Product Overview
Chromium Nickel Sputtering Target (Cr/Ni) is an alloy sputtering target used to deposit composition-controlled alloy films. Relative to a pure elemental target, the alloying constituents are introduced to tune electrical, magnetic, optical, mechanical, or adhesion-related film properties. For this reason, alloy ratio, homogeneity, purity basis, and the intended film composition should be defined clearly in the procurement specification.
Material and Deposition Characteristics
Many alloy targets are electrically conductive and can be compatible with DC or pulsed-DC magnetron sputtering, subject to the actual alloy composition and equipment capability. The target composition is not always reproduced exactly in the deposited film because preferential sputtering, re-sputtering, substrate heating, and process gas conditions can shift the final ratio. For composition-sensitive work, deposited-film analysis should be part of process qualification.
Technical Data
| Parameter | Typical Value / Range | Importance |
|---|---|---|
| Purity | 99.9% – 99.99% | Ensures stable thin film composition |
| Composition | Cr/Ni ratios customizable (e.g., 80/20, 70/30) | Determines corrosion resistance and film properties |
| Diameter | 25 – 300 mm (custom) | Compatible with most sputtering systems |
| Thickness | 3 – 6 mm | Influences sputtering efficiency and target lifetime |
| Density | ≥ 99% theoretical density | Improves deposition uniformity and stability |
| Bonding | Copper backing plate / Indium bonded | Enhances heat transfer during sputtering |
| Material | Key Advantage | Typical Application |
|---|---|---|
| Chromium Nickel (Cr/Ni) | Balanced corrosion resistance and durability | Protective and functional thin films |
| Chromium (Cr) | High hardness and strong adhesion | Adhesion layers and wear-resistant coatings |
| Nickel (Ni) | Good corrosion resistance and electrical conductivity | Electronic and electroplated coatings |
| Question | Answer |
|---|---|
| Can the Cr/Ni composition be customized? | Yes. The chromium-to-nickel ratio can be adjusted depending on the desired coating properties and application requirements. |
| What sputtering methods are suitable for Cr/Ni targets? | Cr/Ni sputtering targets are commonly used in DC magnetron sputtering and other PVD deposition processes. |
| Are bonded sputtering targets available? | Yes. Copper backing plates with indium bonding are often supplied to improve heat dissipation and target stability. |
| What purity levels are available? | Standard purity levels typically range from 99.9% to 99.99%. |
| Can custom target sizes be manufactured? | Yes. Targets can be produced in various diameters, thicknesses, and shapes to match specific sputtering systems. |
Typical Thin-Film Applications
- Chromium Nickel alloy films where composition control is important to electrical, mechanical, magnetic, or optical performance
- Multilayer stacks, adhesion/barrier layers, conductive films, or functional coatings depending on the alloy system
- Research and production programs that require customized alloy ratios and repeatable sputtering behavior
Target Configuration and Ordering Considerations
For quotation and manufacturability review, provide target size, thickness, purity or alloy composition, quantity, and the sputtering gun or cathode model if known. If a bonded assembly is required, include backing-plate material, bonding preference, and any dimensional tolerances, surface-finish needs, or inspection-document requirements. TFM can also review customer drawings or old-target samples for replacement builds.
Frequently Asked Questions
Can the composition of a Chromium Nickel sputtering target be customized?
Yes. For alloy targets, the required ratio should be specified clearly in wt% or at%. TFM can review custom compositions together with purity, dimensions, and manufacturability.
Will an alloy target always produce a film with the same composition?
Not necessarily. Preferential sputtering, substrate heating, process gas, and re-sputtering effects can shift the deposited composition relative to the nominal target chemistry. Film analysis should be used when the composition is critical.
Is a Chromium Nickel alloy target compatible with DC magnetron sputtering?
Many metallic alloy targets are electrically conductive and can be compatible with DC or pulsed-DC sputtering, but the final choice depends on the actual alloy system and equipment.
Why is alloy homogeneity important in a Chromium Nickel target?
A uniform alloy distribution helps support stable erosion and reduces local composition variation across the target, which in turn helps improve run-to-run consistency.
Can a Chromium Nickel target be supplied bonded?
Yes. Where the cathode or thermal load requires it, TFM can supply bonded assemblies. Backing-plate material, target thickness, bonding method, and operating power should be reviewed together.
What should I include in an RFQ for Chromium Nickel?
Specify the alloy composition, purity basis, dimensions, quantity, backing requirement, cathode model or drawing, and any tolerance, inspection, or documentation requirements.
Reviews
There are no reviews yet.