ST0079 Cobalt Nickel Chromium Sputtering Target, Co/Ni/Cr

Chemical Formula: Co/Ni/Cr
Catalog Number: ST0079
CAS Number: 7440-48-4 | 7440
Purity: 99.9%, 99.95%, 99.99%, 99.995%, 99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

TFM offers Cobalt Nickel Chromium Sputtering Targets in various forms, purities, sizes, and prices. We specialize in high-purity thin film deposition materials with optimal density and minimal grain sizes, which are ideal for semiconductor, CVD, and PVD applications in display and optics. Contact Us for current pricing on sputtering targets and other deposition materials that are not listed.

Cobalt Nickel Chromium Sputtering Target Description

The cobalt-nickel-chromium sputtering target from TFM is a silvery alloy composed of cobalt (Co), nickel (Ni), and chromium (Cr). This high-quality sputtering material is ideal for applications requiring the unique properties of these three elements.

Cobalt

Cobalt, symbolized as “Co,” is a chemical element whose name comes from the German word ‘kobald,’ meaning goblin. It was first mentioned and observed by G. Brandt in 1732. Cobalt has an atomic number of 27 and is located in Period 4, Group 9 of the d-block in the periodic table. Its relative atomic mass is 58.933195(5) Daltons, with the number in brackets indicating the measurement uncertainty.

Related Product: Cobalt Sputtering Target

Nickel

Nickel, symbolized as “Ni,” is a chemical element whose name is derived from the German word ‘kupfernickel,’ meaning either devil’s copper or St. Nicholas’s copper. It was first mentioned and observed by F. Cronstedt in 1751, who also successfully isolated the element. Nickel has an atomic number of 28 and is located in Period 4, Group 10 of the d-block in the periodic table. Its relative atomic mass is 58.6934(2) Daltons, with the number in brackets indicating the measurement uncertainty.

Related Product: Nickel Sputtering Target

Chromium

Chromium, symbolized as “Cr,” is a chemical element named after the Greek word ‘chroma,’ meaning color. Known and used since before 1 AD, it was notably discovered in connection with the Terracotta Army. Chromium has an atomic number of 24 and is located in Period 4, Group 6 of the d-block in the periodic table. Its relative atomic mass is 51.9961(6) Daltons, with the number in brackets indicating the measurement uncertainty.

Related Product: Chromium Sputtering Target

Cobalt Nickel Chromium Sputtering Target Specification

Material TypeCobalt Nickel Chromium
SymbolCo/Ni/Cr
Color/AppearanceMetallic Target
Thermal Expansion13 µm/m-K
Density9.7 g/cm3
Available SizesDia.: 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

Cobalt Nickel Chromium Sputtering Target Packaging

Our Cobalt Nickel Chromium sputtering targets are meticulously handled to prevent any damage during storage and transportation. This careful handling ensures that our products maintain their original quality and arrive in perfect condition.

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TFM offers  Cobalt Nickel Chromium Sputtering Targets in various forms, purities, sizes, and prices. We specialize in high-purity thin film deposition materials with optimal density and minimal grain sizes, which are ideal for semiconductor, CVD, and PVD applications in display and optics. Contact Us for current pricing on sputtering targets and other deposition materials that are not listed.

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FAQ

Sputtering targets are materials used in thin-film deposition processes to create coatings on substrates. They are used in industries like semiconductors, optics, photovoltaics, and electronics.

Evaporation materials are used in Physical Vapor Deposition (PVD) processes, where materials are heated and evaporated to form a thin film on a substrate. These are critical for applications in optics, wear protection, and decorative coatings.

Boat crucibles are used as containers for evaporation materials during PVD processes. They help to uniformly evaporate materials onto the substrate for thin film formation.

Sputtering uses energetic particles to eject material from a target, while evaporation involves heating a material until it vaporizes and deposits on a substrate. Both are common methods in Physical Vapor Deposition (PVD) for creating thin films.

Consider the material composition, purity, target size, and application-specific requirements such as the thickness and uniformity of the film.

Yes, we offer customized sputtering targets, evaporation materials, and crucibles to meet specific customer requirements for size, material composition, and purity.

Yes, we can assist in selecting the most suitable material based on your application, whether it’s for optical coatings, semiconductor fabrication, or decorative finishes.

Yes, we offer both bulk and small quantities of sputtering targets, evaporation materials, and spherical powders to support research, prototyping, and development projects.

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