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VD0554 Indium Evaporation Materials, In

Material Type: Indium
Symbol: In
Color/Appearance: Silvery Lustrous Gray, Metallic
Purity: 99.9% ~ 99.999%
Shape:Powder/ Granule/ Custom-made

TFM stands out as a leading producer and supplier of high-purity indium evaporation materials, alongside an extensive range of other evaporation materials. Our products are available in both powder and granule forms, with customization options provided to meet specific requirements.

MSDS File

Indium Evaporation Materials Description

Indium is an exceptionally soft, silvery-white metal distinguished by its high ductility and bright luster. Although relatively rare, it is typically found as a flawless single crystal without internal pores. Indium’s versatility is evident in its wide range of applications, including Indium Tin Oxide (ITO) films, electronic soldering, sealing elements for low-temperature and vacuum environments, solubility anodes, and control rods in nuclear reactors.

High-purity indium evaporation materials are crucial for achieving optimal results in deposition processes, leading to the production of high-quality films. TFM specializes in producing indium evaporation materials with purity levels reaching up to 99.999%. Our stringent quality control measures ensure that every product adheres to the highest standards of reliability and performance.

indium evaporation materials

Indium Evaporation Materials Specification

Material TypeIndium
SymbolIn
Color/AppearanceSilvery Lustrous Gray, Metallic
Melting Point157 °C
Type of BondElastomer
Density7.3 g/cc
Thermal Conductivity82 W/m.K
Coefficient of Thermal Expansion32.1 x 10-6/K
SynonymsIn Pellets, In Pieces, In Evaporation Pellet, Indium Pellets, Indium Pieces, Indium Evaporation Pellet

Indium Evaporation Materials Application

Indium evaporation materials are integral to several deposition methods, such as semiconductor fabrication, Chemical Vapor Deposition (CVD), and Physical Vapor Deposition (PVD). These techniques are critical for producing accurate, high-quality thin films employed in advanced technological applications. In addition to their role in deposition processes, indium materials are also valuable in optics, where they are used to create wear-resistant coatings, enhance decorative finishes, and optimize display technologies.

Indium Evaporation Materials Packaging

We meticulously manage our indium evaporation materials to prevent any damage during storage and transportation, ensuring that their quality is upheld and their original condition is preserved.

Ordering Table

Material Size Quantity Purity Part Number
Hafnium Oxide 10 - 12 mm Dia. x 4 - 5mm thick 25 g 99.9% EVMHFO2TABA
Hafnium Oxide 10 - 12 mm Dia. x 4 - 5mm thick 50 g 99.9% EVMHFO2TABB
Hafnium Oxide 10 - 12 mm Dia. x 4 - 5mm thick 100 g 99.9% EVMHFO2TABD
Hafnium Oxide 10 - 12 mm Dia. x 4 - 5mm thick 1 kg 99.9% EVMHFO2TABKG
Hafnium Oxide 10 - 12 mm Dia. x 4 - 5mm thick 500 g 99.9% EVMHFO2TABT
Hafnium Oxide 1mm - 3mm Pieces 50 g 99.9% EVMHFO21-3B
Hafnium Oxide 1mm - 3mm Pieces 100 g 99.9% EVMHFO21-3D
Hafnium Oxide 1mm - 3mm Pieces 200 g 99.9% EVMHFO21-3H

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FAQ

  • They are high‐purity substances (e.g. metals, alloys, or compounds) used in thermal or electron‐beam evaporation processes to form thin films on substrates.

  • Typically, they’re processed into a form (often ingots, pellets, or wires) that can be efficiently vaporized. Preparation emphasizes high purity and controlled composition to ensure film quality.

  • Thermal evaporation and electron-beam (e-beam) evaporation are the two main techniques, where material is heated (or bombarded with electrons) until it vaporizes and then condenses on the substrate.

  • Thermal evaporation heats the material directly (often using a resistive heater), while e-beam evaporation uses a focused electron beam to locally heat and vaporize the source material—each method offering different control and energy efficiency.

  • Key parameters include source temperature, vacuum level, deposition rate, substrate temperature, and the distance between the source and the substrate. These factors influence film uniformity, adhesion, and microstructure.

  • Evaporation generally produces high-purity films with excellent control over thickness, and it is especially suitable for materials with relatively low melting points or high vapor pressures.

  • Challenges include issues with step coverage (due to line-of-sight deposition), shadowing effects on complex topographies, and possible re-evaporation of material from the substrate if temperature isn’t properly controlled.

  • Common evaporation materials include noble metals (e.g., gold, silver), semiconductors (e.g., silicon, germanium), metal oxides, and organic compounds—each chosen for its specific optical, electrical, or mechanical properties.

  • Selection depends on desired film properties (conductivity, optical transparency, adhesion), compatibility with the evaporation process, and the final device application (semiconductor, optical coating, etc.).

  • Optimizing substrate temperature, deposition rate, and chamber vacuum are critical for ensuring that the film adheres well and forms the intended microstructure without defects.

  • Troubleshooting may involve checking the source material’s purity, ensuring stable source temperature, verifying the vacuum level, adjusting the substrate’s position or temperature, and monitoring deposition rate fluctuations.

While evaporation tends to yield very high purity films with excellent thickness control, it is limited by its line-of-sight nature. In contrast, sputtering can deposit films more uniformly on complex surfaces and is more versatile for a broader range of materials.

 

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