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VD0560 Lutetium Evaporation Materials, Lu

Catalog No.VD0560
MaterialLutetium (Lu)
Purity99.5% ~ 99.9%
ShapePowder/ Granule/ Custom-made

TFM is a premier manufacturer and supplier of high-purity lutetium evaporation materials, along with an extensive range of other evaporation materials. We provide our products in both powder and granule forms, with custom options available to meet specific requirements.

 

Lutetium Evaporation Material Description

Lutetium, a silvery-white metal and the final member of the lanthanide series, is often categorized as a rare-earth element. This metal is chiefly used for research applications. It is notable for its solubility in dilute acids, its gradual reaction with water, and its resistance to corrosion when exposed to dry air.

In the realm of deposition processes, high-purity lutetium evaporation materials play a crucial role in producing high-quality thin films. At TFM, we are dedicated to manufacturing lutetium evaporation materials with a purity of up to 99.9%. Our commitment to quality is reflected in our stringent quality assurance procedures, which ensure that our products meet the highest standards of reliability.

 

lutetium evaporation materials

Lutetium Evaporation Material Specification

Material TypeLutetium
SymbolLu
Color/AppearanceSilvery, Metallic
Melting Point1652 °C
Density9.840 g/cm3
Thermal Conductivity0.164 W/cm/K @ 25 °C
Coefficient of Thermal Expansion(r.t.) (poly) 9.9 µm/(m·K)
SynonymsLu Pellets, Lu Pieces, Lu Evaporation Pellet, Lutetium Pellets, Lutetium Pieces, Lutetium Evaporation Pellet

Lutetium Evaporation Material Application

Lutetium evaporation materials are integral to several advanced technologies. They are widely used in deposition processes, including:

  • Semiconductor Deposition: Essential for creating high-quality semiconductor films with precise characteristics.
  • Chemical Vapor Deposition (CVD): Facilitates the formation of thin films with exceptional purity and uniformity.
  • Physical Vapor Deposition (PVD): Used to produce durable and high-performance coatings on various substrates.

Lutetium Evaporation Material Packaging

Our lutetium evaporation materials are carefully managed throughout storage and transportation to prevent any damage. This meticulous handling ensures that the quality and integrity of our products are maintained in their original condition.

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TFM offers lutetium evaporation materials in a range of forms, purities, sizes, and price points. We excel in producing high-purity e-beam evaporation materials with optimal density and minimal average grain sizes. For information on current prices for evaporation pellets and other deposition materials not listed, please send us an inquiry.

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FAQ

  • They are high‐purity substances (e.g. metals, alloys, or compounds) used in thermal or electron‐beam evaporation processes to form thin films on substrates.

  • Typically, they’re processed into a form (often ingots, pellets, or wires) that can be efficiently vaporized. Preparation emphasizes high purity and controlled composition to ensure film quality.

  • Thermal evaporation and electron-beam (e-beam) evaporation are the two main techniques, where material is heated (or bombarded with electrons) until it vaporizes and then condenses on the substrate.

  • Thermal evaporation heats the material directly (often using a resistive heater), while e-beam evaporation uses a focused electron beam to locally heat and vaporize the source material—each method offering different control and energy efficiency.

  • Key parameters include source temperature, vacuum level, deposition rate, substrate temperature, and the distance between the source and the substrate. These factors influence film uniformity, adhesion, and microstructure.

  • Evaporation generally produces high-purity films with excellent control over thickness, and it is especially suitable for materials with relatively low melting points or high vapor pressures.

  • Challenges include issues with step coverage (due to line-of-sight deposition), shadowing effects on complex topographies, and possible re-evaporation of material from the substrate if temperature isn’t properly controlled.

  • Common evaporation materials include noble metals (e.g., gold, silver), semiconductors (e.g., silicon, germanium), metal oxides, and organic compounds—each chosen for its specific optical, electrical, or mechanical properties.

  • Selection depends on desired film properties (conductivity, optical transparency, adhesion), compatibility with the evaporation process, and the final device application (semiconductor, optical coating, etc.).

  • Optimizing substrate temperature, deposition rate, and chamber vacuum are critical for ensuring that the film adheres well and forms the intended microstructure without defects.

  • Troubleshooting may involve checking the source material’s purity, ensuring stable source temperature, verifying the vacuum level, adjusting the substrate’s position or temperature, and monitoring deposition rate fluctuations.

While evaporation tends to yield very high purity films with excellent thickness control, it is limited by its line-of-sight nature. In contrast, sputtering can deposit films more uniformly on complex surfaces and is more versatile for a broader range of materials.

 

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