Product Overview
Cobalt Nickel Sputtering Target (Co/Ni) is an alloy sputtering target used to deposit composition-controlled alloy films. Relative to a pure elemental target, the alloying constituents are introduced to tune electrical, magnetic, optical, mechanical, or adhesion-related film properties. For this reason, alloy ratio, homogeneity, purity basis, and the intended film composition should be defined clearly in the procurement specification.
Material and Deposition Characteristics
Many alloy targets are electrically conductive and can be compatible with DC or pulsed-DC magnetron sputtering, subject to the actual alloy composition and equipment capability. The target composition is not always reproduced exactly in the deposited film because preferential sputtering, re-sputtering, substrate heating, and process gas conditions can shift the final ratio. For composition-sensitive work, deposited-film analysis should be part of process qualification.
Technical Data
| Parameter | Typical Value / Range | Importance |
|---|---|---|
| Purity | 99.9% – 99.99% | High purity reduces contamination and improves film quality |
| Composition | Co/Ni ratios customizable (e.g., 80/20, 70/30, 50/50) | Tailors magnetic and structural properties |
| Diameter | 25 – 300 mm (custom) | Compatible with various sputtering systems |
| Thickness | 3 – 6 mm | Influences sputtering efficiency and target lifetime |
| Density | ≥ 99% theoretical density | Ensures stable sputtering and uniform film deposition |
| Bonding | Copper backing plate / Indium bonded | Improves heat dissipation and mechanical strength |
| Material | Key Advantage | Typical Application |
|---|---|---|
| Cobalt Nickel (Co/Ni) | Tunable magnetic properties and corrosion resistance | Magnetic thin films and spintronics |
| Cobalt (Co) | Strong magnetism and high Curie temperature | Magnetic recording layers |
| Nickel (Ni) | Good corrosion resistance and ductility | Electroplating and thin film coatings |
| Question | Answer |
|---|---|
| Can the composition of the Co/Ni target be customized? | Yes. The cobalt-to-nickel ratio can be adjusted to meet specific magnetic or deposition requirements. |
| Are bonded sputtering targets available? | Yes. Copper backing plates with indium bonding are commonly used to improve thermal conductivity and target stability. |
| What deposition methods are compatible with Co/Ni targets? | They are widely used in DC magnetron sputtering, RF sputtering, and other PVD processes. |
| What purity levels are typically available? | Standard purities range from 99.9% to 99.99%, depending on application requirements. |
| Can targets be produced in non-standard sizes? | Yes. Custom diameters, thicknesses, and shapes are available for different sputtering systems. |
Typical Thin-Film Applications
- Cobalt Nickel alloy films where composition control is important to electrical, mechanical, magnetic, or optical performance
- Multilayer stacks, adhesion/barrier layers, conductive films, or functional coatings depending on the alloy system
- Research and production programs that require customized alloy ratios and repeatable sputtering behavior
Target Configuration and Ordering Considerations
For quotation and manufacturability review, provide target size, thickness, purity or alloy composition, quantity, and the sputtering gun or cathode model if known. If a bonded assembly is required, include backing-plate material, bonding preference, and any dimensional tolerances, surface-finish needs, or inspection-document requirements. TFM can also review customer drawings or old-target samples for replacement builds.
Frequently Asked Questions
Can the composition of a Cobalt Nickel sputtering target be customized?
Yes. For alloy targets, the required ratio should be specified clearly in wt% or at%. TFM can review custom compositions together with purity, dimensions, and manufacturability.
Will an alloy target always produce a film with the same composition?
Not necessarily. Preferential sputtering, substrate heating, process gas, and re-sputtering effects can shift the deposited composition relative to the nominal target chemistry. Film analysis should be used when the composition is critical.
Is a Cobalt Nickel alloy target compatible with DC magnetron sputtering?
Many metallic alloy targets are electrically conductive and can be compatible with DC or pulsed-DC sputtering, but the final choice depends on the actual alloy system and equipment.
Why is alloy homogeneity important in a Cobalt Nickel target?
A uniform alloy distribution helps support stable erosion and reduces local composition variation across the target, which in turn helps improve run-to-run consistency.
Can a Cobalt Nickel target be supplied bonded?
Yes. Where the cathode or thermal load requires it, TFM can supply bonded assemblies. Backing-plate material, target thickness, bonding method, and operating power should be reviewed together.
What should I include in an RFQ for Cobalt Nickel?
Specify the alloy composition, purity basis, dimensions, quantity, backing requirement, cathode model or drawing, and any tolerance, inspection, or documentation requirements.
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