Product Overview
Gold Zinc Sputtering Target (Au/Zn) is an alloy sputtering target used to deposit composition-controlled alloy films. Relative to a pure elemental target, the alloying constituents are introduced to tune electrical, magnetic, optical, mechanical, or adhesion-related film properties. For this reason, alloy ratio, homogeneity, purity basis, and the intended film composition should be defined clearly in the procurement specification.
Material and Deposition Characteristics
Many alloy targets are electrically conductive and can be compatible with DC or pulsed-DC magnetron sputtering, subject to the actual alloy composition and equipment capability. The target composition is not always reproduced exactly in the deposited film because preferential sputtering, re-sputtering, substrate heating, and process gas conditions can shift the final ratio. For composition-sensitive work, deposited-film analysis should be part of process qualification.
Technical Data
| Parameter | Typical Value / Range | Importance |
|---|---|---|
| Purity | 99.9% – 99.99% (metal basis) | Reduces impurities that affect film conductivity |
| Composition | Custom Au/Zn ratios (wt% or at%) | Controls electrical and structural properties |
| Diameter | 25 – 300 mm (custom) | Matches sputtering cathode assemblies |
| Thickness | 3 – 8 mm | Influences target lifetime and sputtering rate |
| Density | ≥ 99% of theoretical | Ensures stable plasma and uniform erosion |
| Bonding | Copper / Titanium backing optional | Improves heat transfer and mechanical stability |
| Material | Key Advantage | Typical Application |
|---|---|---|
| Gold Zinc Sputtering Target | Tunable conductivity & alloy phase control | Semiconductor contacts & functional films |
| Pure Gold | Maximum corrosion resistance & conductivity | High-reliability electrical contacts |
| Gold Silver Alloy | Enhanced reflectivity & cost balance | Optical coatings |
| Zinc | Reactive & functional modification capability | Barrier or functional layers |
| Question | Answer |
|---|---|
| Can the Au/Zn ratio be customized? | Yes, the alloy composition can be tailored by weight or atomic percentage to meet specific film requirements. |
| Is the target supplied pre-alloyed or blended? | Standard products are pre-alloyed to ensure compositional uniformity during sputtering. |
| Are bonded targets available? | Yes, copper or titanium backing plates are available for improved thermal management. |
| What sputtering methods are compatible? | Suitable for DC, RF, and magnetron sputtering systems depending on composition and equipment design. |
| How is the product packaged? | Vacuum-sealed with protective cushioning and export-grade cartons or wooden crates. |
Typical Thin-Film Applications
- Gold Zinc alloy films where composition control is important to electrical, mechanical, magnetic, or optical performance
- Multilayer stacks, adhesion/barrier layers, conductive films, or functional coatings depending on the alloy system
- Research and production programs that require customized alloy ratios and repeatable sputtering behavior
Target Configuration and Ordering Considerations
For quotation and manufacturability review, provide target size, thickness, purity or alloy composition, quantity, and the sputtering gun or cathode model if known. If a bonded assembly is required, include backing-plate material, bonding preference, and any dimensional tolerances, surface-finish needs, or inspection-document requirements. TFM can also review customer drawings or old-target samples for replacement builds.
Frequently Asked Questions
Can the composition of a Gold Zinc sputtering target be customized?
Yes. For alloy targets, the required ratio should be specified clearly in wt% or at%. TFM can review custom compositions together with purity, dimensions, and manufacturability.
Will an alloy target always produce a film with the same composition?
Not necessarily. Preferential sputtering, substrate heating, process gas, and re-sputtering effects can shift the deposited composition relative to the nominal target chemistry. Film analysis should be used when the composition is critical.
Is a Gold Zinc alloy target compatible with DC magnetron sputtering?
Many metallic alloy targets are electrically conductive and can be compatible with DC or pulsed-DC sputtering, but the final choice depends on the actual alloy system and equipment.
Why is alloy homogeneity important in a Gold Zinc target?
A uniform alloy distribution helps support stable erosion and reduces local composition variation across the target, which in turn helps improve run-to-run consistency.
Can a Gold Zinc target be supplied bonded?
Yes. Where the cathode or thermal load requires it, TFM can supply bonded assemblies. Backing-plate material, target thickness, bonding method, and operating power should be reviewed together.
What should I include in an RFQ for Gold Zinc?
Specify the alloy composition, purity basis, dimensions, quantity, backing requirement, cathode model or drawing, and any tolerance, inspection, or documentation requirements.
Reviews
There are no reviews yet.