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FABMATE® E-Beam Crucibles

TFM provides high-performance FABMATE® E-beam crucibles, known for their durability and superior resistance to thermal shock. These crucibles are ideal for electron beam evaporation, ensuring consistent performance and reliability in thin-film deposition processes across various industries like semiconductors and optical coatings.

FABMATE® E-Beam Crucibles

Item No.Capacities (mL)Top Diameter A (mm/inch)Height B (mm/inch)Wall Thickness C (mm/inch)Inquiry
angle=30119.1 (0.75″)4.1 (0.16″)1.0 (0.04″)
angle=151035.2 (1.38″)15.1 (0.59″)2.4 (0.09″)
angle=15422.0 (0.87″)14.3 (0.56″)2.4 (0.09″)
angle=15729.6 (1.17″)14.3 (0.56″)2.4 (0.09″)
angle=15N/A23.8 (0.93″)15.1 (0.59″)2.4 (0.09″)
angle=154051.6 (2.03″)25.9 (1.02″)2.4 (0.09″)
angle=154051.6 (2.03″)25.9 (1.02″)6.4 (0.25″)
angle=15N/A75.2 (2.96″)39.7 (1.56″)2.4 (0.09″)
angle=154050.8 (2″)27.0 (1.06″)2.4 (0.09″)
angle=154050.8 (2″)27.0 (1.06″)27.0 (1.06″)
angle=153045.1 (1.78″)23.9 (0.94″)2.4 (0.09″)
angle=153045.1 (1.78″)23.9 (0.94″)6.4 (0.25″)
angle=1515682.6 (3.25″)38.9 (1.53″)6.4 (0.25″)
angle=151537.6 (1.48″)17.0 (0.67″)3.2 (0.13″)
angle=151537.6 (1.48″)17.0 (0.67″)6.4 (0.25″)
angle=15N/A60.7 (2.39″)25.4 (1″)6.4 (0.25″)
angle=15N/A48.0 (1.89″)17.8 (0.7″)3.2 (0.13″)
angle=152547.0 (1.85″)17.3 (0.68″)2.4 (0.09″)
angle=156256.2 (2.2″)35.6 (1.4″)2.4 (0.09″)
angle=151641.7 (1.64″)24.6 (0.97″)3.2 (0.13″)
angle=15114.2 (0.56″)9.8 (0.38″)2.4 (0.09″)
angle=15214.2 (0.56″)9.8 (0.38″)2.4 (0.09″)
angle=15217.9 (0.71″)11.8 (0.47″)2.4 (0.09″)
angle=15320.4 (0.81″)13.8 (0.55″)2.4 (0.09″)
angle=15422.5 (0.89″)15.1 (0.60″)2.4 (0.09″)
angle=15728.6 (1.13″)13.2 (0.52″)2.4 (0.09″)
angle=151232.5 (1.28″)23.9 (0.94″)2.4 (0.09″)
angle=152541.5 (1.63″)23.9 (0.94″)2.4 (0.09″)
angle=153048.8 (1.92″)20.6 (0.81″)2.4 (0.09″)
angle=1510068.6 (2.7″)37.8 (1.49″)2.4 (0.09″)
angle=152547.0 (1.85″)17.3 (0.68″)3.2 (0.13″)
angle=152541.5 (1.63″)23.9 (0.94″)3.2 (0.13″)
angle=152042.5 (1.67″)19.5 (0.77″)2.4 (0.09″)
angle=151234.3 (1.35″)17.. (0.68″)3.2 (0.13″)
angle=153552.9 (2.08″)19.5 (0.77″)2.4 (0.09″)
angle=151233.9 (1.33″)19.5 (0.77″)2.4 (0.09″)

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FAQ

Sputtering targets are materials used in thin-film deposition processes to create coatings on substrates. They are used in industries like semiconductors, optics, photovoltaics, and electronics.

Evaporation materials are used in Physical Vapor Deposition (PVD) processes, where materials are heated and evaporated to form a thin film on a substrate. These are critical for applications in optics, wear protection, and decorative coatings.

Boat crucibles are used as containers for evaporation materials during PVD processes. They help to uniformly evaporate materials onto the substrate for thin film formation.

Sputtering uses energetic particles to eject material from a target, while evaporation involves heating a material until it vaporizes and deposits on a substrate. Both are common methods in Physical Vapor Deposition (PVD) for creating thin films.

Consider the material composition, purity, target size, and application-specific requirements such as the thickness and uniformity of the film.

Yes, we offer customized sputtering targets, evaporation materials, and crucibles to meet specific customer requirements for size, material composition, and purity.

Yes, we can assist in selecting the most suitable material based on your application, whether it’s for optical coatings, semiconductor fabrication, or decorative finishes.

Yes, we offer both bulk and small quantities of sputtering targets, evaporation materials, and spherical powders to support research, prototyping, and development projects.

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