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VD0546 Erbium Evaporation Materials, Er

Material Type: Erbium
Symbol: Er
Color/Appearance: Silvery White, Metallic
Purity: 99.9%
Shape: Powder/ Granule/ Custom-made

TFM is a top manufacturer and supplier of high-purity erbium evaporation materials. We provide a broad range of evaporation materials, including erbium, available in various forms such as powder, granules, and customized options to meet specific needs.

 

Introduction

Erbium Evaporation Materials (Er) are high-purity rare earth metal sources used in physical vapor deposition (PVD) processes for optical, semiconductor, and functional thin film applications. Erbium is especially valued for its optical emission at approximately 1.55 µm, a wavelength critical to fiber-optic communications and photonic devices.

In vacuum deposition systems, erbium enables precise rare-earth doping and oxide film formation, supporting the development of advanced optoelectronic components, infrared coatings, and research-grade thin films. Consistent purity and controlled morphology are essential for stable evaporation behavior and reproducible film properties.

Detailed Description

Erbium (Er) is a lanthanide metal with a melting point of approximately 1529 °C and strong affinity for oxygen. It readily forms stable oxides such as Er₂O₃, which are widely used in optical coatings and dielectric layers.

Erbium evaporation materials are typically supplied in:

  • Small pieces or chunks

  • Granules

  • Distilled rods

  • Custom-cut slugs

High-purity grades (99.9% – 99.99%) are available to minimize contamination in sensitive photonic and semiconductor applications. Low oxygen and metallic impurity levels help ensure optical transparency and controlled film composition.

Due to its melting point, erbium is commonly used in electron beam evaporation systems, although thermal evaporation may be suitable for smaller loads. In reactive deposition environments, oxygen partial pressure must be carefully managed to achieve desired oxide stoichiometry.

Key characteristics include:

  • Narrow-band infrared optical emission

  • Strong oxide-forming behavior

  • Good compatibility with co-evaporation systems

  • Stable performance in high-vacuum environments

Erbium is frequently incorporated into host materials to create active optical layers for light amplification and signal processing.

Applications

Erbium Evaporation Materials are widely used in:

  • Optical amplifiers and waveguide devices

  • Er-doped thin films for photonics research

  • Infrared optical coatings

  • High-k dielectric research (Er₂O₃ films)

  • Semiconductor and advanced oxide deposition

  • Solid-state laser materials research

  • Display and functional coating applications

Erbium-doped films are particularly important in optical communication technologies due to their compatibility with standard telecom wavelengths.

Technical Parameters

ParameterTypical Value / RangeImportance
Chemical SymbolErDefines rare-earth optical behavior
Purity99.9% – 99.99%Improves film clarity and device performance
FormPieces / Granules / RodsMatches evaporation source configuration
Melting Point~1529 °CSuitable for e-beam evaporation
Density~9.07 g/cm³Relevant for deposition rate calculations
Recommended MethodE-beam / Reactive EvaporationEnsures stoichiometric control

Custom sizes and packaging options are available based on deposition system requirements.

Comparison with Related Rare Earth Materials

MaterialKey AdvantageTypical Application
Erbium (Er)1.55 µm optical emissionFiber-optic & photonic devices
Ytterbium (Yb)High laser efficiencyHigh-power solid-state lasers
Thulium (Tm)Mid-IR emission rangeInfrared photonics
Neodymium (Nd)Strong visible/near-IR emissionNd:YAG laser systems

Compared to other rare-earth elements, erbium is uniquely suited for telecommunications and integrated photonics due to its emission wavelength compatibility.

FAQ

QuestionAnswer
Is erbium suitable for thermal evaporation?It can be used, but electron beam evaporation is generally preferred for stability.
Can it be used for oxide film deposition?Yes, reactive evaporation can produce Er₂O₃ thin films.
Does it require special storage?Yes, store in a dry or inert environment to minimize surface oxidation.
Is it compatible with co-evaporation systems?Yes, it is often co-evaporated with host materials for doped films.
Are certificates provided?Yes, chemical analysis and batch traceability documentation are available.

Packaging

Our Erbium Evaporation Materials are meticulously tagged and labeled externally to ensure efficient identification and maintain high standards of quality control. Materials are typically vacuum-sealed or packed under inert gas to prevent oxidation during storage and transport, ensuring they arrive in optimal condition.

Conclusion

Erbium Evaporation Materials (Er) provide a reliable solution for photonic, infrared, and functional oxide thin film applications. With controlled purity, stable evaporation performance, and customizable forms, they support advanced research and industrial thin film production.

For detailed specifications and a quotation, please contact us at sales@thinfilmmaterials.com.

Ordering Table 

Material Size Quantity Purity Part Number
Erbium < 5mm 300 g 99.9% EVMERX3MM-L
Erbium < 5mm 100 g 99.9% EVMERX5MM-D

 

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FAQ

  • They are high‐purity substances (e.g. metals, alloys, or compounds) used in thermal or electron‐beam evaporation processes to form thin films on substrates.

  • Typically, they’re processed into a form (often ingots, pellets, or wires) that can be efficiently vaporized. Preparation emphasizes high purity and controlled composition to ensure film quality.

  • Thermal evaporation and electron-beam (e-beam) evaporation are the two main techniques, where material is heated (or bombarded with electrons) until it vaporizes and then condenses on the substrate.

  • Thermal evaporation heats the material directly (often using a resistive heater), while e-beam evaporation uses a focused electron beam to locally heat and vaporize the source material—each method offering different control and energy efficiency.

  • Key parameters include source temperature, vacuum level, deposition rate, substrate temperature, and the distance between the source and the substrate. These factors influence film uniformity, adhesion, and microstructure.

  • Evaporation generally produces high-purity films with excellent control over thickness, and it is especially suitable for materials with relatively low melting points or high vapor pressures.

  • Challenges include issues with step coverage (due to line-of-sight deposition), shadowing effects on complex topographies, and possible re-evaporation of material from the substrate if temperature isn’t properly controlled.

  • Common evaporation materials include noble metals (e.g., gold, silver), semiconductors (e.g., silicon, germanium), metal oxides, and organic compounds—each chosen for its specific optical, electrical, or mechanical properties.

  • Selection depends on desired film properties (conductivity, optical transparency, adhesion), compatibility with the evaporation process, and the final device application (semiconductor, optical coating, etc.).

  • Optimizing substrate temperature, deposition rate, and chamber vacuum are critical for ensuring that the film adheres well and forms the intended microstructure without defects.

  • Troubleshooting may involve checking the source material’s purity, ensuring stable source temperature, verifying the vacuum level, adjusting the substrate’s position or temperature, and monitoring deposition rate fluctuations.

While evaporation tends to yield very high purity films with excellent thickness control, it is limited by its line-of-sight nature. In contrast, sputtering can deposit films more uniformly on complex surfaces and is more versatile for a broader range of materials.

 

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