temperature, vacuum level, deposition rate, substrate temperature, and the distance between the source and the substrate. These factors influence film uniformity, adhesion, and microstructure.

  • Evaporation generally produces high-purity films with excellent control over thickness, and it is especially suitable for materials with relatively low melting points or high vapor pressures.

  • Challenges include issues with step coverage (due to line-of-sight deposition), shadowing effects on complex topographies, and possible re-evaporation of material from the substrate if temperature isn’t properly controlled.

  • Common evaporation materials include noble metals (e.g., gold, silver), semiconductors (e.g., silicon, germanium), metal oxides, and organic compounds—each chosen for its specific optical, electrical, or mechanical properties.

  • Selection depends on desired film properties (conductivity, optical transparency, adhesion), compatibility with the evaporation process, and the final device application (semiconductor, optical coating, etc.).

  • Optimizing substrate temperature, deposition rate, and chamber vacuum are critical for ensuring that the film adheres well and forms the intended microstructure without defects.

  • Troubleshooting may involve checking the source material’s purity, ensuring stable source temperature, verifying the vacuum level, adjusting the substrate’s position or temperature, and monitoring deposition rate fluctuations.

While evaporation tends to yield very high purity films with excellent thickness control, it is limited by its line-of-sight nature. In contrast, sputtering can deposit films more uniformly on complex surfaces and is more versatile for a broader range of materials.

 

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