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CF Flanged Sapphire Viewports

CF Flanged Sapphire Viewports Features:

  • Constructed using the highest-quality materials to meet Ultra-High Vacuum (UHV) standards.
  • Compatible with vacuum systems capable of achieving UHV levels.
  • Can be sealed using fully annealed copper gaskets to minimize induced strain.
  • If material deposition occurs during the process, a viewport shutter is highly recommended as deposits can damage and degrade the optical properties of the lens.

Charts

Ordering Table

Drawing Flange / Mounting Window Material View Area Window Thickness Flange Material Sleeve Material Thermal Range Parallelism Surface Finish Transmission PartNumber
Tooltip DN16CF (1.33" OD) UV Sapphire 0.59 0.062 304L SS Kovar -100C to 450C <3 Arc Minutes 50/20 Scratch-Dig 50%@250nm (External) VPZL-133S
Tooltip DN16CF (1.33" OD) UV Sapphire 0.46 0.062 304L SS Kovar -100C to 450C <3 Arc Minutes 50/20 Scratch-Dig 50%@250nm (External) VPZL-133SS
Tooltip DN35CF-DN40CF (2.75" OD) DUV Sapphire 0.94 0.080 304L SS Kovar -100C to 450C <3 Arc Minutes 20/10 Scratch-Dig 70%@250nm (External) VPZL-275DUS
Tooltip DN35CF-DN40CF (2.75" OD) UV Sapphire 0.94 0.080 304L SS Kovar -100C to 450C <3 Arc Minutes 50/20 Scratch-Dig 50%@250nm (External) VPZL-275S
Tooltip DN35CF-DN40CF (2.75" OD) UV Sapphire 1.50 0.080 304L SS Kovar -100C to 450C <3 Arc Minutes 50/20 Scratch-Dig 50%@250nm (External) VPZL-275SW
Tooltip DN63CF (4.50" OD) DUV Sapphire 1.44 0.080 304L SS Kovar -100C to 450C <3 Arc Minutes 20/10 Scratch-Dig 70%@250nm (External) VPZL-450DUS
Tooltip DN63CF (4.50" OD) DUV Sapphire 1.94 0.094 304L SS Kovar -100C to 450C <3 Arc Minutes 20/10 Scratch-Dig 70%@250nm (External) VPZL-450DUSW
Tooltip DN63CF (4.50" OD) UV Sapphire 1.44 0.080 304L SS Kovar -100C to 450C <3 Arc Minutes 50/20 Scratch-Dig 50%@250nm (External) VPZL-450S
Tooltip DN63CF (4.50" OD) UV Sapphire 1.94 0.094 304L SS Kovar -100C to 450C <3 Arc Minutes 50/20 Scratch-Dig 50%@250nm (External) VPZL-450SW

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FAQ

Sputtering targets are materials used in thin-film deposition processes to create coatings on substrates. They are used in industries like semiconductors, optics, photovoltaics, and electronics.

Evaporation materials are used in Physical Vapor Deposition (PVD) processes, where materials are heated and evaporated to form a thin film on a substrate. These are critical for applications in optics, wear protection, and decorative coatings.

Boat crucibles are used as containers for evaporation materials during PVD processes. They help to uniformly evaporate materials onto the substrate for thin film formation.

Sputtering uses energetic particles to eject material from a target, while evaporation involves heating a material until it vaporizes and deposits on a substrate. Both are common methods in Physical Vapor Deposition (PVD) for creating thin films.

Consider the material composition, purity, target size, and application-specific requirements such as the thickness and uniformity of the film.

Yes, we offer customized sputtering targets, evaporation materials, and crucibles to meet specific customer requirements for size, material composition, and purity.

Yes, we can assist in selecting the most suitable material based on your application, whether it’s for optical coatings, semiconductor fabrication, or decorative finishes.

Yes, we offer both bulk and small quantities of sputtering targets, evaporation materials, and spherical powders to support research, prototyping, and development projects.

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