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VD0546 Erbium Evaporation Materials, Er

Material Type: Erbium
Symbol: Er
Color/Appearance: Silvery White, Metallic
Purity: 99.9%
Shape: Powder/ Granule/ Custom-made

TFM is a top manufacturer and supplier of high-purity erbium evaporation materials. We provide a broad range of evaporation materials, including erbium, available in various forms such as powder, granules, and customized options to meet specific needs.

 

MSDS File

Erbium Evaporation Materials Description

Erbium, a member of the Lanthanide series within the rare earth elements, stands out due to its unique properties. This metal is notably malleable and soft, and it maintains stability when exposed to air. Erbium is known for emitting a distinctive pink hue, which makes it valuable in various imaging and optical technologies. Compared to some other rare earth metals, erbium oxidizes at a slower rate and exhibits high electrical resistivity.

While erbium is usually found in limited quantities and combined with other rare earth elements, its pure form has niche applications. One notable use is as an alloying agent with titanium, which enhances certain material properties.

In deposition processes, the quality of erbium evaporation materials is critical for producing high-grade films. TFM excels in supplying high-purity erbium evaporation materials, offering products with purity levels up to 99.9%. TFM adheres to rigorous quality control measures to ensure the dependability and performance of its materials.

 

erbium evaporation materials

Erbium Evaporation Materials Specification

Material TypeErbium
SymbolEr
Color/AppearanceSilvery White, Metallic
Melting Point1,529 °C
Thermal Conductivity15 W/m.K
Density9.05 g/cc
SynonymsEr Pellets, Er Pieces, Er Evaporation Pellet, Erbium Pellets, Erbium Pieces, Erbium Evaporation Pellet

Erbium Evaporation Materials Applications

Erbium is actively used in various deposition techniques essential for creating high-quality materials. It plays a key role in semiconductor deposition processes and is integral to Chemical Vapor Deposition (CVD) and Physical Vapor Deposition (PVD) technologies. These methods are crucial for producing advanced films and coatings.

In the field of optics, erbium has several important applications. It is used to enhance wear resistance in optical components, apply decorative coatings, and improve display technologies. These applications leverage erbium’s unique properties to deliver durability and performance in a range of products.

Erbium Evaporation Materials Packing

We take great care in managing our erbium evaporation materials to avoid any damage during both storage and transit. This meticulous handling guarantees that our products maintain their high quality and arrive in their original condition.

Ordering Table 

Material Size Quantity Purity Part Number
Erbium < 5mm 300 g 99.9% EVMERX3MM-L
Erbium < 5mm 100 g 99.9% EVMERX5MM-D

 

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FAQ

  • They are high‐purity substances (e.g. metals, alloys, or compounds) used in thermal or electron‐beam evaporation processes to form thin films on substrates.

  • Typically, they’re processed into a form (often ingots, pellets, or wires) that can be efficiently vaporized. Preparation emphasizes high purity and controlled composition to ensure film quality.

  • Thermal evaporation and electron-beam (e-beam) evaporation are the two main techniques, where material is heated (or bombarded with electrons) until it vaporizes and then condenses on the substrate.

  • Thermal evaporation heats the material directly (often using a resistive heater), while e-beam evaporation uses a focused electron beam to locally heat and vaporize the source material—each method offering different control and energy efficiency.

  • Key parameters include source temperature, vacuum level, deposition rate, substrate temperature, and the distance between the source and the substrate. These factors influence film uniformity, adhesion, and microstructure.

  • Evaporation generally produces high-purity films with excellent control over thickness, and it is especially suitable for materials with relatively low melting points or high vapor pressures.

  • Challenges include issues with step coverage (due to line-of-sight deposition), shadowing effects on complex topographies, and possible re-evaporation of material from the substrate if temperature isn’t properly controlled.

  • Common evaporation materials include noble metals (e.g., gold, silver), semiconductors (e.g., silicon, germanium), metal oxides, and organic compounds—each chosen for its specific optical, electrical, or mechanical properties.

  • Selection depends on desired film properties (conductivity, optical transparency, adhesion), compatibility with the evaporation process, and the final device application (semiconductor, optical coating, etc.).

  • Optimizing substrate temperature, deposition rate, and chamber vacuum are critical for ensuring that the film adheres well and forms the intended microstructure without defects.

  • Troubleshooting may involve checking the source material’s purity, ensuring stable source temperature, verifying the vacuum level, adjusting the substrate’s position or temperature, and monitoring deposition rate fluctuations.

While evaporation tends to yield very high purity films with excellent thickness control, it is limited by its line-of-sight nature. In contrast, sputtering can deposit films more uniformly on complex surfaces and is more versatile for a broader range of materials.

 

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