Thin Film Materials Logo
Generic selectors
Exact matches only
Search in title
Search in content
Post Type Selectors
Awaiting product image

Iridium Manganese Sputtering Target, Ir/Mn

Chemical Formula: Ir/Mn
Catalog Number: TFM-SPT-0274
CAS Number: 12142-03-9
Purity: 99%~99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Iridium Manganese sputtering target  come in various forms, purities, sizes, and prices. Thin Film Materials (TFM) manufactures and supplies top-quality sputtering targets at competitive prices.

Product Overview

Iridium Manganese Sputtering Target (Ir/Mn) is an alloy sputtering target used to deposit composition-controlled alloy films. Relative to a pure elemental target, the alloying constituents are introduced to tune electrical, magnetic, optical, mechanical, or adhesion-related film properties. For this reason, alloy ratio, homogeneity, purity basis, and the intended film composition should be defined clearly in the procurement specification.

Material and Deposition Characteristics

Many alloy targets are electrically conductive and can be compatible with DC or pulsed-DC magnetron sputtering, subject to the actual alloy composition and equipment capability. The target composition is not always reproduced exactly in the deposited film because preferential sputtering, re-sputtering, substrate heating, and process gas conditions can shift the final ratio. For composition-sensitive work, deposited-film analysis should be part of process qualification.

Technical Data

ParameterTypical Value / RangeImportance
Purity99.9% – 99.99%Ensures stable magnetic and structural properties
CompositionIr/Mn customizable (e.g., 20/80 at%, IrMn₃)Determines exchange bias behavior
Diameter25 – 300 mm (custom)Compatible with most sputtering systems
Thickness3 – 6 mmInfluences sputtering efficiency and target lifespan
Density≥ 99% theoretical densityImproves film uniformity and sputtering stability
BondingCopper backing plate / Indium bondedEnhances thermal conductivity and durability
MaterialKey AdvantageTypical Application
Iridium Manganese (Ir/Mn)Strong exchange bias and thermal stabilitySpin valves and magnetic sensors
Platinum Manganese (Pt/Mn)Good exchange bias with strong corrosion resistanceMagnetic recording heads
Nickel Iron (NiFe)Soft magnetic propertiesMagnetic sensing layers
QuestionAnswer
What is the primary function of Ir/Mn thin films?Ir/Mn films act as antiferromagnetic pinning layers that create exchange bias in magnetic multilayer devices.
What sputtering methods are suitable for Ir/Mn targets?Ir/Mn sputtering targets are commonly used in DC magnetron sputtering systems for magnetic thin film deposition.
Can the Ir/Mn composition be customized?Yes. The iridium-to-manganese ratio can be tailored depending on the desired exchange bias properties.
Are bonded sputtering targets available?Yes. Ir/Mn targets can be bonded to copper backing plates to improve heat dissipation during sputtering.
What industries commonly use Ir/Mn sputtering targets?Data storage, semiconductor manufacturing, spintronics research, and magnetic sensor development.

Typical Thin-Film Applications

  • Iridium Manganese alloy films where composition control is important to electrical, mechanical, magnetic, or optical performance
  • Multilayer stacks, adhesion/barrier layers, conductive films, or functional coatings depending on the alloy system
  • Research and production programs that require customized alloy ratios and repeatable sputtering behavior

Target Configuration and Ordering Considerations

For quotation and manufacturability review, provide target size, thickness, purity or alloy composition, quantity, and the sputtering gun or cathode model if known. If a bonded assembly is required, include backing-plate material, bonding preference, and any dimensional tolerances, surface-finish needs, or inspection-document requirements. TFM can also review customer drawings or old-target samples for replacement builds.

Frequently Asked Questions

Can the composition of a Iridium Manganese sputtering target be customized?

Yes. For alloy targets, the required ratio should be specified clearly in wt% or at%. TFM can review custom compositions together with purity, dimensions, and manufacturability.

Will an alloy target always produce a film with the same composition?

Not necessarily. Preferential sputtering, substrate heating, process gas, and re-sputtering effects can shift the deposited composition relative to the nominal target chemistry. Film analysis should be used when the composition is critical.

Is a Iridium Manganese alloy target compatible with DC magnetron sputtering?

Many metallic alloy targets are electrically conductive and can be compatible with DC or pulsed-DC sputtering, but the final choice depends on the actual alloy system and equipment.

Why is alloy homogeneity important in a Iridium Manganese target?

A uniform alloy distribution helps support stable erosion and reduces local composition variation across the target, which in turn helps improve run-to-run consistency.

Can a Iridium Manganese target be supplied bonded?

Yes. Where the cathode or thermal load requires it, TFM can supply bonded assemblies. Backing-plate material, target thickness, bonding method, and operating power should be reviewed together.

What should I include in an RFQ for Iridium Manganese?

Specify the alloy composition, purity basis, dimensions, quantity, backing requirement, cathode model or drawing, and any tolerance, inspection, or documentation requirements.

Reviews

There are no reviews yet.

Be the first to review “Iridium Manganese Sputtering Target, Ir/Mn”

Your email address will not be published. Required fields are marked *

Related Products

Related products

FAQ

It’s the source material (in solid form) used in sputter deposition to eject atoms or molecules that then form a thin film on a substrate.

Targets can be pure metals (e.g., gold, copper, aluminum), ceramics (e.g., Al₂O₃, SiO₂, TiO₂), alloys, or composites—chosen based on the film’s desired properties.

 

They are produced by processes such as melting/casting for metals or sintering (often with hot isostatic pressing) for ceramics and composite targets to ensure high density and purity.

 

In a vacuum chamber, a plasma (typically argon) bombards the target, ejecting atoms that travel and condense on a substrate, forming a thin film.

 

Key factors include the target’s purity, density, grain structure, and the sputtering yield (i.e. how many atoms are ejected per incident ion), as well as operating conditions like power density and gas pressure.

 

Operators monitor target erosion (often by measuring the depth of the eroded “race track”) or track total energy delivered (kilowatt-hours) until it reaches a threshold that can compromise film quality.

 

Fragile materials (such as many ceramics or certain oxides) and precious metals often require a backing plate to improve cooling, mechanical stability, and to allow thinner targets that reduce material costs.

 

DC sputtering is used for conductive targets, while RF sputtering is necessary for insulating targets (like many oxides) because it prevents charge buildup on the target’s surface.

 

In reactive sputtering, a reactive gas (e.g., oxygen or nitrogen) is introduced to form compound films on the substrate, but it may also “poison” the target surface if not carefully controlled.

 

Many manufacturers prefer to control raw material quality by sourcing their own powders; using external powders can risk impurities and inconsistent target properties.

 

Targets should be stored in clean, dry conditions (often in original packaging or re-wrapped in protective materials) and handled with gloves to avoid contamination, ensuring optimal performance during deposition.

Deposition rate depends on factors such as target material and composition, power density, working gas pressure, substrate distance, and the configuration of the sputtering system (e.g., magnetron design).

 
Shopping Cart
Scroll to Top