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VD0693 Indium Tin Oxide Evaporation Materials, ITO

Material Type：Indium Tin Oxide
Symbol：In2O3/SnO2 90/10 wt %
Melting Point ：1,800 °C
E-Beam Crucible Liner Material：Fabmate®, Graphite
Purity：99.9% ~ 99.99%
Shape：Powder/ Granule/ Custom-made

TFM is a top manufacturer and supplier of high-purity indium tin oxide (ITO) evaporation materials, along with a broad range of other evaporation materials. We provide these materials in both powder and granule forms and can customize them to meet your specific requirements.

MSDS File

Introduction

Indium Tin Oxide (ITO) Evaporation Material is a high-performance compound used for depositing transparent and conductive thin films in advanced optoelectronic, display, and photovoltaic systems. ITO combines optical transparency with electrical conductivity, making it a cornerstone material for modern electronic interfaces and optically active surfaces.

Related Products: Indium Evaporation Materials, Tin Evaporation Materials

Detailed Description

Indium tin oxide is a mixed oxide consisting primarily of indium oxide (In₂O₃) doped with tin oxide (SnO₂). It behaves as a wide bandgap, n-type semiconductor with excellent transmission in the visible range and useful electrical conductivity.

ITO evaporation materials are typically supplied as high-purity pellets, granules, or pieces, engineered for thermal or electron-beam evaporation in vacuum deposition systems. The controlled composition and microstructure support stable evaporation behavior and consistent transfer of material to the growing film.

Key performance features include:

  • Optical transparency: Thin films can transmit over 80% of visible light, ideal for transparent electrodes.

  • Electrical conductivity: Effective for transparent conductive coatings in electronic devices.

  • Chemical stability: Resists degradation and corrosion under typical operating conditions.

ITO evaporation materials are available with customizable purity and form factors to match specific crucible or evaporation source requirements.

Applications

Indium Tin Oxide evaporation material is widely used in:

  • Transparent conductive films for displays and touch panels

  • Photovoltaic electrodes and smart window coatings

  • Optoelectronic and sensor device fabrication

  • Anti-static and EMI shielding thin films

  • Advanced surface coatings requiring light transmission with conductivity

Technical Parameters

ParameterTypical Value / RangeImportance
CompositionIn₂O₃ / SnO₂ mixed oxideDefines conductive and optical properties
Purity99.9% – 99.99%Reduces contamination, improves film quality
FormPellets / Pieces / CustomMatches vacuum evaporation equipment
Melting Range~1500-1900 °C (depends on composition)Suitable for high-temperature vacuum sources
Density~7.1-7.2 g/cm³Reference for deposition calibration

Comparison with Related Materials

MaterialKey AdvantageTypical Application
ITO Evaporation MaterialExcellent transparency + conductivityTransparent electrodes
AZO (Al-doped ZnO)Lower cost, better environmental stabilityAlternative TCO for photovoltaics
FTO (Fluorine-doped SnO₂)Good thermal stabilityHigh-temperature TCO needs

ITO remains the most established transparent conducting oxide for high-performance thin films, especially where combined optical and electrical function is required.

FAQ

QuestionAnswer
Can ITO evaporation materials be custom shaped?Yes, sizes and forms can be tailored to specific deposition systems.
What deposition methods are supported?Thermal and electron-beam evaporation are common, though sputtering is often preferred for uniform films.
How does ITO film performance vary?Optical transparency and conductivity depend on film thickness, oxygen content, and deposition parameters.
Is post-deposition treatment required?Annealing in controlled atmospheres is frequently used to optimize film conductivity and transparency.

Packaging

Our Indium Tin Oxide Evaporation Materials are clearly labeled and packed using protective methods to minimize oxidation and contamination. Vacuum sealing or inert gas packing is used to preserve material integrity during storage and international transportation.

Conclusion

Indium Tin Oxide (ITO) Evaporation Material delivers dependable performance for depositing high-quality transparent, conductive films across a wide range of electronic and optoelectronic applications. With customizable forms and high purity, it supports both cutting-edge research and industrial coating needs.
For detailed specifications and a quotation, please contact us at sales@thinfilmmaterials.com.

Ordering Table

Material Size Quantity Purity Part Number
Indium Tin Oxide 1/8" - 1/4" Pieces 1 lb. 99.99% EVMITO40
Indium Tin Oxide 1/8" - 1/4" Pieces 25 g 99.99% EVMITO40A
Indium Tin Oxide 1/8" - 1/4" Pieces 50 g 99.99% EVMITO40B
Indium Tin Oxide 1/8" - 1/4" Pieces 100 g 99.99% EVMITO40D
Indium Tin Oxide 1/8" - 1/4" Pieces 250 g 99.99% EVMITO40J
Indium Tin Oxide 1/8" - 1/4" Pieces 1 kg 99.99% EVMITO40KG
Indium Tin Oxide 1/8" - 1/4" Pieces 500 g 99.99% EVMITO40T
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ITO pellets 3N In₂O₃/SnO₂=84/16 wt% Ø7×5 mm

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FAQ

  • They are high‐purity substances (e.g. metals, alloys, or compounds) used in thermal or electron‐beam evaporation processes to form thin films on substrates.

  • Typically, they’re processed into a form (often ingots, pellets, or wires) that can be efficiently vaporized. Preparation emphasizes high purity and controlled composition to ensure film quality.

  • Thermal evaporation and electron-beam (e-beam) evaporation are the two main techniques, where material is heated (or bombarded with electrons) until it vaporizes and then condenses on the substrate.

  • Thermal evaporation heats the material directly (often using a resistive heater), while e-beam evaporation uses a focused electron beam to locally heat and vaporize the source material—each method offering different control and energy efficiency.

  • Key parameters include source temperature, vacuum level, deposition rate, substrate temperature, and the distance between the source and the substrate. These factors influence film uniformity, adhesion, and microstructure.

  • Evaporation generally produces high-purity films with excellent control over thickness, and it is especially suitable for materials with relatively low melting points or high vapor pressures.

  • Challenges include issues with step coverage (due to line-of-sight deposition), shadowing effects on complex topographies, and possible re-evaporation of material from the substrate if temperature isn’t properly controlled.

  • Common evaporation materials include noble metals (e.g., gold, silver), semiconductors (e.g., silicon, germanium), metal oxides, and organic compounds—each chosen for its specific optical, electrical, or mechanical properties.

  • Selection depends on desired film properties (conductivity, optical transparency, adhesion), compatibility with the evaporation process, and the final device application (semiconductor, optical coating, etc.).

  • Optimizing substrate temperature, deposition rate, and chamber vacuum are critical for ensuring that the film adheres well and forms the intended microstructure without defects.

  • Troubleshooting may involve checking the source material’s purity, ensuring stable source temperature, verifying the vacuum level, adjusting the substrate’s position or temperature, and monitoring deposition rate fluctuations.

While evaporation tends to yield very high purity films with excellent thickness control, it is limited by its line-of-sight nature. In contrast, sputtering can deposit films more uniformly on complex surfaces and is more versatile for a broader range of materials.

 

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