Thin Film Materials Logo
Generic selectors
Exact matches only
Search in title
Search in content
Post Type Selectors
Magnesium Fluoride Evaporation Materials

VD0785 Magnesium Fluoride Evaporation Materials, MgF2

Catalog No.VD0785
MaterialMagnesium Fluoride
Purity99.9%
ShapePowder/ Granule/ Custom-made

TFM is a trusted leader in the production and supply of high-purity magnesium fluoride evaporation materials. Alongside magnesium fluoride, we offer a broad selection of other high-quality evaporation materials to meet various industry demands. Available in both powder and granule forms, our products provide versatility for different applications. Additionally, we offer customized formulations to suit your specific project needs.

MSDS File

High-Purity Magnesium Fluoride Evaporation Materials from TFM

Magnesium fluoride evaporation materials from TFM are fluoride ceramic materials with the chemical formula MgF2. This material appears as white or crystalline, with a high melting point of 1,261°C, a density of 3.18 g/cc, and a vapor pressure of 10⁻⁴ Torr at 1,000°C. Magnesium fluoride is primarily used in optical applications, owing to its excellent transparency across a broad range of wavelengths. High-purity MgF2 evaporation materials play a critical role in deposition processes, ensuring the production of top-quality thin films. At TFM, we specialize in producing magnesium fluoride evaporation materials with purities reaching up to 99.9995%, utilizing stringent quality control processes to guarantee product reliability and performance.

Related Products

Magnesium Fluoride Evaporation Materials Specification

Material TypeMagnesium Fluoride
SymbolMgF2
Appearance/ColorWhite tetragonal crystals
Melting Point1,263 °C (2,305 °F; 1,536 K
Density3.148 g/cm3
Purity99.9%
ShapePowder/ Granule/ Custom-made

Applications of Magnesium Fluoride Evaporation Materials

Magnesium fluoride evaporation materials are widely used in various deposition techniques such as semiconductor deposition, chemical vapor deposition (CVD), and physical vapor deposition (PVD). Their primary application lies in the optics industry, where they are utilized for wear protection, decorative coatings, and display technologies due to their excellent optical properties.

Packaging of Magnesium Fluoride Evaporation Materials

At TFM, all magnesium fluoride evaporation materials are carefully packaged and clearly labeled to ensure easy identification and rigorous quality control. We take every precaution to prevent potential damage during storage and transportation, ensuring the materials reach you in optimal condition.

Get in Touch

TFM is a leading manufacturer and supplier of high-purity magnesium fluoride evaporation materials. We offer these materials in various shapes, including tablets, granules, rods, and wires. Custom forms and quantities are also available upon request. In addition, TFM provides a variety of evaporation sources, such as boats, filaments, crucibles, heaters, and e-beam crucible liners. Contact us for current pricing and information on evaporation materials and other related products not listed here.

Ordering Table

Material Size Quantity Purity Part Number
Magnesium Fluoride 1mm - 2.5mm Pieces 1 kg 99.99% EVMMGF-1-2.5
Magnesium Fluoride 1mm - 2.5mm Pieces 25 g 99.99% EVMMGF-1-2.5A
Magnesium Fluoride 1mm - 2.5mm Pieces 50 g 99.99% EVMMGF-1-2.5B
Magnesium Fluoride 1mm - 2.5mm Pieces 500 g 99.99% EVMMGF-1-2.5T
Magnesium Fluoride 1mm - 4mm Pieces 500 g 99.995-99.999% EVMMGF501-4T
Magnesium Fluoride 3mm - 6mm Pieces 50 g 99.9% EVMMGF-1113B
Magnesium Fluoride 3mm - 6mm Pieces 100 g 99.9% EVMMGF-1113D
Magnesium Fluoride 3mm - 6mm Pieces 500 g 99.9% EVMMGF-1113T
Magnesium Fluoride 3mm - 6mm Pieces 1 kg 99.9% EVMMGF1113KG

 

Reviews

There are no reviews yet.

Be the first to review “VD0785 Magnesium Fluoride Evaporation Materials, MgF2”

Your email address will not be published. Required fields are marked *

Related Products

Related products

FAQ

  • They are high‐purity substances (e.g. metals, alloys, or compounds) used in thermal or electron‐beam evaporation processes to form thin films on substrates.

  • Typically, they’re processed into a form (often ingots, pellets, or wires) that can be efficiently vaporized. Preparation emphasizes high purity and controlled composition to ensure film quality.

  • Thermal evaporation and electron-beam (e-beam) evaporation are the two main techniques, where material is heated (or bombarded with electrons) until it vaporizes and then condenses on the substrate.

  • Thermal evaporation heats the material directly (often using a resistive heater), while e-beam evaporation uses a focused electron beam to locally heat and vaporize the source material—each method offering different control and energy efficiency.

  • Key parameters include source temperature, vacuum level, deposition rate, substrate temperature, and the distance between the source and the substrate. These factors influence film uniformity, adhesion, and microstructure.

  • Evaporation generally produces high-purity films with excellent control over thickness, and it is especially suitable for materials with relatively low melting points or high vapor pressures.

  • Challenges include issues with step coverage (due to line-of-sight deposition), shadowing effects on complex topographies, and possible re-evaporation of material from the substrate if temperature isn’t properly controlled.

  • Common evaporation materials include noble metals (e.g., gold, silver), semiconductors (e.g., silicon, germanium), metal oxides, and organic compounds—each chosen for its specific optical, electrical, or mechanical properties.

  • Selection depends on desired film properties (conductivity, optical transparency, adhesion), compatibility with the evaporation process, and the final device application (semiconductor, optical coating, etc.).

  • Optimizing substrate temperature, deposition rate, and chamber vacuum are critical for ensuring that the film adheres well and forms the intended microstructure without defects.

  • Troubleshooting may involve checking the source material’s purity, ensuring stable source temperature, verifying the vacuum level, adjusting the substrate’s position or temperature, and monitoring deposition rate fluctuations.

While evaporation tends to yield very high purity films with excellent thickness control, it is limited by its line-of-sight nature. In contrast, sputtering can deposit films more uniformly on complex surfaces and is more versatile for a broader range of materials.

 

Shopping Cart
Scroll to Top