Product Overview
Chromium Cobalt Nickel High-Entropy Alloy (HEA) Sputtering Target (Co/Cr/Ni) is an alloy sputtering target used to deposit composition-controlled alloy films. Relative to a pure elemental target, the alloying constituents are introduced to tune electrical, magnetic, optical, mechanical, or adhesion-related film properties. For this reason, alloy ratio, homogeneity, purity basis, and the intended film composition should be defined clearly in the procurement specification.
Material and Deposition Characteristics
Many alloy targets are electrically conductive and can be compatible with DC or pulsed-DC magnetron sputtering, subject to the actual alloy composition and equipment capability. The target composition is not always reproduced exactly in the deposited film because preferential sputtering, re-sputtering, substrate heating, and process gas conditions can shift the final ratio. For composition-sensitive work, deposited-film analysis should be part of process qualification.
Technical Data
| Parameter | Typical Value / Range | Importance |
|---|---|---|
| Material | Chromium Cobalt Nickel High-Entropy Alloy | Multi-principal alloy system for advanced thin-film deposition |
| Composition | Co/Cr/Ni, custom atomic ratio available | Determines film structure and functional properties |
| Purity | 99.9% – 99.99% | Lower impurity levels support cleaner film growth |
| Diameter | 25 – 300 mm (custom) | Fits a wide range of sputtering cathodes |
| Thickness | 3 – 8 mm | Influences target lifetime and sputtering stability |
| Density | High-density consolidated alloy | Improves erosion uniformity and process consistency |
| Bonding | Copper backing plate or custom bonding available | Enhances thermal management during sputtering |
| Manufacturing Route | Cast, hot-pressed, or powder-metallurgy based | Affects homogeneity and microstructure |
| Surface Condition | Precision machined, ready to install | Supports reliable plasma ignition and even sputtering |
| Material | Key Advantage | Typical Application |
|---|---|---|
| Chromium Cobalt Nickel HEA Sputtering Target | Balanced multi-element alloy design | HEA thin films, protective and functional coatings |
| Chromium Sputtering Target | Strong corrosion and wear contribution | Hard coatings, adhesion layers |
| Cobalt Nickel Sputtering Target | Useful magnetic and structural alloy combination | Magnetic films, electronic coatings |
| Nickel Chromium Sputtering Target | Established resistive and protective film material | Thin-film resistors, oxidation-resistant coatings |
| Question | Answer |
|---|---|
| Can the Co/Cr/Ni HEA sputtering target be customized? | Yes. Composition ratio, purity, dimensions, and bonding structure can be customized based on your sputtering system and film design goals. |
| Why use a pre-alloyed HEA target instead of separate elemental targets? | A pre-alloyed target can simplify deposition, improve repeatability, and help maintain more consistent film composition. |
| Is this target suitable for research applications? | Yes. It is widely suited to universities, laboratories, and R&D teams studying high-entropy alloy thin films and advanced coatings. |
| What backing plate options are available? | Copper backing plates and other custom bonding solutions are commonly available to improve heat transfer and target stability. |
| How is the target packaged for shipment? | It is typically vacuum-sealed, carefully cushioned, and packed in export-safe cartons or wooden crates depending on size and weight. |
Typical Thin-Film Applications
- Chromium Cobalt Nickel High-Entropy Alloy (HEA) alloy films where composition control is important to electrical, mechanical, magnetic, or optical performance
- Multilayer stacks, adhesion/barrier layers, conductive films, or functional coatings depending on the alloy system
- Research and production programs that require customized alloy ratios and repeatable sputtering behavior
Target Configuration and Ordering Considerations
For quotation and manufacturability review, provide target size, thickness, purity or alloy composition, quantity, and the sputtering gun or cathode model if known. If a bonded assembly is required, include backing-plate material, bonding preference, and any dimensional tolerances, surface-finish needs, or inspection-document requirements. TFM can also review customer drawings or old-target samples for replacement builds.
Frequently Asked Questions
Can the composition of a Chromium Cobalt Nickel High-Entropy Alloy (HEA) sputtering target be customized?
Yes. For alloy targets, the required ratio should be specified clearly in wt% or at%. TFM can review custom compositions together with purity, dimensions, and manufacturability.
Will an alloy target always produce a film with the same composition?
Not necessarily. Preferential sputtering, substrate heating, process gas, and re-sputtering effects can shift the deposited composition relative to the nominal target chemistry. Film analysis should be used when the composition is critical.
Is a Chromium Cobalt Nickel High-Entropy Alloy (HEA) alloy target compatible with DC magnetron sputtering?
Many metallic alloy targets are electrically conductive and can be compatible with DC or pulsed-DC sputtering, but the final choice depends on the actual alloy system and equipment.
Why is alloy homogeneity important in a Chromium Cobalt Nickel High-Entropy Alloy (HEA) target?
A uniform alloy distribution helps support stable erosion and reduces local composition variation across the target, which in turn helps improve run-to-run consistency.
Can a Chromium Cobalt Nickel High-Entropy Alloy (HEA) target be supplied bonded?
Yes. Where the cathode or thermal load requires it, TFM can supply bonded assemblies. Backing-plate material, target thickness, bonding method, and operating power should be reviewed together.
What should I include in an RFQ for Chromium Cobalt Nickel High-Entropy Alloy (HEA)?
Specify the alloy composition, purity basis, dimensions, quantity, backing requirement, cathode model or drawing, and any tolerance, inspection, or documentation requirements.
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