Product Overview
Erbium Fluoride Sputtering Target (ErF3) is a compound sputtering target used to deposit thin films where a specific pre-compounded chemistry is required. These materials can behave differently from conductive metallic targets in terms of electrical response, thermal shock resistance, density sensitivity, and cracking risk, so target dimensions, density, backing design, and sputtering mode should be considered together.
Material and Deposition Characteristics
The appropriate sputtering mode depends on target conductivity, thermal behavior, and the power-supply configuration. Many compound ceramic targets are evaluated first with RF magnetron sputtering, especially when electrical resistivity is high. For brittle or low-thermal-conductivity materials, density, backing support, and stable cooling are important for reliable operation.
Technical Data
| Parameter | Typical Value / Range | Importance |
|---|---|---|
| Chemical Formula | ErF₃ | Defines fluoride-based film composition |
| Purity | 99.9% – 99.99% | Reduces optical loss and impurities |
| Form | Disc, plate, custom shapes | Compatible with various sputtering systems |
| Diameter | 25 – 300 mm (custom) | Matches magnetron cathode sizes |
| Thickness | 3 – 6 mm (typical) | Influences sputtering rate and lifetime |
| Backing Plate | Copper / Titanium (optional) | Improves heat transfer and stability |
| Density | ≥ 95% of theoretical | Ensures uniform sputtering performance |
| Material | Key Advantage | Typical Application |
|---|---|---|
| Erbium Fluoride (ErF₃) | Oxygen-free fluoride films | Optical & IR coatings |
| Erbium Oxide (Er₂O₃) | High chemical stability | General dielectric coatings |
| Metallic Erbium | Conductive films | Specialty electronic layers |
| Question | Answer |
|---|---|
| Why choose ErF₃ instead of Er₂O₃? | ErF₃ enables direct deposition of fluoride films without oxygen incorporation. |
| Can the target be bonded to a backing plate? | Yes, copper or titanium backing plates are available. |
| Is ErF₃ suitable for RF sputtering? | Yes, RF sputtering is commonly used for fluoride compound targets. |
| Can the target size be customized? | Yes, diameter, thickness, and shape can be tailored. |
| How is the target packaged? | Vacuum-sealed with protective cushioning for safe transport. |
Typical Thin-Film Applications
- Compound thin films for semiconductor, optical, protective, hard-coating, and functional-material research
- Applications where a pre-compounded target is preferred over co-sputtering separate elemental targets
- Projects requiring controlled chemistry and tailored target geometry for PVD development
Target Configuration and Ordering Considerations
When requesting a quotation, provide target diameter or rectangular dimensions, thickness, purity or composition, required quantity, and whether a backing plate or bonded assembly is needed. For brittle ceramic or compound targets, it is useful to specify the cathode model, backing-plate material, preferred bonding method, operating power if known, and any density, tolerance, or inspection-document requirements. TFM can review drawings, old-target photos, and application details when custom dimensions are required.
Frequently Asked Questions
What is the main reason to use a Erbium Fluoride sputtering target?
It provides a composition-specific source for depositing thin films when the required chemistry is better introduced from a pre-compounded target than from co-sputtering separate elements.
How should the sputtering mode for Erbium Fluoride be selected?
The power mode should be selected from target conductivity, thermal behavior, and equipment capability. Many compound ceramic targets are first evaluated with RF magnetron sputtering.
Why are density and microstructure important for Erbium Fluoride targets?
Uniform density and microstructure help support stable erosion and thermal behavior, while pores or local defects can increase the risk of cracking, particles, or unstable plasma.
Can a Erbium Fluoride target be supplied with a backing plate?
Yes. Where the material is brittle or the cathode requires a backing assembly, bonded configurations can be reviewed according to target size, thickness, cooling, and operating power.
Does target composition always equal film composition?
No. Film chemistry can shift because of different sputtering yields, reactive conditions, substrate temperature, re-sputtering, or chamber history. Verify the film when the chemistry is critical.
What should I provide to request a quotation for Erbium Fluoride?
Please provide material composition, purity, dimensions, quantity, target or backing configuration, cathode model or system details, and any drawing, tolerance, or inspection requirements.
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