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ST0402 Planar Molybdenum (Mo) Sputtering Target

Chemical Formula: Mo
Catalog Number: ST0402
CAS Number: 7439-98-7
Purity: 99.95% -99.97%
Thermal Conductivity: 139 W/m.K
Melting Point (°C):  2,617
Coefficient of Thermal Expansion: 4.8 x 10-6/K

 Planar Molybdenum sputtering target  come in various forms, purities, sizes, and prices. Thin Film Materials (TFM) manufactures and supplies top-quality sputtering targets at competitive prices.

MSDS File

Planar Molybdenum Sputtering Target Description

MolybdenumThe Planar Molybdenum Sputtering Target is a series of processed products made from high-purity molybdenum material, designed to have specific sizes and shapes. These targets are primarily used for vacuum coating applications. Molybdenum metal is silvery-white and very hard, with a melting point of 2623°C (4753°F), making it one of the elements with the highest melting points, only surpassed by tantalum, osmium, rhenium, and tungsten among natural elements. Additionally, molybdenum has one of the lowest coefficients of thermal expansion among metals in commercial use.

Related Post: Molybdenum Sputtering Target

Planar Molybdenum Sputtering Target Specification

WLTGW
Dimension70”90”1/2”< 450 lbs

Pure molybdenum

Mo >99.95%

Material TypeMolybdenum
SymbolMo
Color/AppearanceGrey, Metallic
Melting Point 2,617 °C
SputterDC
Type of BondIndium, Elastomer
CommentsFilms smooth, hard. Careful degas required.
Density10280 kg/m3
planar targets

Planar Molybdenum Sputtering Target Application

The Planar Molybdenum Sputtering Target is widely used in the manufacturing of LCD and touch screens (panels). It is also utilized for solar cells and solar water heating applications. We provide pure molybdenum and molybdenum alloy targets in various shapes, including disc, planar, and rotary, as well as custom targets tailored to specific requirements.

Other Molybdenum Products Compositions

Molybdenum alloy

Mo-Nb (90at% Mo:10at% Nb) Mo-Cr (Mo 97 wt% Mo: 3 wt% Cr)

Molybdenum compounds

Molybdenum Telluride (MoTe2), 99.999%

Molybdenum Selenide (MoSe2), 99.999%

Molybdenum Boride (Mo2B5), 99.5%

Molybdenum Disulfide (MoS2), 99.9%

Molybdenum Silicide (MoSi2), >99.5%

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FAQ

Sputtering targets are materials used in thin-film deposition processes to create coatings on substrates. They are used in industries like semiconductors, optics, photovoltaics, and electronics.

Evaporation materials are used in Physical Vapor Deposition (PVD) processes, where materials are heated and evaporated to form a thin film on a substrate. These are critical for applications in optics, wear protection, and decorative coatings.

Boat crucibles are used as containers for evaporation materials during PVD processes. They help to uniformly evaporate materials onto the substrate for thin film formation.

Sputtering uses energetic particles to eject material from a target, while evaporation involves heating a material until it vaporizes and deposits on a substrate. Both are common methods in Physical Vapor Deposition (PVD) for creating thin films.

Consider the material composition, purity, target size, and application-specific requirements such as the thickness and uniformity of the film.

Yes, we offer customized sputtering targets, evaporation materials, and crucibles to meet specific customer requirements for size, material composition, and purity.

Yes, we can assist in selecting the most suitable material based on your application, whether it’s for optical coatings, semiconductor fabrication, or decorative finishes.

Yes, we offer both bulk and small quantities of sputtering targets, evaporation materials, and spherical powders to support research, prototyping, and development projects.

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