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ST1011 Chromium Silicide Sputtering Target, Cr3Si

Chemical FormulaCr3Si
Catalog No.ST1011
CAS Number12018-36-9
Purity99.9%, 99.95%, 99.99%, 99.995%, 99.999%
ShapeDiscs, Plates, Column Targets, Step Targets, Custom-made

Chromium Silicide  sputtering target  come in various forms, purities, sizes, and prices. Thin Film Materials (TFM) manufactures and supplies top-quality sputtering targets at competitive prices.

MSDS File

Chromium Silicide Sputtering Target Description

Chromium Silicide Sputtering Targets are essential materials for thin film deposition in various applications. Comprising chromium (Cr) and silicon (Si), these targets offer unique properties crucial for both electronic and optical uses. They enable the deposition of thin films with high electrical conductivity, thermal stability, and corrosion resistance. Chromium Silicide films are widely used in semiconductor manufacturing, solar cells, sensors, and magnetic storage devices. By providing precise control over film thickness and composition, Chromium Silicide Sputtering Targets support the creation of advanced electronic and optoelectronic components across numerous industrial and research applications.

Related Product: Chromium Sputtering Target, Chromium Cobalt Sputtering Target

Chromium Silicide Sputtering Target Specifications

Compound FormulaCr3Si
Molecular Weight184.07
AppearanceSilver Grey Target
Available SizesDia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″

Thick: 0.125″, 0.250″

Chromium Silicide Sputtering Target Handling Notes

Indium bonding is advised for Chromium Silicide Sputtering Targets due to their characteristics that are not well-suited for traditional sputtering methods, such as brittleness and low thermal conductivity. This material’s low thermal conductivity and susceptibility to thermal shock make indium bonding a practical choice to ensure reliable and effective sputtering processes.

Chromium Silicide Sputtering Target Application

Chromium Silicide (Cr₃Si) Sputtering Targets serve a range of critical applications in thin film deposition, each benefiting from the material’s unique properties:

  • Semiconductor Manufacturing: Cr₃Si thin films are integral to semiconductor fabrication, used in creating transistors, diodes, and integrated circuits. Their high electrical conductivity and thermal stability enhance the performance and reliability of semiconductor devices.
  • Solar Cells: In photovoltaic technology, Cr₃Si thin films improve the efficiency and durability of solar cells. These films play a key role in capturing and converting solar energy into electricity, contributing to the overall performance of solar energy systems.
  • Magnetic Storage Devices: Chromium Silicide is utilized in the production of magnetic storage devices, including hard disk drives (HDDs) and magnetic tapes. The thin films act as recording media or magnetic layers, facilitating data storage and retrieval.
  • Sensors: Cr₃Si thin films are employed in sensors that monitor environmental factors such as temperature, pressure, and gas concentrations. These sensors are essential in automotive, aerospace, and industrial applications for accurate measurement and control.
  • Corrosion Protection: Coatings made from Cr₃Si offer exceptional resistance to oxidation, moisture, and chemical corrosion. These protective layers extend the lifespan of metallic surfaces exposed to harsh conditions.
  • Optical Applications: In optical coatings, Cr₃Si thin films enhance the performance of components such as lenses, mirrors, and filters. These coatings improve durability, reflectivity, and anti-reflective properties, benefiting various optical systems and devices.
  • Research and Development: Cr₃Si Sputtering Targets are used in research laboratories for thin film deposition studies and material characterization. Researchers use these targets to explore and develop new technologies and to better understand the material’s behavior in diverse environments.

Chromium Silicide Sputtering Target Packaging

Our Chromium Silicide Sputtering Target is meticulously managed during storage and transportation to maintain its quality and integrity in its original condition.

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TFM offers Chromium Silicide Sputtering Targets in various forms, purities, sizes, and prices. We specialize in high-purity thin film deposition materials with optimal density and minimal grain sizes, which are ideal for semiconductor, CVD, and PVD applications in display and optics. Contact Us for current pricing on sputtering targets and other deposition materials that are not listed.

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FAQ

Sputtering targets are materials used in thin-film deposition processes to create coatings on substrates. They are used in industries like semiconductors, optics, photovoltaics, and electronics.

Evaporation materials are used in Physical Vapor Deposition (PVD) processes, where materials are heated and evaporated to form a thin film on a substrate. These are critical for applications in optics, wear protection, and decorative coatings.

Boat crucibles are used as containers for evaporation materials during PVD processes. They help to uniformly evaporate materials onto the substrate for thin film formation.

Sputtering uses energetic particles to eject material from a target, while evaporation involves heating a material until it vaporizes and deposits on a substrate. Both are common methods in Physical Vapor Deposition (PVD) for creating thin films.

Consider the material composition, purity, target size, and application-specific requirements such as the thickness and uniformity of the film.

Yes, we offer customized sputtering targets, evaporation materials, and crucibles to meet specific customer requirements for size, material composition, and purity.

Yes, we can assist in selecting the most suitable material based on your application, whether it’s for optical coatings, semiconductor fabrication, or decorative finishes.

Yes, we offer both bulk and small quantities of sputtering targets, evaporation materials, and spherical powders to support research, prototyping, and development projects.

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