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VD0542 Chromium (Cr) Evaporation Materials

Material Type: Chromium
Symbol：Cr
Color/Appearance：Silvery, Metallic
Purity：99.5% ~ 99.99%
Shape：Powder/ Granule/ Custom-made

TFM is a top provider of high-purity chromium evaporation materials, offering a diverse range of evaporation products. As a leading manufacturer and supplier, we deliver chromium materials in various forms, including powders, granules, and custom shapes tailored to your specific needs. Our extensive selection ensures we can meet the demands of a wide range of applications.

MSDS File

Chromium Evaporation Materials Description

High-purity chromium evaporation materials play a vital role in deposition processes, ensuring the production of high-quality films. TFM specializes in manufacturing chromium evaporating materials with purity levels up to 99.99%, backed by rigorous quality assurance to ensure reliability and consistency.

Chromium, with a melting point of 1,857°C, a density of 7.2 g/cm³, and a vapor pressure of 10⁻⁴ Torr at 1,157°C, is a versatile element. Its name, derived from the Greek word “chroma,” meaning color, reflects the vibrant hues of its compounds. In the automotive industry, chromium is widely used to create the shiny, durable coatings seen on wheels and bumpers. Beyond automotive applications, chromium is also utilized in various vacuum processes, including automotive glass coatings, photovoltaic cell production, battery manufacturing, and the creation of decorative and corrosion-resistant coatings.

chromium evaporation materials

Chromium Evaporation Materials Specification

Material TypeChromium
SymbolCr
Automatic Number24
Color/AppearanceSilvery, Metallic, Solid State
Melting Point1,857°C
Theoretical Density7.2 g/cc

Chromium Evaporation Materials Applications

Chromium evaporation materials are utilized in a variety of deposition processes, including semiconductor deposition, Chemical Vapor Deposition (CVD), and Physical Vapor Deposition (PVD). In the field of optics, they are employed for applications such as wear protection, decorative coatings, and display technologies. Their high purity and versatility make them essential for achieving precise and durable results in these advanced applications.

Chromium Evaporation Materials Packing

We take special care in handling our chromium evaporation pellets to prevent any damage during storage and transportation. This careful approach ensures that the pellets maintain their original quality, delivering consistent and reliable performance upon use.

Ordering Table 

Material Size Quantity Purity Part Number
Chromium 0.8mm - 6mm Pieces 1 lb. 99.95% EVMCR35
Chromium 0.8mm - 6mm Pieces 25 g 99.95% EVMCR35A
Chromium 0.8mm - 6mm Pieces 50 g 99.95% EVMCR35B
Chromium 0.8mm - 6mm Pieces 100 g 99.95% EVMCR35D
Chromium 0.8mm - 6mm Pieces 250 g 99.95% EVMCR35J
Chromium 0.8mm - 6mm Pieces 1 kg 99.95% EVMCR35KG
Chromium 0.8mm - 6mm Pieces 500 g 99.95% EVMCR35T

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FAQ

  • They are high‐purity substances (e.g. metals, alloys, or compounds) used in thermal or electron‐beam evaporation processes to form thin films on substrates.

  • Typically, they’re processed into a form (often ingots, pellets, or wires) that can be efficiently vaporized. Preparation emphasizes high purity and controlled composition to ensure film quality.

  • Thermal evaporation and electron-beam (e-beam) evaporation are the two main techniques, where material is heated (or bombarded with electrons) until it vaporizes and then condenses on the substrate.

  • Thermal evaporation heats the material directly (often using a resistive heater), while e-beam evaporation uses a focused electron beam to locally heat and vaporize the source material—each method offering different control and energy efficiency.

  • Key parameters include source temperature, vacuum level, deposition rate, substrate temperature, and the distance between the source and the substrate. These factors influence film uniformity, adhesion, and microstructure.

  • Evaporation generally produces high-purity films with excellent control over thickness, and it is especially suitable for materials with relatively low melting points or high vapor pressures.

  • Challenges include issues with step coverage (due to line-of-sight deposition), shadowing effects on complex topographies, and possible re-evaporation of material from the substrate if temperature isn’t properly controlled.

  • Common evaporation materials include noble metals (e.g., gold, silver), semiconductors (e.g., silicon, germanium), metal oxides, and organic compounds—each chosen for its specific optical, electrical, or mechanical properties.

  • Selection depends on desired film properties (conductivity, optical transparency, adhesion), compatibility with the evaporation process, and the final device application (semiconductor, optical coating, etc.).

  • Optimizing substrate temperature, deposition rate, and chamber vacuum are critical for ensuring that the film adheres well and forms the intended microstructure without defects.

  • Troubleshooting may involve checking the source material’s purity, ensuring stable source temperature, verifying the vacuum level, adjusting the substrate’s position or temperature, and monitoring deposition rate fluctuations.

While evaporation tends to yield very high purity films with excellent thickness control, it is limited by its line-of-sight nature. In contrast, sputtering can deposit films more uniformly on complex surfaces and is more versatile for a broader range of materials.

 

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