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Chromium(III) Sulfide Evaporation Materials

VD0815 Chromium(III) Sulfide Evaporation Materials, Cr2S3

Catalog No.VD0815
MaterialChromium Sulfide (Cr2S3)
Purity99.9%
ShapePowder/ Granule/ Custom-made

TFM is a premier provider of high-purity chromium(III) sulfide evaporation materials. We specialize in offering a range of evaporation materials, including both powder and granule forms. Additionally, we can create customized forms to meet specific requirements upon request. Whether you need standard or tailored solutions, TFM delivers superior quality evaporation materials to meet your needs.

MSDS File

Introduction

Chromium(III) Sulfide (Cr₂S₃) Evaporation Materials are specialized source materials used in vacuum thin-film deposition for functional, protective, and electronic coatings. As a transition-metal sulfide, Cr₂S₃ is valued for its chemical stability, wear resistance, and unique electrical and optical characteristics, making it suitable for both applied research and advanced industrial coating processes.

Detailed Description

Our Chromium(III) Sulfide Evaporation Materials are synthesized from high-purity chromium and sulfur under carefully controlled conditions to ensure accurate stoichiometry and phase stability. Maintaining the correct Cr:S ratio is critical, as deviations can affect film conductivity, structural integrity, and long-term performance.

The material is supplied in evaporation-ready forms such as pellets, pieces, or granules, optimized for stable thermal or electron-beam evaporation. Controlled particle size and density help achieve smooth evaporation behavior, minimizing spitting and compositional fluctuation during deposition. High purity levels reduce the presence of oxygen and metallic contaminants, resulting in dense, uniform films with reproducible properties.

Cr₂S₃ evaporation materials are compatible with high-vacuum (HV) and ultra-high-vacuum (UHV) systems. They can be used in single-source evaporation or integrated into multilayer coating designs where chromium sulfide layers provide functional or protective performance. Custom sizing, purity grades, and packaging options are available to match specific evaporation sources and process requirements.

Applications

Chromium(III) Sulfide Evaporation Materials are commonly used in:

  • Wear-resistant and protective thin-film coatings

  • Functional sulfide layers in electronic and sensor devices

  • Optical and infrared-related thin films

  • Tribological and corrosion-resistant coatings

  • Academic and industrial R&D on transition-metal sulfides

They are particularly suitable for applications requiring stable sulfide phases and controlled film composition.

Technical Parameters

ParameterTypical Value / RangeImportance
Chemical FormulaCr₂S₃Defines material phase and film properties
Purity99.9% – 99.99%Reduces impurities affecting film quality
FormPellets / Pieces / GranulesCompatible with various evaporation sources
Deposition MethodThermal / E-beam evaporationSupports standard vacuum processes
Vacuum CompatibilityHV / UHVEnsures low contamination during deposition
PackagingVacuum-sealedProtects against oxidation and moisture

Comparison with Related Materials

MaterialKey AdvantageTypical Application
Chromium(III) Sulfide (Cr₂S₃)Chemical stability, wear resistanceFunctional & protective coatings
Chromium MetalHigh hardness, conductivityMetallic and barrier layers
Molybdenum Disulfide (MoS₂)Solid lubricationLow-friction coatings

FAQ

QuestionAnswer
Can Cr₂S₃ be used for e-beam evaporation?Yes, it is suitable for both thermal and e-beam evaporation when properly conditioned.
Are different particle sizes available?Yes, particle size and form can be customized for specific crucibles or sources.
How is stoichiometry controlled?Controlled synthesis and batch testing ensure consistent Cr₂S₃ composition.
Do you supply small research quantities?Yes, both small R&D and bulk quantities are available.

Packaging

Our Chromium(III) Sulfide Evaporation Materials are carefully vacuum-sealed, clearly labeled, and packed with protective materials to maintain chemical integrity and prevent contamination during storage and transportation.

Conclusion

Chromium(III) Sulfide (Cr₂S₃) Evaporation Materials offer a reliable, high-purity solution for depositing stable sulfide thin films with functional and protective properties. With controlled stoichiometry, flexible material forms, and compatibility with standard vacuum evaporation techniques, they are well suited for demanding research and industrial applications.
For detailed specifications and a quotation, please contact us at sales@thinfilmmaterials.com.

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FAQ

  • They are high‐purity substances (e.g. metals, alloys, or compounds) used in thermal or electron‐beam evaporation processes to form thin films on substrates.

  • Typically, they’re processed into a form (often ingots, pellets, or wires) that can be efficiently vaporized. Preparation emphasizes high purity and controlled composition to ensure film quality.

  • Thermal evaporation and electron-beam (e-beam) evaporation are the two main techniques, where material is heated (or bombarded with electrons) until it vaporizes and then condenses on the substrate.

  • Thermal evaporation heats the material directly (often using a resistive heater), while e-beam evaporation uses a focused electron beam to locally heat and vaporize the source material—each method offering different control and energy efficiency.

  • Key parameters include source temperature, vacuum level, deposition rate, substrate temperature, and the distance between the source and the substrate. These factors influence film uniformity, adhesion, and microstructure.

  • Evaporation generally produces high-purity films with excellent control over thickness, and it is especially suitable for materials with relatively low melting points or high vapor pressures.

  • Challenges include issues with step coverage (due to line-of-sight deposition), shadowing effects on complex topographies, and possible re-evaporation of material from the substrate if temperature isn’t properly controlled.

  • Common evaporation materials include noble metals (e.g., gold, silver), semiconductors (e.g., silicon, germanium), metal oxides, and organic compounds—each chosen for its specific optical, electrical, or mechanical properties.

  • Selection depends on desired film properties (conductivity, optical transparency, adhesion), compatibility with the evaporation process, and the final device application (semiconductor, optical coating, etc.).

  • Optimizing substrate temperature, deposition rate, and chamber vacuum are critical for ensuring that the film adheres well and forms the intended microstructure without defects.

  • Troubleshooting may involve checking the source material’s purity, ensuring stable source temperature, verifying the vacuum level, adjusting the substrate’s position or temperature, and monitoring deposition rate fluctuations.

While evaporation tends to yield very high purity films with excellent thickness control, it is limited by its line-of-sight nature. In contrast, sputtering can deposit films more uniformly on complex surfaces and is more versatile for a broader range of materials.

 

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