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CF Flanged Quartz (Fused Silica) Non-Magnetic Viewports

Features of CF Flanged Quartz (Fused Silica) Non-Magnetic Viewports:

  • Constructed using premium-grade materials adhering to Ultra-High Vacuum (UHV) standards.
  • Suitable for integration with vacuum systems capable of achieving UHV conditions.
  • Sealable with fully annealed copper gaskets to minimize stress-induced effects.
  • In case of material deposition during processes, we highly recommend utilizing a viewport shutter, as deposits can degrade and compromise the optical clarity of the lens.

Charts

Ordering Table

Drawing Flange / Mounting Window Material View Area Window Thickness Flange Material Thermal Range Flatness PartNumber
Tooltip DN16CF (1.33" OD) Corning HPFS 7980 Fused Silica 0.63 0.085 316LN SS -100C to 200C λ/4 @ 632nm Transmitted Wavefront VPZL-133DUNM
Tooltip DN16CF (1.33" OD) Corning HPFS 7980 Fused Silica 0.60 0.085 Titanium (Grade 5) -100C to 200C λ/4 @ 632nm Transmitted Wavefront VPZL-133DUTI
Tooltip DN16CF (1.33" OD) Corning HPFS 7980 Fused Silica Excimer Grade 193 0.63 0.085 316LN SS -100C to 200C λ/4 @ 632nm Transmitted Wavefront VPZL-133EUNM
Tooltip DN16CF (1.33" OD) Corning HPFS 7980 Fused Silica Excimer Grade 193 0.60 0.085 Titanium (Grade 5) -100C to 200C λ/4 @ 632nm Transmitted Wavefront VPZL-133EUTI
Tooltip DN16CF (1.33" OD) Corning HPFS 7980 Fused Silica 0.63 0.085 316LN SS -100C to 200C 10 Waves @ 632nm Transmitted Wavefront VPZL-133QNM
Tooltip DN16CF (1.33" OD) Corning HPFS 7980 Fused Silica 0.60 0.085 Titanium (Grade 5) -100C to 200C 10 Waves @ 632nm Transmitted Wavefront VPZL-133QTI
Tooltip DN35CF-DN40CF (2.75" OD) Corning HPFS 7980 Fused Silica 1.40 0.125 316LN SS -100C to 200C λ/4 @ 632nm Transmitted Wavefront VPZL-275DUNM
Tooltip DN35CF-DN40CF (2.75" OD) Corning HPFS 7980 Fused Silica 1.40 0.125 Titanium (Grade 5) -100C to 200C λ/4 @ 632nm Transmitted Wavefront VPZL-275DUTI
Tooltip DN35CF-DN40CF (2.75" OD) Corning HPFS 7980 Fused Silica Excimer Grade 193 1.40 0.125 316LN SS -100C to 200C λ/4 @ 632nm Transmitted Wavefront VPZL-275EUNM
Tooltip DN35CF-DN40CF (2.75" OD) Corning HPFS 7980 Fused Silica Excimer Grade 193 1.40 0.125 Titanium (Grade 5) -100C to 200C λ/4 @ 632nm Transmitted Wavefront VPZL-275EUTI
Tooltip DN35CF-DN40CF (2.75" OD) Corning HPFS 7980 Fused Silica 1.40 0.125 316LN SS -100C to 200C 10 Waves @ 632nm Transmitted Wavefront VPZL-275QNM
Tooltip DN35CF-DN40CF (2.75" OD) Corning HPFS 7980 Fused Silica 1.40 0.125 Titanium (Grade 5) -100C to 200C 10 Waves @ 632nm Transmitted Wavefront VPZL-275QTI
Tooltip DN63CF (4.50" OD) Corning HPFS 7980 Fused Silica 2.69 0.250 Titanium (Grade 5) -100C to 200C λ/4 @ 632nm Transmitted Wavefront VPZL-450DUTI
Tooltip DN63CF (4.50" OD) Corning HPFS 7980 Fused Silica 2.69 0.250 316LN SS -100C to 200C λ/4 @ 632nm Transmitted Wavefront VPZL-450DUNM
Tooltip DN63CF (4.50" OD) Corning HPFS 7980 Fused Silica Excimer Grade 193 2.69 0.250 316LN SS -100C to 200C λ/4 @ 632nm Transmitted Wavefront VPZL-450EUNM
Tooltip DN63CF (4.50" OD) Corning HPFS 7980 Fused Silica Excimer Grade 193 2.69 0.250 Titanium (Grade 5) -100C to 200C λ/4 @ 632nm Transmitted Wavefront VPZL-450EUTI
Tooltip DN63CF (4.50" OD) Corning HPFS 7980 Fused Silica 2.69 0.250 316LN SS -100C to 200C 10 Waves @ 632nm Transmitted Wavefront VPZL-450QNM
Tooltip DN63CF (4.50" OD) Corning HPFS 7980 Fused Silica 2.69 0.250 Titanium (Grade 5) -100C to 200C 10 Waves @ 632nm Transmitted Wavefront VPZL-450QTI
Tooltip DN100CF (6.00" OD) Corning HPFS 7980 Fused Silica 3.88 0.250 316LN SS -100C to 200C 10 Waves @ 632nm Transmitted Wavefront VPZL-600QNM
Tooltip DN100CF (6.00" OD) Corning HPFS 7980 Fused Silica 3.88 0.250 316LN SS -100C to 200C λ/4 @ 632nm Transmitted Wavefront VPZL-600DUNM
Tooltip DN100CF (6.00" OD) Corning HPFS 7980 Fused Silica Excimer Grade 193 3.88 0.250 316LN SS -100C to 200C λ/4 @ 632nm Transmitted Wavefront VPZL-600EUNM

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FAQ

Sputtering targets are materials used in thin-film deposition processes to create coatings on substrates. They are used in industries like semiconductors, optics, photovoltaics, and electronics.

Evaporation materials are used in Physical Vapor Deposition (PVD) processes, where materials are heated and evaporated to form a thin film on a substrate. These are critical for applications in optics, wear protection, and decorative coatings.

Boat crucibles are used as containers for evaporation materials during PVD processes. They help to uniformly evaporate materials onto the substrate for thin film formation.

Sputtering uses energetic particles to eject material from a target, while evaporation involves heating a material until it vaporizes and deposits on a substrate. Both are common methods in Physical Vapor Deposition (PVD) for creating thin films.

Consider the material composition, purity, target size, and application-specific requirements such as the thickness and uniformity of the film.

Yes, we offer customized sputtering targets, evaporation materials, and crucibles to meet specific customer requirements for size, material composition, and purity.

Yes, we can assist in selecting the most suitable material based on your application, whether it’s for optical coatings, semiconductor fabrication, or decorative finishes.

Yes, we offer both bulk and small quantities of sputtering targets, evaporation materials, and spherical powders to support research, prototyping, and development projects.

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