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VD0815 Chromium(III) Sulfide Evaporation Materials, Cr2S3

Catalog No.VD0815
MaterialChromium Sulfide (Cr2S3)
Purity99.9%
ShapePowder/ Granule/ Custom-made

TFM is a premier provider of high-purity chromium(III) sulfide evaporation materials. We specialize in offering a range of evaporation materials, including both powder and granule forms. Additionally, we can create customized forms to meet specific requirements upon request. Whether you need standard or tailored solutions, TFM delivers superior quality evaporation materials to meet your needs.

MSDS File
Chromium(III) Sulfide Evaporation Materials Overview

Chromium(III) sulfide, with the chemical formula Cr₂S₃, is a high-purity ceramic evaporation material provided by TFM. This material plays a significant role in deposition processes, ensuring the production of high-quality films. TFM excels in manufacturing evaporation materials with purity levels reaching up to 99.9995%, supported by rigorous quality assurance measures to ensure product consistency and reliability.

Product Details

Material TypeChromium(III) sulfide
SymbolCr2S3
Appearance/ColorBrown to black solid
Melting Point1350 °C
Density3.77 g/cm3
Purity99.9%
ShapePowder/ Granule/ Custom-made

Applications

Chromium(III) sulfide evaporation materials are utilized in various deposition techniques, including:

  • Semiconductor Deposition: Vital for the production of high-quality semiconductor films.
  • Chemical Vapor Deposition (CVD): Used to create thin films with precise composition and thickness control.
  • Physical Vapor Deposition (PVD): Applied in several industries for high-performance and durable coatings.

These materials are particularly beneficial in the optics sector, including applications such as wear-resistant coatings, decorative finishes, and display technologies.

Packaging and Handling

To maintain the quality and integrity of Chromium(III) sulfide evaporation materials, TFM ensures that all materials are clearly labeled for efficient identification and quality control. Packaging is designed to prevent damage during storage and transportation.

Contact Us

TFM is a premier supplier of high-purity Chromium(III) sulfide evaporation materials, available in various forms such as tablets, granules, rods, and wires. Custom shapes and quantities can also be provided to meet specific requirements. In addition to evaporation materials, TFM offers evaporation sources, boats, filaments, crucibles, heaters, and e-beam crucible liners. For the latest pricing and information on our products, please contact us with your inquiry.

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FAQ

  • They are high‐purity substances (e.g. metals, alloys, or compounds) used in thermal or electron‐beam evaporation processes to form thin films on substrates.

  • Typically, they’re processed into a form (often ingots, pellets, or wires) that can be efficiently vaporized. Preparation emphasizes high purity and controlled composition to ensure film quality.

  • Thermal evaporation and electron-beam (e-beam) evaporation are the two main techniques, where material is heated (or bombarded with electrons) until it vaporizes and then condenses on the substrate.

  • Thermal evaporation heats the material directly (often using a resistive heater), while e-beam evaporation uses a focused electron beam to locally heat and vaporize the source material—each method offering different control and energy efficiency.

  • Key parameters include source temperature, vacuum level, deposition rate, substrate temperature, and the distance between the source and the substrate. These factors influence film uniformity, adhesion, and microstructure.

  • Evaporation generally produces high-purity films with excellent control over thickness, and it is especially suitable for materials with relatively low melting points or high vapor pressures.

  • Challenges include issues with step coverage (due to line-of-sight deposition), shadowing effects on complex topographies, and possible re-evaporation of material from the substrate if temperature isn’t properly controlled.

  • Common evaporation materials include noble metals (e.g., gold, silver), semiconductors (e.g., silicon, germanium), metal oxides, and organic compounds—each chosen for its specific optical, electrical, or mechanical properties.

  • Selection depends on desired film properties (conductivity, optical transparency, adhesion), compatibility with the evaporation process, and the final device application (semiconductor, optical coating, etc.).

  • Optimizing substrate temperature, deposition rate, and chamber vacuum are critical for ensuring that the film adheres well and forms the intended microstructure without defects.

  • Troubleshooting may involve checking the source material’s purity, ensuring stable source temperature, verifying the vacuum level, adjusting the substrate’s position or temperature, and monitoring deposition rate fluctuations.

While evaporation tends to yield very high purity films with excellent thickness control, it is limited by its line-of-sight nature. In contrast, sputtering can deposit films more uniformly on complex surfaces and is more versatile for a broader range of materials.

 

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