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ST0262 Iron Silicide Sputtering Target, FeSi2

Chemical Formula: FeSi2
Catalog Number: ST0262
CAS Number: 12022-99-0
Purity: 99.9%, 99.95%, 99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Iron Silicide sputtering target  come in various forms, purities, sizes, and prices. Thin Film Materials (TFM) manufactures and supplies top-quality sputtering targets at competitive prices.

MSDS File

Iron Silicide Sputtering Target Description

Iron silicide sputtering target is a type of silicide ceramic sputtering target composed of iron and silicon.

iron

Iron, also called ferrum, is a chemical element derived from the Anglo-Saxon name iren (ferrum in Latin). It has been used since before 5000 BC. The canonical chemical symbol for iron is “Fe,” and its atomic number is 26. Iron is located in Period 4 and Group 8 of the periodic table, belonging to the d-block. Its relative atomic mass is 55.845(2) Dalton, with the number in the brackets indicating the uncertainty.

Related Product: Iron Sputtering Target

Silicon

Silicon is a chemical element named after the Latin silex or silicis, meaning flint. It was first mentioned in 1824 and observed by J. Berzelius. The isolation and announcement were also accomplished by J. Berzelius. The canonical chemical symbol for silicon is “Si,” and its atomic number is 14. Silicon is located in Period 3 and Group 14 of the periodic table, belonging to the p-block. Its relative atomic mass is 28.0855(3) Dalton, with the number in brackets indicating the uncertainty.

Iron Silicide Sputtering Target Application

Iron Silicide Sputtering Target is a type of silicide ceramic sputtering target composed of iron and silicon. It is utilized in various applications, including thin film deposition, decoration, semiconductor manufacturing, display technologies, LED and photovoltaic devices, and functional coatings. Additionally, it is employed in optical information storage, glass coating industries such as automotive and architectural glass, and optical communication systems.

Iron Silicide Sputtering Target Packing

Our iron silicide sputter targets are meticulously tagged and labeled externally to facilitate efficient identification and ensure rigorous quality control. We take great care to prevent any damage during storage and transportation, ensuring that the targets reach you in optimal condition.

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TFM offers Iron Silicide Sputtering Targets in various forms, purities, sizes, and prices. We specialize in high-purity thin film deposition materials with optimal density and minimal grain sizes, which are ideal for semiconductor, CVD, and PVD applications in display and optics. Contact Us for current pricing on sputtering targets and other deposition materials that are not listed.

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FAQ

Sputtering targets are materials used in thin-film deposition processes to create coatings on substrates. They are used in industries like semiconductors, optics, photovoltaics, and electronics.

Evaporation materials are used in Physical Vapor Deposition (PVD) processes, where materials are heated and evaporated to form a thin film on a substrate. These are critical for applications in optics, wear protection, and decorative coatings.

Boat crucibles are used as containers for evaporation materials during PVD processes. They help to uniformly evaporate materials onto the substrate for thin film formation.

Sputtering uses energetic particles to eject material from a target, while evaporation involves heating a material until it vaporizes and deposits on a substrate. Both are common methods in Physical Vapor Deposition (PVD) for creating thin films.

Consider the material composition, purity, target size, and application-specific requirements such as the thickness and uniformity of the film.

Yes, we offer customized sputtering targets, evaporation materials, and crucibles to meet specific customer requirements for size, material composition, and purity.

Yes, we can assist in selecting the most suitable material based on your application, whether it’s for optical coatings, semiconductor fabrication, or decorative finishes.

Yes, we offer both bulk and small quantities of sputtering targets, evaporation materials, and spherical powders to support research, prototyping, and development projects.

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