Thin Film Materials Logo
Generic selectors
Exact matches only
Search in title
Search in content
Post Type Selectors
Indium(III) Telluride Evaporation Materials

VD0862 Indium(III) Telluride Evaporation Materials, In2Te3

Catalog No.In2Te3-VD
MaterialIndium Telluride (In2Te3)
Purity99.9% ~ 99.999%
ShapePowder/ Granule/ Custom-made

TFM stands out as a top-tier manufacturer and supplier specializing in high-purity indium(III) telluride evaporation materials, alongside a broad selection of other evaporation materials. Our offerings are available in both powder and granule forms, with the option for customized configurations to meet specific needs upon request.

MSDS File

Indium(III) Telluride Evaporation Materials Overview

Indium(III) telluride evaporation materials, identified by the chemical formula In2Te3, are a specialized ceramic used in various deposition processes. These materials are critical for achieving high-quality deposited films in a range of applications. TFM excels in producing In2Te3 evaporation materials with exceptional purity, reaching up to 99.9995%. Our rigorous quality assurance protocols ensure that each batch meets the highest standards of reliability and performance.

Product Variants

  • Indium Evaporation Materials
  • Telluride Ceramic Evaporation Materials

Specifications

Material TypeIndium(III) Telluride
SymbolIn2Te3
Appearance/ColorBlue cubic crystals
Melting Point667 °C (1,233 °F; 940 K)
Density5.75 g/cm3, solid
Purity99.9% ~ 99.999%
ShapePowder/ Granule/ Custom-made

Applications

Indium(III) telluride evaporation materials are widely used in:

  • Semiconductor Deposition: Essential for creating high-quality semiconductor layers.
  • Chemical Vapor Deposition (CVD): Important for producing thin films and coatings.
  • Physical Vapor Deposition (PVD): Utilized in creating durable coatings and film layers.
  • Optics: Applied in wear protection, decorative coatings, and display technologies.

Packaging

To maintain the integrity of the indium(III) telluride evaporation materials, they are securely packed in plastic vacuum bags. This packaging protects the materials during storage and transit, preserving their quality. Additionally, a Certificate of Analysis (COA) is included with each shipment to verify the product’s specifications.

Contact Us

TFM is dedicated to providing high-purity indium(III) telluride evaporation materials tailored for advanced semiconductor, CVD, PVD, and optical applications. Our team’s expertise in engineering, manufacturing, and analytical processes ensures that we deliver superior products. For more information or to request a quote, reach out to us today.

Reviews

There are no reviews yet.

Be the first to review “VD0862 Indium(III) Telluride Evaporation Materials, In2Te3”

Your email address will not be published. Required fields are marked *

Related Products

Related products

FAQ

  • They are high‐purity substances (e.g. metals, alloys, or compounds) used in thermal or electron‐beam evaporation processes to form thin films on substrates.

  • Typically, they’re processed into a form (often ingots, pellets, or wires) that can be efficiently vaporized. Preparation emphasizes high purity and controlled composition to ensure film quality.

  • Thermal evaporation and electron-beam (e-beam) evaporation are the two main techniques, where material is heated (or bombarded with electrons) until it vaporizes and then condenses on the substrate.

  • Thermal evaporation heats the material directly (often using a resistive heater), while e-beam evaporation uses a focused electron beam to locally heat and vaporize the source material—each method offering different control and energy efficiency.

  • Key parameters include source temperature, vacuum level, deposition rate, substrate temperature, and the distance between the source and the substrate. These factors influence film uniformity, adhesion, and microstructure.

  • Evaporation generally produces high-purity films with excellent control over thickness, and it is especially suitable for materials with relatively low melting points or high vapor pressures.

  • Challenges include issues with step coverage (due to line-of-sight deposition), shadowing effects on complex topographies, and possible re-evaporation of material from the substrate if temperature isn’t properly controlled.

  • Common evaporation materials include noble metals (e.g., gold, silver), semiconductors (e.g., silicon, germanium), metal oxides, and organic compounds—each chosen for its specific optical, electrical, or mechanical properties.

  • Selection depends on desired film properties (conductivity, optical transparency, adhesion), compatibility with the evaporation process, and the final device application (semiconductor, optical coating, etc.).

  • Optimizing substrate temperature, deposition rate, and chamber vacuum are critical for ensuring that the film adheres well and forms the intended microstructure without defects.

  • Troubleshooting may involve checking the source material’s purity, ensuring stable source temperature, verifying the vacuum level, adjusting the substrate’s position or temperature, and monitoring deposition rate fluctuations.

While evaporation tends to yield very high purity films with excellent thickness control, it is limited by its line-of-sight nature. In contrast, sputtering can deposit films more uniformly on complex surfaces and is more versatile for a broader range of materials.

 

Shopping Cart
Scroll to Top