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Nupro Gas Shut-Off Valves

Gas Shut-Off Applications Overview

For gas shut-off applications, TFM offers robust solutions featuring 316 stainless steel construction.

Valve Series Options

  • H-Series: This compact series is ideal for a wide range of gas applications, particularly in vacuum processing environments.
  • B-Series: Designed with convenience in mind, these valves come with demountable bonnets, allowing for straightforward maintenance and cleaning of the valve seat.

TFM ensures quality and reliability in all gas shut-off solutions, meeting the needs of various industrial applications.

Specifications Table

ManufacturerSwagelok
RatesPressure Rating
69.0 bar
1000 PSI
TemperatureMax
315 ºC
599 ºF
Actuator
Type
In T-Bar In
Knob
Toggle
Manual
Used for
Shut-Off
1
Shaft
Seal
Bellows

Ordering Table

Drawing Thread Flow Coefficient (Cv) Turns to Open Part Number
Tooltip 10-32 UNF 0.39 2.5 SS-4BG
Tooltip 10-32 UNF 0.39 2.5 SS-4BG-TW
Tooltip 10-32 UNF 0.39 2.5 SS-4BK
Tooltip 10-32 UNF 0.39 2.5 SS-4BK-TW
Tooltip 10-32 UNF 0.39 2.5 SS-4BK-V51
Tooltip 10-32 UNF 0.39 2.5 SS-4BK-VCR
Tooltip 10-32 UNF 0.36 N/A SS-4BKT
Tooltip 10-32 UNF 0.28 1 SS-4H
Tooltip 10-32 UNF 0.28 1 SS-4H-TH3
Tooltip 10-32 UNF 0.28 1 SS-4H-TW
Tooltip 10-32 UNF 0.28 1 SS-4H2
Tooltip 10-32 UNF 0.28 1 SS-4H4

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FAQ

Sputtering targets are materials used in thin-film deposition processes to create coatings on substrates. They are used in industries like semiconductors, optics, photovoltaics, and electronics.

Evaporation materials are used in Physical Vapor Deposition (PVD) processes, where materials are heated and evaporated to form a thin film on a substrate. These are critical for applications in optics, wear protection, and decorative coatings.

Boat crucibles are used as containers for evaporation materials during PVD processes. They help to uniformly evaporate materials onto the substrate for thin film formation.

Sputtering uses energetic particles to eject material from a target, while evaporation involves heating a material until it vaporizes and deposits on a substrate. Both are common methods in Physical Vapor Deposition (PVD) for creating thin films.

Consider the material composition, purity, target size, and application-specific requirements such as the thickness and uniformity of the film.

Yes, we offer customized sputtering targets, evaporation materials, and crucibles to meet specific customer requirements for size, material composition, and purity.

Yes, we can assist in selecting the most suitable material based on your application, whether it’s for optical coatings, semiconductor fabrication, or decorative finishes.

Yes, we offer both bulk and small quantities of sputtering targets, evaporation materials, and spherical powders to support research, prototyping, and development projects.

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