Thin Film Materials Logo
Generic selectors
Exact matches only
Search in title
Search in content
Post Type Selectors
chromiumii-carbide-evaporation-materials-1

VD0761 Chromium(II) Carbide Evaporation Materials, Cr3C2

Catalog No.VD0761
MaterialChromium Carbide (Cr3C2)
Purity99.5%
ShapePowder/ Granule/ Custom-made

At TFM, we excel in producing and supplying top-quality Chromium(II) Carbide evaporation materials, known for their exceptional purity. Our range of evaporation materials includes both powder and granule forms to suit various applications. Additionally, we offer customization options to meet specific needs, ensuring you receive the exact form and specifications required for your projects.

MSDS File

Chromium(II) Carbide Evaporation Materials Overview

TFM offers premium Chromium(II) Carbide evaporation materials, known for their high purity and exceptional quality. With the chemical formula Cr3C2, this carbide ceramic material is crucial for achieving high-quality films in deposition processes. TFM guarantees up to 99.9995% purity for these materials, supported by stringent quality assurance procedures.

Chromium(II) Carbide Evaporation Materials Specification

Material TypeChromium(II) Carbide
SymbolCr3C2
Appearance/ColorGray Solid
Melting Point1,895 °C (3,443 °F; 2,168 K)
Density6.68 g/cm3
Purity99.5%
ShapePowder/ Granule/ Custom-made

Applications

Chromium(II) Carbide evaporation materials are utilized in various applications, including:

  • Deposition Processes: Perfect for semiconductor deposition, chemical vapor deposition (CVD), and physical vapor deposition (PVD).
  • Optics: Suitable for wear protection, decorative coatings, and display technologies.

Packaging and Handling

Our Chromium(II) Carbide evaporation materials are carefully packaged to ensure safe handling and maintain quality throughout transport. Each package is clearly labeled for efficient identification and quality control, reducing the risk of damage.

Contact Us

TFM is a leading manufacturer and supplier of high-purity Chromium(II) Carbide evaporation materials. We offer various shapes, such as tablets, granules, rods, and wires, with custom options available. Additionally, TFM provides evaporation sources, boats, filaments, crucibles, heaters, and e-beam crucible liners. For current pricing and information on other materials not listed, please contact us directly.

Reviews

There are no reviews yet.

Be the first to review “VD0761 Chromium(II) Carbide Evaporation Materials, Cr3C2”

Your email address will not be published. Required fields are marked *

Related Products

Related products

FAQ

  • They are high‐purity substances (e.g. metals, alloys, or compounds) used in thermal or electron‐beam evaporation processes to form thin films on substrates.

  • Typically, they’re processed into a form (often ingots, pellets, or wires) that can be efficiently vaporized. Preparation emphasizes high purity and controlled composition to ensure film quality.

  • Thermal evaporation and electron-beam (e-beam) evaporation are the two main techniques, where material is heated (or bombarded with electrons) until it vaporizes and then condenses on the substrate.

  • Thermal evaporation heats the material directly (often using a resistive heater), while e-beam evaporation uses a focused electron beam to locally heat and vaporize the source material—each method offering different control and energy efficiency.

  • Key parameters include source temperature, vacuum level, deposition rate, substrate temperature, and the distance between the source and the substrate. These factors influence film uniformity, adhesion, and microstructure.

  • Evaporation generally produces high-purity films with excellent control over thickness, and it is especially suitable for materials with relatively low melting points or high vapor pressures.

  • Challenges include issues with step coverage (due to line-of-sight deposition), shadowing effects on complex topographies, and possible re-evaporation of material from the substrate if temperature isn’t properly controlled.

  • Common evaporation materials include noble metals (e.g., gold, silver), semiconductors (e.g., silicon, germanium), metal oxides, and organic compounds—each chosen for its specific optical, electrical, or mechanical properties.

  • Selection depends on desired film properties (conductivity, optical transparency, adhesion), compatibility with the evaporation process, and the final device application (semiconductor, optical coating, etc.).

  • Optimizing substrate temperature, deposition rate, and chamber vacuum are critical for ensuring that the film adheres well and forms the intended microstructure without defects.

  • Troubleshooting may involve checking the source material’s purity, ensuring stable source temperature, verifying the vacuum level, adjusting the substrate’s position or temperature, and monitoring deposition rate fluctuations.

While evaporation tends to yield very high purity films with excellent thickness control, it is limited by its line-of-sight nature. In contrast, sputtering can deposit films more uniformly on complex surfaces and is more versatile for a broader range of materials.

 

Shopping Cart
Scroll to Top