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VD0694 Indium Zinc Oxide IZO Evaporation Materials

Catalog No.VD0694
MaterialIndium Zinc Oxide (IZO)
Purity99.9% ~ 99.99%
ShapePowder/ Granule/ Custom-made

TFM is a premier manufacturer and supplier of high-purity indium zinc oxide (IZO) evaporation materials, along with a broad range of other evaporation materials. We provide these materials in both powder and granule forms and can customize them to meet your specific needs.

MSDS File

Indium Zinc Oxide (IZO) Evaporation Materials Overview

TFM offers high-purity indium zinc oxide (IZO) evaporation materials, a critical oxide used in various deposition processes. With the chemical formula IZO, these materials are vital for ensuring the production of high-quality films. TFM specializes in producing IZO with up to 99.9995% purity, achieved through rigorous quality assurance processes that guarantee reliability and consistency.

Related Products: Indium Evaporation Materials, Zinc Evaporation Materials, Oxide Ceramic Evaporation Materials

Applications of Indium Zinc Oxide (IZO) Evaporation Materials

Indium zinc oxide evaporation materials are employed in a range of high-tech applications, including:

  • Deposition Processes: Ideal for semiconductor deposition, chemical vapor deposition (CVD), and physical vapor deposition (PVD).
  • Optical Applications: Used in wear protection, decorative coatings, and display technologies.

Packaging and Handling

TFM ensures that all indium zinc oxide evaporation materials are meticulously tagged and labeled for efficient identification and stringent quality control. Our packaging is designed to protect the materials from damage during storage and transportation, ensuring they arrive in optimal condition.

Contact TFM

As a leading manufacturer and supplier of high-purity indium zinc oxide evaporation materials, TFM offers a variety of shapes, including tablets, granules, rods, and wires. Customized forms and quantities are also available upon request. Additionally, TFM provides a broad range of related products, such as evaporation sources, boats, filaments, crucibles, heaters, and e-beam crucible liners. For pricing and inquiries regarding our evaporation materials or other products, please contact us.

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FAQ

  • They are high‐purity substances (e.g. metals, alloys, or compounds) used in thermal or electron‐beam evaporation processes to form thin films on substrates.

  • Typically, they’re processed into a form (often ingots, pellets, or wires) that can be efficiently vaporized. Preparation emphasizes high purity and controlled composition to ensure film quality.

  • Thermal evaporation and electron-beam (e-beam) evaporation are the two main techniques, where material is heated (or bombarded with electrons) until it vaporizes and then condenses on the substrate.

  • Thermal evaporation heats the material directly (often using a resistive heater), while e-beam evaporation uses a focused electron beam to locally heat and vaporize the source material—each method offering different control and energy efficiency.

  • Key parameters include source temperature, vacuum level, deposition rate, substrate temperature, and the distance between the source and the substrate. These factors influence film uniformity, adhesion, and microstructure.

  • Evaporation generally produces high-purity films with excellent control over thickness, and it is especially suitable for materials with relatively low melting points or high vapor pressures.

  • Challenges include issues with step coverage (due to line-of-sight deposition), shadowing effects on complex topographies, and possible re-evaporation of material from the substrate if temperature isn’t properly controlled.

  • Common evaporation materials include noble metals (e.g., gold, silver), semiconductors (e.g., silicon, germanium), metal oxides, and organic compounds—each chosen for its specific optical, electrical, or mechanical properties.

  • Selection depends on desired film properties (conductivity, optical transparency, adhesion), compatibility with the evaporation process, and the final device application (semiconductor, optical coating, etc.).

  • Optimizing substrate temperature, deposition rate, and chamber vacuum are critical for ensuring that the film adheres well and forms the intended microstructure without defects.

  • Troubleshooting may involve checking the source material’s purity, ensuring stable source temperature, verifying the vacuum level, adjusting the substrate’s position or temperature, and monitoring deposition rate fluctuations.

While evaporation tends to yield very high purity films with excellent thickness control, it is limited by its line-of-sight nature. In contrast, sputtering can deposit films more uniformly on complex surfaces and is more versatile for a broader range of materials.

 

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