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Hafnium Evaporation Materials

VD0552 Hafnium Evaporation Materials, Hf

Catalog No.VD0552
MaterialHafnium (Hf)
Purity99.9% ~ 99.95%
ShapePowder/ Granule/ Custom-made

TFM is a top manufacturer and supplier of high-purity hafnium evaporation materials, along with a broad selection of other evaporation materials. We provide these materials in both powder and granule forms, with customization options available to meet specific needs.

Hafnium_Hf_GDMS_Analysis_Report.pdf

MSDS File

Hafnium Evaporation Materials Description

Hafnium is a lustrous, silvery-gray transition metal that shares many chemical similarities with zirconium and is typically found in zirconium minerals. Known for its excellent corrosion resistance, hafnium is resistant to most acid-base aqueous solutions but dissolves readily in hydrofluoric acid, forming fluorine complexes.

High-purity hafnium evaporation materials are essential for achieving superior results in deposition processes, ensuring the production of top-quality deposited films. TFM specializes in manufacturing hafnium evaporation materials with purity levels up to 99.95%, supported by stringent quality assurance processes to ensure product reliability.

hafnium evaporation materials

Hafnium Evaporation Materials Specification

Material TypeHafnium
SymbolHf
Atomic Number72
Color/AppearanceGray Steel, Metallic
Melting Point2227 °C
Density13.31 g/cc
SynonymsHf Pellets, Hf Pieces, Hf Evaporation Pellet, Hafnium Pellets, Hafnium Pieces, Hafnium Evaporation Pellet

Hafnium Evaporation Materials Application

• Employed in deposition processes such as semiconductor deposition, Chemical Vapor Deposition (CVD), and Physical Vapor Deposition (PVD).
• Utilized in optics for applications like wear protection, decorative coatings, and display technologies.

Hafnium Evaporation Materials Packaging

We handle our hafnium evaporation materials with great care to prevent damage during storage and transportation, ensuring that their quality is preserved and they remain in their original condition.

Ordering Table

Material Size Quantity Purity Part Number
Hafnium 1/4" Dia. x 1/2" Length 1 lb. 99.9% Ex Zr EVMHF30QXH
Hafnium 1/4" Dia. x 1/4" Length 1 lb. 99.9% Ex Zr EVMHF30QXQ
Hafnium 1/4" Dia. x 1/4" Length 25 g 99.9% Ex Zr EVMHF30QXQA
Hafnium 1/4" Dia. x 1/4" Length 50 g 99.9% Ex Zr EVMHF30QXQB
Hafnium 1/4" Dia. x 1/4" Length 100 g 99.9% Ex Zr EVMHF30QXQD
Hafnium 1/4" Dia. x 1/4" Length 150 g 99.9% Ex Zr EVMHF30QXQF
Hafnium 1/4" Dia. x 1/4" Length 200 g 99.9% Ex Zr EVMHF30QXQH
Hafnium 1/4" Dia. x 1/4" Length 250 g 99.9% Ex Zr EVMHF30QXQJ
Hafnium 1/4" Dia. x 1/4" Length 1 kg 99.9% Ex Zr EVMHF30QXQKG
Hafnium 1/8" Dia. x 1/8" Length 1 lb. 99.9% Ex Zr EVMHF30EXE
Hafnium 1/8" Dia. x 1/8" Length 25 g 99.9% Ex Zr EVMHF30EXEA
Hafnium 1/8" Dia. x 1/8" Length 50 g 99.9% Ex Zr EVMHF30EXEB
Hafnium 1/8" Dia. x 1/8" Length 100 g 99.9% Ex Zr EVMHF30EXED
Hafnium 1/8" Dia. x 1/8" Length 200 g 99.9% Ex Zr EVMHF30EXEH
Hafnium 1/8" Dia. x 1/8" Length 250 g 99.9% Ex Zr EVMHF30EXEJ

 

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FAQ

  • They are high‐purity substances (e.g. metals, alloys, or compounds) used in thermal or electron‐beam evaporation processes to form thin films on substrates.

  • Typically, they’re processed into a form (often ingots, pellets, or wires) that can be efficiently vaporized. Preparation emphasizes high purity and controlled composition to ensure film quality.

  • Thermal evaporation and electron-beam (e-beam) evaporation are the two main techniques, where material is heated (or bombarded with electrons) until it vaporizes and then condenses on the substrate.

  • Thermal evaporation heats the material directly (often using a resistive heater), while e-beam evaporation uses a focused electron beam to locally heat and vaporize the source material—each method offering different control and energy efficiency.

  • Key parameters include source temperature, vacuum level, deposition rate, substrate temperature, and the distance between the source and the substrate. These factors influence film uniformity, adhesion, and microstructure.

  • Evaporation generally produces high-purity films with excellent control over thickness, and it is especially suitable for materials with relatively low melting points or high vapor pressures.

  • Challenges include issues with step coverage (due to line-of-sight deposition), shadowing effects on complex topographies, and possible re-evaporation of material from the substrate if temperature isn’t properly controlled.

  • Common evaporation materials include noble metals (e.g., gold, silver), semiconductors (e.g., silicon, germanium), metal oxides, and organic compounds—each chosen for its specific optical, electrical, or mechanical properties.

  • Selection depends on desired film properties (conductivity, optical transparency, adhesion), compatibility with the evaporation process, and the final device application (semiconductor, optical coating, etc.).

  • Optimizing substrate temperature, deposition rate, and chamber vacuum are critical for ensuring that the film adheres well and forms the intended microstructure without defects.

  • Troubleshooting may involve checking the source material’s purity, ensuring stable source temperature, verifying the vacuum level, adjusting the substrate’s position or temperature, and monitoring deposition rate fluctuations.

While evaporation tends to yield very high purity films with excellent thickness control, it is limited by its line-of-sight nature. In contrast, sputtering can deposit films more uniformly on complex surfaces and is more versatile for a broader range of materials.

 

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