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VD0610 Chromium Vanadium Evaporation Materials, Cr/V

Catalog No.VD0610
MaterialChromium Vanadium (Cr/V)
Purity99.9% ~ 99.9%
ShapePowder/ Granule/ Custom-made

TFM provides high-purity chromium-vanadium evaporation materials, essential for a range of advanced applications. As a leading manufacturer and supplier, we offer these materials in various forms, including powder, granule, and custom-made options, to meet your specific needs.

MSDS File

High-Purity Chromium-Vanadium Evaporation Materials

Chromium-vanadium evaporation materials are crucial for producing high-quality deposited films in various deposition processes. TFM specializes in manufacturing these materials with exceptional purity, reaching up to 99.9995%, ensuring reliability through stringent quality assurance procedures.

Chromium-Vanadium Evaporation Materials Specifications

  • Material Type: Chromium-Vanadium
  • Color/Appearance: Gray
  • Purity: 99.9% to 99.9995%
  • Available Shapes: Powder, granule, and custom-made forms

Applications of Chromium-Vanadium Evaporation Materials

These materials are employed in:

  • Deposition Processes: Essential for semiconductor deposition, chemical vapor deposition (CVD), and physical vapor deposition (PVD).
  • Optics: Used for wear protection, decorative coatings, and display technologies.

Product Packaging and Handling

Our chromium-vanadium evaporation materials are carefully packaged to prevent damage during storage and transportation, ensuring they retain their high quality.

Contact Us

As a premier manufacturer and supplier, TFM offers chromium-vanadium evaporation materials in various forms, including powder and granule, with custom options available upon request. For current pricing and inquiries about our evaporation materials and other deposition products, please contact us.

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FAQ

  • They are high‐purity substances (e.g. metals, alloys, or compounds) used in thermal or electron‐beam evaporation processes to form thin films on substrates.

  • Typically, they’re processed into a form (often ingots, pellets, or wires) that can be efficiently vaporized. Preparation emphasizes high purity and controlled composition to ensure film quality.

  • Thermal evaporation and electron-beam (e-beam) evaporation are the two main techniques, where material is heated (or bombarded with electrons) until it vaporizes and then condenses on the substrate.

  • Thermal evaporation heats the material directly (often using a resistive heater), while e-beam evaporation uses a focused electron beam to locally heat and vaporize the source material—each method offering different control and energy efficiency.

  • Key parameters include source temperature, vacuum level, deposition rate, substrate temperature, and the distance between the source and the substrate. These factors influence film uniformity, adhesion, and microstructure.

  • Evaporation generally produces high-purity films with excellent control over thickness, and it is especially suitable for materials with relatively low melting points or high vapor pressures.

  • Challenges include issues with step coverage (due to line-of-sight deposition), shadowing effects on complex topographies, and possible re-evaporation of material from the substrate if temperature isn’t properly controlled.

  • Common evaporation materials include noble metals (e.g., gold, silver), semiconductors (e.g., silicon, germanium), metal oxides, and organic compounds—each chosen for its specific optical, electrical, or mechanical properties.

  • Selection depends on desired film properties (conductivity, optical transparency, adhesion), compatibility with the evaporation process, and the final device application (semiconductor, optical coating, etc.).

  • Optimizing substrate temperature, deposition rate, and chamber vacuum are critical for ensuring that the film adheres well and forms the intended microstructure without defects.

  • Troubleshooting may involve checking the source material’s purity, ensuring stable source temperature, verifying the vacuum level, adjusting the substrate’s position or temperature, and monitoring deposition rate fluctuations.

While evaporation tends to yield very high purity films with excellent thickness control, it is limited by its line-of-sight nature. In contrast, sputtering can deposit films more uniformly on complex surfaces and is more versatile for a broader range of materials.

 

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