Thin Film Materials Logo
Generic selectors
Exact matches only
Search in title
Search in content
Post Type Selectors
neodymiumiii-oxide-evaporation-materials-1-1

VD0717 Neodymium(III) Oxide Evaporation Materials, Nd2O3

Catalog No.VD0717
MaterialNeodymium Oxide (Nd2O3)
Purity99.9% ~ 99.99%
ShapePowder/ Granule/ Custom-made

TFM stands out as a premier provider of high-purity neodymium(III) oxide evaporation materials, alongside a diverse range of other evaporation products. We supply these materials in both powder and granule forms to suit various needs, and we also offer custom solutions tailored to specific requirements.

MSDS File

Neodymium(III) Oxide Evaporation Materials Overview

Neodymium(III) oxide, or Nd₂O₃, is a high-purity evaporation material crucial for achieving superior quality in thin-film deposition. Known for its exceptional purity levels, up to 99.9995%, this material is essential for various deposition processes, including semiconductor manufacturing, chemical vapor deposition (CVD), and physical vapor deposition (PVD). Our advanced manufacturing processes ensure that each batch of neodymium(III) oxide meets rigorous quality standards, providing reliable performance in diverse applications.

Specifications of Neodymium(III) Oxide Evaporation Materials

Material TypeNeodymium(III) oxide
SymbolNd2O3
Color/AppearanceLight bluish gray hexagonal crystals
Melting Point2,233 °C
Theoretical Density 7.24 g/cm3
Purity99.9%
ShapePowder/ Pellets/ Granule/ Custom-made

Applications of Neodymium(III) Oxide Evaporation Materials

Neodymium(III) oxide is widely used in various applications, including:

  • Deposition Processes: Essential for semiconductor deposition, chemical vapor deposition (CVD), and physical vapor deposition (PVD).
  • Optical Coatings: Utilized in wear-resistant coatings, decorative finishes, and display technologies.

Packaging and Quality Assurance

To ensure optimal quality and easy identification, neodymium(III) oxide evaporation materials are meticulously tagged and labeled. Packaging is designed to prevent damage during storage and transport, maintaining the material’s integrity until it reaches the customer.

Contact Us

As a leading provider of high-purity neodymium(III) oxide evaporation materials, we offer a range of shapes including tablets, granules, rods, and wires. Custom forms and quantities can also be requested. In addition to evaporation materials, we supply evaporation sources, boats, filaments, crucibles, heaters, and e-beam crucible liners. For current pricing and availability, please send us an inquiry.

Reviews

There are no reviews yet.

Be the first to review “VD0717 Neodymium(III) Oxide Evaporation Materials, Nd2O3”

Your email address will not be published. Required fields are marked *

Related Products

Related products

FAQ

  • They are high‐purity substances (e.g. metals, alloys, or compounds) used in thermal or electron‐beam evaporation processes to form thin films on substrates.

  • Typically, they’re processed into a form (often ingots, pellets, or wires) that can be efficiently vaporized. Preparation emphasizes high purity and controlled composition to ensure film quality.

  • Thermal evaporation and electron-beam (e-beam) evaporation are the two main techniques, where material is heated (or bombarded with electrons) until it vaporizes and then condenses on the substrate.

  • Thermal evaporation heats the material directly (often using a resistive heater), while e-beam evaporation uses a focused electron beam to locally heat and vaporize the source material—each method offering different control and energy efficiency.

  • Key parameters include source temperature, vacuum level, deposition rate, substrate temperature, and the distance between the source and the substrate. These factors influence film uniformity, adhesion, and microstructure.

  • Evaporation generally produces high-purity films with excellent control over thickness, and it is especially suitable for materials with relatively low melting points or high vapor pressures.

  • Challenges include issues with step coverage (due to line-of-sight deposition), shadowing effects on complex topographies, and possible re-evaporation of material from the substrate if temperature isn’t properly controlled.

  • Common evaporation materials include noble metals (e.g., gold, silver), semiconductors (e.g., silicon, germanium), metal oxides, and organic compounds—each chosen for its specific optical, electrical, or mechanical properties.

  • Selection depends on desired film properties (conductivity, optical transparency, adhesion), compatibility with the evaporation process, and the final device application (semiconductor, optical coating, etc.).

  • Optimizing substrate temperature, deposition rate, and chamber vacuum are critical for ensuring that the film adheres well and forms the intended microstructure without defects.

  • Troubleshooting may involve checking the source material’s purity, ensuring stable source temperature, verifying the vacuum level, adjusting the substrate’s position or temperature, and monitoring deposition rate fluctuations.

While evaporation tends to yield very high purity films with excellent thickness control, it is limited by its line-of-sight nature. In contrast, sputtering can deposit films more uniformly on complex surfaces and is more versatile for a broader range of materials.

 

Shopping Cart
Scroll to Top