Generic selectors
Exact matches only
Search in title
Search in content
Post Type Selectors

VD0817 Germanium Monosulfide Evaporation Materials, GeS

Catalog No.VD0817
MaterialGermanium Sulfide (GeS)
Purity99.9% ~ 99.99%
ShapePowder/ Granule/ Custom-made

Germanium monosulfide, represented by the chemical formula GeS, is a specialized sulfide ceramic evaporation material provided by TFM. This material is known for its unique properties and critical role in advanced deposition processes, contributing to high-quality thin film production.

Germanium Monosulfide Evaporation Materials Overview

Germanium monosulfide (GeS) evaporation materials from TFM are specialized sulfide ceramic products essential for high-quality deposition processes. With a chemical formula of GeS, these materials are critical for achieving superior thin film deposits. TFM is known for producing evaporation materials with exceptional purity levels of up to 99.9995%, supported by comprehensive quality assurance measures to ensure reliable performance.

Specifications of Germanium Monosulfide Evaporation Materials

Material TypeGermanium monosulfide
SymbolGeS
Appearance/ColorBlack crystal solid
Melting Point615 °C (1,139 °F)615 °C (1,139 °F)
Density4.1 g/cm3
Purity99.9% ~ 99.95%
ShapePowder/ Granule/ Custom-made

Applications of Germanium Monosulfide Evaporation Materials

These evaporation materials are utilized in several deposition processes, including:

  • Semiconductor Deposition: For creating semiconductor layers.
  • Chemical Vapor Deposition (CVD): Used in producing thin films and coatings.
  • Physical Vapor Deposition (PVD): Essential for coating substrates to enhance their properties.

They are also applied in optics for:

  • Wear Protection: To improve durability.
  • Decorative Coatings: For aesthetic enhancements.
  • Displays: In electronic displays and visual technologies.

Packaging and Handling

Germanium monosulfide evaporation materials are carefully packaged with clear external labeling to facilitate identification and quality control. The packaging process is designed to prevent damage during storage and transportation, ensuring that materials arrive in pristine condition.

Contact Information

TFM is a premier supplier of high-purity germanium monosulfide evaporation materials, available in various forms such as tablets, granules, rods, and wires. Custom shapes and quantities can be arranged upon request. In addition to evaporation materials, TFM offers a range of related products including evaporation sources, boats, filaments, crucibles, heaters, and e-beam crucible liners. For the latest pricing or inquiries about additional materials not listed, please reach out to us directly.

Reviews

There are no reviews yet.

Be the first to review “VD0817 Germanium Monosulfide Evaporation Materials, GeS”

Your email address will not be published. Required fields are marked *

FAQ

  • They are high‐purity substances (e.g. metals, alloys, or compounds) used in thermal or electron‐beam evaporation processes to form thin films on substrates.

  • Typically, they’re processed into a form (often ingots, pellets, or wires) that can be efficiently vaporized. Preparation emphasizes high purity and controlled composition to ensure film quality.

  • Thermal evaporation and electron-beam (e-beam) evaporation are the two main techniques, where material is heated (or bombarded with electrons) until it vaporizes and then condenses on the substrate.

  • Thermal evaporation heats the material directly (often using a resistive heater), while e-beam evaporation uses a focused electron beam to locally heat and vaporize the source material—each method offering different control and energy efficiency.

  • Key parameters include source temperature, vacuum level, deposition rate, substrate temperature, and the distance between the source and the substrate. These factors influence film uniformity, adhesion, and microstructure.

  • Evaporation generally produces high-purity films with excellent control over thickness, and it is especially suitable for materials with relatively low melting points or high vapor pressures.

  • Challenges include issues with step coverage (due to line-of-sight deposition), shadowing effects on complex topographies, and possible re-evaporation of material from the substrate if temperature isn’t properly controlled.

  • Common evaporation materials include noble metals (e.g., gold, silver), semiconductors (e.g., silicon, germanium), metal oxides, and organic compounds—each chosen for its specific optical, electrical, or mechanical properties.

  • Selection depends on desired film properties (conductivity, optical transparency, adhesion), compatibility with the evaporation process, and the final device application (semiconductor, optical coating, etc.).

  • Optimizing substrate temperature, deposition rate, and chamber vacuum are critical for ensuring that the film adheres well and forms the intended microstructure without defects.

  • Troubleshooting may involve checking the source material’s purity, ensuring stable source temperature, verifying the vacuum level, adjusting the substrate’s position or temperature, and monitoring deposition rate fluctuations.

While evaporation tends to yield very high purity films with excellent thickness control, it is limited by its line-of-sight nature. In contrast, sputtering can deposit films more uniformly on complex surfaces and is more versatile for a broader range of materials.

 

Shopping Cart
Scroll to Top