Product Overview
Molybdenum Carbide Sputtering Target (Mo2C) is a compound sputtering target used to deposit thin films where a specific pre-compounded chemistry is required. These materials can behave differently from conductive metallic targets in terms of electrical response, thermal shock resistance, density sensitivity, and cracking risk, so target dimensions, density, backing design, and sputtering mode should be considered together.
Material and Deposition Characteristics
The appropriate sputtering mode depends on target conductivity, thermal behavior, and the power-supply configuration. Many compound ceramic targets are evaluated first with RF magnetron sputtering, especially when electrical resistivity is high. For brittle or low-thermal-conductivity materials, density, backing support, and stable cooling are important for reliable operation.
Technical Data
| Parameter | Typical Value / Range | Importance |
|---|---|---|
| Purity | 99.5% – 99.9% | Higher purity reduces contamination in thin films |
| Chemical Formula | Mo₂C | Determines carbide structure and electrical behavior |
| Diameter | 25 – 300 mm (custom) | Compatible with various sputtering systems |
| Thickness | 3 – 6 mm | Influences sputtering efficiency and target life |
| Density | ≥ 95% theoretical density | Ensures stable sputtering and uniform film deposition |
| Bonding | Copper backing plate / Indium bonded | Improves heat transfer during high-power sputtering |
| Material | Key Advantage | Typical Application |
|---|---|---|
| Molybdenum Carbide (Mo₂C) | High hardness with metallic conductivity | Wear-resistant and catalytic coatings |
| Tungsten Carbide (WC) | Extremely high hardness | Cutting tool coatings |
| Molybdenum (Mo) | Excellent thermal stability and conductivity | Semiconductor and barrier layers |
| Question | Answer |
|---|---|
| Can the Mo₂C sputtering target be customized? | Yes. Diameter, thickness, and bonding configurations can be customized to match specific sputtering systems. |
| What sputtering methods are compatible with Mo₂C targets? | Mo₂C targets can be used in DC magnetron sputtering, RF sputtering, and other PVD deposition techniques. |
| Are bonded targets available? | Yes. Copper backing plates with indium bonding are commonly used to enhance thermal conductivity and mechanical stability. |
| What purity levels are typically available? | Standard purities range from 99.5% to 99.9%, depending on the deposition requirements. |
| What substrates can Mo₂C films be deposited on? | Mo₂C coatings can be deposited on metals, ceramics, silicon wafers, and glass substrates. |
Typical Thin-Film Applications
- Compound thin films for semiconductor, optical, protective, hard-coating, and functional-material research
- Applications where a pre-compounded target is preferred over co-sputtering separate elemental targets
- Projects requiring controlled chemistry and tailored target geometry for PVD development
Target Configuration and Ordering Considerations
When requesting a quotation, provide target diameter or rectangular dimensions, thickness, purity or composition, required quantity, and whether a backing plate or bonded assembly is needed. For brittle ceramic or compound targets, it is useful to specify the cathode model, backing-plate material, preferred bonding method, operating power if known, and any density, tolerance, or inspection-document requirements. TFM can review drawings, old-target photos, and application details when custom dimensions are required.
Frequently Asked Questions
What is the main reason to use a Molybdenum Carbide sputtering target?
It provides a composition-specific source for depositing thin films when the required chemistry is better introduced from a pre-compounded target than from co-sputtering separate elements.
How should the sputtering mode for Molybdenum Carbide be selected?
The power mode should be selected from target conductivity, thermal behavior, and equipment capability. Many compound ceramic targets are first evaluated with RF magnetron sputtering.
Why are density and microstructure important for Molybdenum Carbide targets?
Uniform density and microstructure help support stable erosion and thermal behavior, while pores or local defects can increase the risk of cracking, particles, or unstable plasma.
Can a Molybdenum Carbide target be supplied with a backing plate?
Yes. Where the material is brittle or the cathode requires a backing assembly, bonded configurations can be reviewed according to target size, thickness, cooling, and operating power.
Does target composition always equal film composition?
No. Film chemistry can shift because of different sputtering yields, reactive conditions, substrate temperature, re-sputtering, or chamber history. Verify the film when the chemistry is critical.
What should I provide to request a quotation for Molybdenum Carbide?
Please provide material composition, purity, dimensions, quantity, target or backing configuration, cathode model or system details, and any drawing, tolerance, or inspection requirements.
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