ST0032 Nickel Sputtering Target, Ni

Chemical Formula: Ni
Catalog Number: ST0032
CAS Number: 7440-02-0
Purity: 99.9%, 99.99%, 99.995%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Nickel sputtering target  come in various forms, purities, sizes, and prices. Thin Film Materials (TFM) manufactures and supplies top-quality sputtering targets at competitive prices.

Nickel Sputtering Target Description

NickelNickel sputtering targets are made from high-purity nickel metal. The element nickel, symbolized as “Ni,” derives its name from the German term ‘kupfernickel,’ meaning either devil’s copper or St. Nicholas’s copper. First mentioned in 1751 by F. Cronstedt, who also successfully isolated it, nickel has an atomic number of 28 and is located in Period 4, Group 10 of the periodic table, within the d-block. Its relative atomic mass is 58.6934(2) Daltons, with the number in parentheses indicating the measurement’s uncertainty.

Nickel Sputtering Target Specification

Material TypeNickel
SymbolNi
Color/AppearanceLustrous silvery metal
Melting Point1455 °C
Density8.902 g/cm3
Thermal Conductivity90.9 W·m-1·K-1  (25°C)
Electrical Resistivity69.3 nΩ·m (20 °C)
Available SizesDia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

We also offer other customized shapes and sizes of the sputtering targets; please Contact Us for more information.

Nickel Sputtering Target Bonding Services

Specialized bonding services for Nickel Sputtering Targets, including indium and elastomeric bonding techniques, enhance performance and durability. Thin Film Materials (TFM) ensures high-quality solutions that meet industry standards and customer needs.

We also offer custom machining of backing plates, which is essential for sputtering target assembly. This comprehensive approach improves target design flexibility and performance in thin film deposition. Our channels provide detailed information about bonding materials, methods, and services, helping clients make informed decisions.

Nickel Sputtering Target Application

Nickel sputtering targets are widely used in thin film deposition for applications such as decoration, semiconductors, displays, LEDs, and photovoltaic devices. They also play a crucial role in functional coatings, optical information storage, the glass coating industry—including automotive and architectural glass—and optical communications.

Other key applications of nickel include:

  • Alloying Element: Nickel is used in stainless steel, alloy steel, non-ferrous metals, and other corrosion-resistant alloys.
  • Catalyst: It serves as a catalyst in the hydrogenation of vegetable oils.
  • Ceramics Manufacturing: Nickel is used in the production of ceramics.
  • AlNiCo Magnets: These are powerful magnets made from aluminum, nickel, and cobalt.
  • Batteries: Nickel is essential in rechargeable batteries, such as nickel-cadmium and nickel-metal hydride batteries, commonly used in mobile phones and personal stereo devices.
  • High-Purity Nickel Applications: It is used in the electronics and aerospace industries, as well as in chemical and food processing equipment. High-purity nickel is also found in anodes and cathodes, caustic evaporators, and heat shields.

Nickel Sputtering Target Packaging

Our Nickel Sputtering Targets are clearly tagged and labeled externally to ensure efficient identification and quality control. We take great care to prevent any damage during storage and transportation.

Get Contact

TFM offers Nickel Sputtering Targets in various forms, purities, sizes, and prices. We specialize in high-purity thin film deposition materials with optimal density and minimal grain sizes, which are ideal for semiconductor, CVD, and PVD applications in display and optics. Contact Us for current pricing on sputtering targets and other deposition materials that are not listed.

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FAQ

Sputtering targets are materials used in thin-film deposition processes to create coatings on substrates. They are used in industries like semiconductors, optics, photovoltaics, and electronics.

Evaporation materials are used in Physical Vapor Deposition (PVD) processes, where materials are heated and evaporated to form a thin film on a substrate. These are critical for applications in optics, wear protection, and decorative coatings.

Boat crucibles are used as containers for evaporation materials during PVD processes. They help to uniformly evaporate materials onto the substrate for thin film formation.

Sputtering uses energetic particles to eject material from a target, while evaporation involves heating a material until it vaporizes and deposits on a substrate. Both are common methods in Physical Vapor Deposition (PVD) for creating thin films.

Consider the material composition, purity, target size, and application-specific requirements such as the thickness and uniformity of the film.

Yes, we offer customized sputtering targets, evaporation materials, and crucibles to meet specific customer requirements for size, material composition, and purity.

Yes, we can assist in selecting the most suitable material based on your application, whether it’s for optical coatings, semiconductor fabrication, or decorative finishes.

Yes, we offer both bulk and small quantities of sputtering targets, evaporation materials, and spherical powders to support research, prototyping, and development projects.

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