Product Overview
(La0.2Ce0.2Gd0.2Y0.2Er0.2)Zr2O7 Sputtering Target (La0.2Ce0.2Gd0.2Y0.2Er0.2) is a composition-specific sputtering target for thin-film deposition and PVD process development. The practical specification normally includes chemistry, purity, dimensions, density, target configuration, and any bonding or backing requirement needed by the sputtering cathode.
Material and Deposition Characteristics
Power mode and process conditions should be selected according to the target conductivity, thermal behavior, and the requirements of the cathode system. For less common materials, conservative initial power density and film-composition verification are good practice.
Technical Data
| Parameter | Typical Value / Range | Importance |
|---|---|---|
| Chemical Formula | (La₀.₂Ce₀.₂Gd₀.₂Y₀.₂Er₀.₂)Zr₂O₇ | Multi-component rare-earth zirconate |
| Purity | 99.9% – 99.99% (total) | Affects phase stability & film quality |
| Target Form | Disc / Plate (bonded or unbonded) | Compatible with sputtering systems |
| Diameter | 25 – 300 mm (custom) | Fits standard magnetron cathodes |
| Thickness | 3 – 6 mm (typical) | Influences target lifetime |
| Sputtering Mode | RF magnetron sputtering | Suitable for insulating ceramics |
| Backing Plate | Copper / Titanium (optional) | Improves thermal management |
| Material | Key Advantage | Typical Application |
|---|---|---|
| (La₀.₂Ce₀.₂Gd₀.₂Y₀.₂Er₀.₂)Zr₂O₇ | High-entropy stability, low thermal conductivity | Advanced TBC & research films |
| Yttria-Stabilized Zirconia (YSZ) | Mature, well-studied | Conventional TBCs |
| Gd₂Zr₂O₇ | Low thermal conductivity | Next-gen TBC research |
| Question | Answer |
|---|---|
| Is this target suitable for RF sputtering? | Yes, RF magnetron sputtering is recommended for this insulating ceramic. |
| Can the composition ratio be adjusted? | Yes, rare-earth ratios can be customized for specific research needs. |
| Are bonded targets available? | Yes, copper- or titanium-backed targets are available on request. |
| How is compositional uniformity ensured? | Through controlled powder processing, mixing, and sintering. |
| Is a Certificate of Analysis provided? | Yes, CoA is available upon request. |
Typical Thin-Film Applications
- Thin-film research and materials-development projects requiring a composition-specific sputtering source
- Semiconductor, optical, energy, electronic, or laboratory coatings depending on the material system
- Custom R&D work where target composition, purity, and geometry need to be specified together
Target Configuration and Ordering Considerations
For quotation and manufacturability review, provide target size, thickness, purity or alloy composition, quantity, and the sputtering gun or cathode model if known. If a bonded assembly is required, include backing-plate material, bonding preference, and any dimensional tolerances, surface-finish needs, or inspection-document requirements. TFM can also review customer drawings or old-target samples for replacement builds.
Frequently Asked Questions
What is the main reason to use a (La0.2Ce0.2Gd0.2Y0.2Er0.2)Zr2O7 sputtering target?
It provides a composition-specific source for thin-film deposition when the target material itself is important to the desired film chemistry or process.
How should the sputtering mode for (La0.2Ce0.2Gd0.2Y0.2Er0.2)Zr2O7 be selected?
The power mode should be chosen according to target conductivity, thermal behavior, and equipment capability. Less-conductive materials are commonly evaluated with RF power.
Why are density and microstructure important for (La0.2Ce0.2Gd0.2Y0.2Er0.2)Zr2O7 targets?
These factors can influence erosion stability, thermal behavior, particle generation, and the risk of cracking or local hot spots.
Can (La0.2Ce0.2Gd0.2Y0.2Er0.2)Zr2O7 be supplied with a backing plate?
Yes. If the material is brittle or the cathode requires it, a bonded configuration can be reviewed according to target size, thickness, cooling, and power.
Does target composition always equal film composition?
No. Film chemistry may differ because of sputtering yields, process conditions, substrate temperature, re-sputtering, and chamber history. Film verification is recommended when composition matters.
What should I provide to request a quotation for (La0.2Ce0.2Gd0.2Y0.2Er0.2)Zr2O7?
Please provide the composition, purity, dimensions, quantity, target configuration, cathode details, and any drawing or inspection requirements.
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