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ST0028A Magnesium Aluminate Sputtering Targets (MgAl2O4)

MSDS File
Material TypeMagnesium aluminate
SymbolMgAl2O4
Color/AppearanceWhite
Melting Point (°C)N/A
Density3.64 g/cm3
Molecular Weight142.27
Sputter
Exact Mass141.927777

Magnesium Aluminate Sputtering Targets

Overview

Magnesium aluminate (MgAl₂O₄), also known as spinel (MAS), is a synthetic material with a cubic crystal structure, offering outstanding chemical, thermal, dielectric, mechanical, and optical properties. These exceptional features make magnesium aluminate a crucial material in applications such as optically transparent windows, domes, armors, and certain refractory technologies.

Magnesium Aluminate Sputtering Targets Information

  • Purity: 99.99%
  • Circular: Diameter ≤ 14 inch, Thickness ≥ 1 mm
  • Block: Length ≤ 32 inch, Width ≤ 12 inch, Thickness ≥ 1 mm

More Information on Magnesium Aluminate Sputtering Targets

Applications

  • Ferroelectric
  • Gate Dielectric
  • For CMOS

Features

  • High Purity: Ensures high-quality sputtering with minimal contamination and superior thin film quality.
  • Custom Sizes Available: Customizable sizes to suit specific application requirements.

Manufacturing Process

  • Cold Pressed and Sintered: Magnesium aluminate is carefully processed using cold pressing and sintering methods for optimum density and consistency.
  • Elastomer Bonded to Backing Plate: Provides superior adhesion and stability during the sputtering process.
  • Cleaning and Final Packaging: Targets are cleaned for vacuum applications, ensuring protection from environmental contaminants during shipping.

Options

  • 99.99% Minimum Purity: Ideal for demanding applications requiring high-purity materials.
  • Smaller Sizes for R&D Applications: Available for research and development purposes.
  • Sputtering Target Bonding Service: Custom bonding options to improve target durability and performance.

For further details or to request a quote, please contact us directly.

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FAQ

Sputtering targets are materials used in thin-film deposition processes to create coatings on substrates. They are used in industries like semiconductors, optics, photovoltaics, and electronics.

Evaporation materials are used in Physical Vapor Deposition (PVD) processes, where materials are heated and evaporated to form a thin film on a substrate. These are critical for applications in optics, wear protection, and decorative coatings.

Boat crucibles are used as containers for evaporation materials during PVD processes. They help to uniformly evaporate materials onto the substrate for thin film formation.

Sputtering uses energetic particles to eject material from a target, while evaporation involves heating a material until it vaporizes and deposits on a substrate. Both are common methods in Physical Vapor Deposition (PVD) for creating thin films.

Consider the material composition, purity, target size, and application-specific requirements such as the thickness and uniformity of the film.

Yes, we offer customized sputtering targets, evaporation materials, and crucibles to meet specific customer requirements for size, material composition, and purity.

Yes, we can assist in selecting the most suitable material based on your application, whether it’s for optical coatings, semiconductor fabrication, or decorative finishes.

Yes, we offer both bulk and small quantities of sputtering targets, evaporation materials, and spherical powders to support research, prototyping, and development projects.

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