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Indium Sputtering Target with Backing Plate, from TFM

Indium Sputtering Target, In

Chemical Formula: In
Catalog Number: TFM-SPT-0266
CAS Number: 7440-74-6
Purity: 99.99%, 99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Indium sputtering target  come in various forms, purities, sizes, and prices. Thin Film Materials (TFM) manufactures and supplies top-quality sputtering targets at competitive prices.

CoA_In_TRG

 

 

Product Overview

Indium Sputtering Target (In) is a conductive sputtering target used to deposit elemental thin films where purity, film cleanliness, and stable metallic sputtering behavior are important. For thin-film applications, the practical selection criteria are not limited to the target chemistry alone: purity grade, target density, dimensions, grain structure, surface finish, and backing configuration can all influence process stability and film quality.


Indium
Indium Sputtering Target with Backing Plate and Keeper, from TFM
Indium Sputtering Target with Backing Plate and Keeper, from TFM

Material and Deposition Characteristics

Because the target is electrically conductive, DC magnetron sputtering is often applicable, although pulsed-DC or other power modes may also be used depending on the deposition system and film target. For high-specification films, target grain structure, residual stress, and surface preparation can influence erosion uniformity and the morphology of the deposited layer. When higher power loading or system-specific mounting is involved, a bonded target assembly may also be considered.

Technical Data

Material TypeIndium
SymbolIn
Color/AppearanceSilvery Lustrous Gray, Metallic
Melting Point157 °C
Type of BondElastomer
Density7.3 g/cc
Thermal Conductivity82 W/m.K
Coefficient of Thermal Expansion32.1 x 10-6/K
CommentsWets W and Cu. Use Mo liner. Low Melting Point materials not ideal for sputtering.
Available SizesDia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

Typical Thin-Film Applications

  • Indium thin films for conductive, optical, catalytic, or functional coating development
  • Semiconductor, energy, electronic, or laboratory PVD research depending on the element
  • Projects requiring a pure elemental source in planar or custom target geometry

Target Configuration and Ordering Considerations

For quotation and manufacturability review, provide target size, thickness, purity or alloy composition, quantity, and the sputtering gun or cathode model if known. If a bonded assembly is required, include backing-plate material, bonding preference, and any dimensional tolerances, surface-finish needs, or inspection-document requirements. TFM can also review customer drawings or old-target samples for replacement builds.

Frequently Asked Questions

Can Indium sputtering targets be used with DC magnetron sputtering?

Yes. Conductive metallic targets are commonly processed with DC magnetron sputtering, although pulsed-DC or other modes may also be used depending on the equipment and film objective.

What purity grade should I choose for a Indium target?

The required purity should be selected from the contamination limits and performance needs of the deposited film. Higher purity can reduce unwanted impurities, but the optimum grade should match the application rather than default to the highest available level.

Why do density and microstructure matter for Indium targets?

Target density, grain structure, and residual stress can influence erosion behavior, process stability, and the morphology of the deposited film. These factors become more important as film-quality requirements become tighter.

Can a Indium target be bonded to a copper backing plate?

Yes. A bonded assembly may be used when the cathode design requires a backing plate or when improved support and heat transfer are desirable. The bonding method should be matched to target thickness and operating conditions.

What are common applications of sputtered Indium films?

Typical uses include conductive layers, metallization, reflective or protective coatings, and composition-specific PVD research. The exact application depends on the properties of the element and the final film stack.

What information should I send TFM for a custom Indium target?

Please provide target dimensions, thickness, purity, quantity, target style, backing-plate requirement, cathode model if known, and any tolerance, surface-finish, inspection, or documentation requirements.

Order Now

Ø1" × 3.18 mm, Indium, 4N, Ø1" × 3.18 mm, Indium, 4N5, Ø1" × 6.35 mm, Indium, 4N, Ø1" × 6.35 mm, Indium, 4N5, Ø2" × 3.18 mm, Indium, 4N, Ø2" × 3.18 mm, Indium, 4N5, Ø2" × 6.35 mm, Indium, 4N, Ø2" × 6.35 mm, Indium, 4N5, Ø3" × 3.18 mm, Indium, 4N, Ø3" × 3.18 mm, Indium, 4N5, Ø3" × 6.35 mm, Indium, 4N, Ø3" × 6.35 mm, Indium, 4N5, Ø4" × 3.18 mm, Indium, 4N, Ø4" × 3.18 mm, Indium, 4N5, Ø4" × 6.35 mm, Indium, 4N, Ø4" × 6.35 mm, Indium, 4N5

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FAQ

It’s the source material (in solid form) used in sputter deposition to eject atoms or molecules that then form a thin film on a substrate.

Targets can be pure metals (e.g., gold, copper, aluminum), ceramics (e.g., Al₂O₃, SiO₂, TiO₂), alloys, or composites—chosen based on the film’s desired properties.

 

They are produced by processes such as melting/casting for metals or sintering (often with hot isostatic pressing) for ceramics and composite targets to ensure high density and purity.

 

In a vacuum chamber, a plasma (typically argon) bombards the target, ejecting atoms that travel and condense on a substrate, forming a thin film.

 

Key factors include the target’s purity, density, grain structure, and the sputtering yield (i.e. how many atoms are ejected per incident ion), as well as operating conditions like power density and gas pressure.

 

Operators monitor target erosion (often by measuring the depth of the eroded “race track”) or track total energy delivered (kilowatt-hours) until it reaches a threshold that can compromise film quality.

 

Fragile materials (such as many ceramics or certain oxides) and precious metals often require a backing plate to improve cooling, mechanical stability, and to allow thinner targets that reduce material costs.

 

DC sputtering is used for conductive targets, while RF sputtering is necessary for insulating targets (like many oxides) because it prevents charge buildup on the target’s surface.

 

In reactive sputtering, a reactive gas (e.g., oxygen or nitrogen) is introduced to form compound films on the substrate, but it may also “poison” the target surface if not carefully controlled.

 

Many manufacturers prefer to control raw material quality by sourcing their own powders; using external powders can risk impurities and inconsistent target properties.

 

Targets should be stored in clean, dry conditions (often in original packaging or re-wrapped in protective materials) and handled with gloves to avoid contamination, ensuring optimal performance during deposition.

Deposition rate depends on factors such as target material and composition, power density, working gas pressure, substrate distance, and the configuration of the sputtering system (e.g., magnetron design).

 
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